Display apparatus with thin film encapsulation layer and method of manufacturing the same
US-11456438-B2 · Sep 27, 2022 · US
Display device including thin encapsulation layer containing silicon oxynitride layer
US12004368B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12004368-B2 |
| Application number | US-202117406229-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 19, 2021 |
| Priority date | Dec 10, 2020 |
| Publication date | Jun 4, 2024 |
| Grant date | Jun 4, 2024 |
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- Title
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Abstract
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A display device includes a light emitting structure disposed on a substrate, and a thin film encapsulation layer disposed on the light emitting structure and including an inorganic layer containing silicon oxynitride and an organic layer. A portion of the inorganic layer has a stress intensity factor of about 1.6 MPa or more.
First claim
Opening claim text (preview).
What is claimed is: 1. A display device comprising: a light emitting structure disposed on a substrate; and a thin film encapsulation layer disposed on the light emitting structure and including an inorganic layer that contains silicon oxynitride and an organic layer, wherein a portion of the inorganic layer has a stress intensity factor of about 1.6 MPa or more, wherein the inorganic layer includes: a first inorganic layer disposed between the light emitting structure and the organic layer and containing silicon oxynitride; and a second inorganic layer disposed on the organic layer and containing silicon oxynitride, wherein the first inorganic layer includes: a first barrier layer contacting the organic layer; and a second barrier layer contacting the light emitting structure, wherein the first barrier layer is disposed between the organic layer and the second barrier layer, and wherein a number of dangling bonds of the first barrier layer is less than a number of dangling bonds of the second barrier layer. 2. The display device of claim 1 , wherein the inorganic layer has a refractive index of about 1.8 or less. 3. The display device of claim 1 , wherein a portion of the first inorganic layer has a stress intensity factor of about 1.6 MPa or more. 4. The display device of claim 1 , wherein a portion of the second inorganic layer has a stress intensity factor of about 1.6 MPa or more. 5. The display device of claim 1 , wherein the first barrier layer has a stress intensity factor of about 1.6 MPa or more; and wherein the second barrier layer has a stress intensity factor of less than about 1.6 MPa. 6. The display device of claim 5 , wherein a difference between a refractive index of the first barrier layer and a refractive index of the second barrier layer is less than about 0.05. 7. A display device comprising: a light emitting structure disposed on a substrate; and a thin film encapsulation layer disposed on the light emitting structure and including an inorganic layer that contains silicon oxynitride and an organic layer, wherein a portion of the inorganic layer has a spin density of less than about 9.0×1018 spins/cm3, wherein the inorganic layer includes: a first inorganic layer disposed between the light emitting structure and the organic layer and containing silicon oxynitride; and a second inorganic layer disposed on the organic layer and containing silicon oxynitride, wherein the first inorganic layer includes: a first barrier layer contacting the organic layer; and a second barrier layer contacting the light emitting structure, wherein the first barrier layer is disposed between the organic layer and the second barrier layer, and wherein a number of dangling bonds of the first barrier layer is less than a number of dangling bonds of the second barrier layer. 8. The display device of claim 7 , wherein the first barrier layer has a spin density of less than about 9.0×10 18 spins/cm 3 and the second barrier layer has a spin density of about 9.0×10 18 spins/cm 3 or more. 9. The display device of claim 8 , wherein the first barrier layer has a stress intensity factor of about 1.6 MPa or more, and wherein the second barrier layer has a stress intensity factor of less than about 1.6 MPa. 10. The display device of claim 8 , wherein each of a refractive index of the first barrier layer and a refractive index of the second barrier layer is about 1.8 or less, and wherein a difference between the refractive index of the first barrier layer and the refractive index of the second barrier layer is less than about 0.05. 11. The display device of claim 8 , wherein the first barrier layer is not oxidized under a temperature of about 85° C. and a humidity of about 85% for about 500 hours.
Assignees
Inventors
Classifications
multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers · CPC title
Active-matrix OLED [AMOLED] displays · CPC title
- H10K50/844Primary
Encapsulations · CPC title
- H10K71/00Primary
Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title
- H10K50/8445Primary
multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers · CPC title
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Frequently asked questions
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- What does patent US12004368B2 cover?
- A display device includes a light emitting structure disposed on a substrate, and a thin film encapsulation layer disposed on the light emitting structure and including an inorganic layer containing silicon oxynitride and an organic layer. A portion of the inorganic layer has a stress intensity factor of about 1.6 MPa or more.
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10K50/844. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jun 04 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).