Parallelized 3D lithography using multi-beam, multi-color light-induced polymerization

Patent metadata

Field	Value
Publication number	US-11999098-B2
Application number	US-201917413357-A
Country	US
Kind code	B2
Filing date	Oct 21, 2019
Priority date	Dec 17, 2018
Publication date	Jun 4, 2024
Grant date	Jun 4, 2024

Abstract

The present invention relates to a method for additive manufacturing of a 3D-structured form and to a device for additive manufacturing of a 3D-structured form.

First claim

The invention claimed is:

1. A method for additive manufacturing of a 3D-structured form, the method comprising the steps of:
i) providing a liquid photoresist comprising at least one monomer and at least one photoinitiator system comprising an α-diketone or a photochromic compound selected from the group consisting of 2-methoxy naphthalene and spiropyrans; and
ii) irradiating the liquid photoresist with a first light source at a first wavelength Ai and with a second light source at a second wavelength λ2 either simultaneously or sequentially with a time interval of less than 1 ms to harden the liquid photoresist and produce the 3D-structured form,
wherein λ 1 ≠λ 2 , and
wherein the hardening of the liquid photoresist to produce the 3D-structured form takes place only at the position which is irradiated by the first light source and the second light source either simultaneously or sequentially with the time interval of less than 1 ms.

2. The method according to claim 1 ,
wherein in step ii), a single-photon absorption by the at least one photoinitiator system takes place.

3. The method according to claim 1 ,
wherein in step ii), the 3D-structured form to be produced is imaged into at least one of the focal planes of the first light source and of the second light source.

4. The method according to claim 1 , wherein the liquid photoresist in step i) is provided in a container, wherein a substrate which supports the 3D-structured form is located in the container.

5. A device for additive manufacturing of a 3D-structured form, starting from a liquid photoresist, the device comprising:
a first light source with a first wavelength λ 1 ;
a second light source with a second wavelength λ 2 ; and
a substrate configured for providing the liquid photoresist,
the liquid photoresist comprising at least one monomer and at least one photoinitiator system comprising an α-diketone or a photochromic compound selected from the group consisting of 2-methoxy naphthalene and spiropyrans,
wherein λ 1 ≠λ 2 , and
wherein the first light source and the second light source are configured to be oriented toward the substrate and are configured to irradiate the liquid photoresist either simultaneously or sequentially with a time interval of less than 1 ms in order to harden the liquid photoresist only at the position which is irradiated by the first light source and the second light source either simultaneously or sequentially with the time interval of less than 1 ms.

6. The device according to claim 5 , wherein the substrate is located in a container and the substrate is further configured to support a 3D-structured form fabricated in the device for additive manufacturing.

7. The device according to claim 5 ,
wherein a direction of irradiation of the first light source is different from a direction of irradiation of the second light source.

8. The device according to claim 5 ,
wherein the first light source and the second light source are lasers.

9. The device according to claim 8 ,
wherein at least one of the lasers is a pulsed laser.

10. The method according to claim 1 ,
wherein the direction of irradiation of the first light source is different from the direction of irradiation of the second light source.

11. The method according to claim 1 ,
wherein the first light source and the second light source are lasers.

12. The method according to claim 11 ,
wherein at least one of the lasers is a pulsed laser.

13. The method according to claim 1 , wherein after step ii), further comprising step (iii) removing non-hardened liquid photoresist.

Assignees

• Karlsruher Inst Technologie

Inventors

• Hahn Vincent
• Müller Patrick
• Blasco Eva
• Wegener Martin

Classifications

• B29C64/129 Primary

  characterised by the energy source therefor, e.g. by global irradiation combined with a mask · CPC title

• B29C64/245

  Platforms or substrates (support structures intended to be sacrificed after manufacture B29C64/40) · CPC title

• B29C64/255

  Enclosures for the building material, e.g. powder containers · CPC title

• B29C64/273

  pulsed; frequency modulated · CPC title

• B29C64/282

  of the same type, e.g. using different energy levels · CPC title