Micromechanical component for a rotation rate sensor and corresponding manufacturing method

US11988511B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11988511-B2
Application numberUS-202117908081-A
CountryUS
Kind codeB2
Filing dateApr 14, 2021
Priority dateApr 28, 2020
Publication dateMay 21, 2024
Grant dateMay 21, 2024

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A micromechanical component for a rotation rate sensor. The micromechanical component includes two rotor masses, mirror symmetrical with respect to a first plane of symmetry aligned perpendicularly to a substrate surface and passing through the center of the two rotor masses, which may be set in rotational vibrating motion about rotational axes aligned perpendicularly to the substrate surface, and four seismic masses, mirror symmetrical with respect to the first plane of symmetry, deflectable in parallel to the first plane of symmetry using the two rotor masses set in their respective rotational vibrating motion. The first rotor mass and a first pair of the four seismic masses connected thereto are mirror symmetrical to the second rotor mass and to a second pair of the four seismic masses connected thereto with respect to a second plane of symmetry aligned perpendicularly to the substrate surface and to the first plane of symmetry.

First claim

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What is claimed is: 1. A micromechanical component for a rotation rate sensor, comprising: a substrate including a substrate surface; a one-piece first rotor mass and a one-piece second rotor mass, which are situated mirror symmetrically with respect to a first plane of symmetry aligned perpendicularly to the substrate surface and passing through a center of the first rotor mass and of the second rotor mass in such a way that the first rotor mass may be set in a first rotational vibrating motion about a first rotational axis aligned perpendicularly to the substrate surface, and the second rotor mass may be set in a second rotational vibrating motion phase-shifted by 180° to the first rotational vibrating motion about a second rotational axis aligned in parallel to the first rotational axis; and four seismic masses, which are situated mirror symmetrically with respect to the first plane of symmetry in such a way that the four seismic masses are each deflectable in parallel to the first plane of symmetry using the first and second rotor masses set in their first and second rotational vibrating motions, respective; wherein the first rotor mass and a first pair of the four seismic masses connected to the first rotor mass are situated mirror symmetrically to the second rotor mass and a second pair of the four seismic masses connected to the second rotor mass, with respect to a second plane of symmetry aligned perpendicularly to the substrate surface and perpendicularly to the first plane of symmetry. 2. The micromechanical component as recited in claim 1 , wherein the first and second rotor masses and the four seismic masses are situated in such a way that a shared center of mass of the first rotor mass, of the second rotor mass, of the first pair of seismic masses, and of the stationary second pair of seismic masses, when stationary, is situated in a line of intersection of the first plane of symmetry with the second plane of symmetry. 3. The micromechanical component as recited in claim 2 , wherein the first and second rotor masses and the four seismic masses are situated in such a way that, even when the first and second rotor masses are set in their first and second rotational vibrating motions, respectively, the four seismic masses are each deflectable in parallel to the first plane of symmetry, the shared center of mass of the first rotor mass, of the second rotor mass, of the first pair of seismic masses, and of the second pair of seismic masses, is situated in a line of intersection of the first plane of symmetry with the second plane of symmetry. 4. The micromechanical component as recited in claim 1 , wherein the first and second rotor masses are situated in such a way that when the first and second rotor masses are set in their first and second rotational vibrating motions, respectively, a vector sum of a first torque of the first rotational vibrating motion of the first rotor mass and of a second torque of the second rotational vibrating motion of the second rotor mass, is equal to zero. 5. The micromechanical component as recited in claim 1 , wherein the first and second rotor masses are situated in such a way that the first and second rotor masses, set in the first and second rotational vibrating motions, respectively, are each tiltable about a rotational axis situated in the first plane of symmetry and about one further rotational axis each aligned perpendicularly to the first plane of symmetry. 6. The micromechanical component as recited in claim 1 , wherein each of the first and second rotor masses is connected via one first spring each to a first rocker structure aligned in parallel to the first plane of symmetry and via one second spring each to a second rocker structure aligned in parallel to the first plane of symmetry. 7. The micromechanical component as recited in claim 1 , wherein the four seismic masses are situated in such a way that using the first and second rotor masses set in their first and second vibrating motion, respectively, a first seismic mass of the first pair may be set in a first harmonic vibrating motion aligned in parallel to the first plane of symmetry, a second seismic mass of the first pair may be set in a second harmonic vibrating motion aligned in parallel to the first plane of symmetry, a first seismic mass of the second pair mirror symmetrical to first seismic mass with respect to the second plane of symmetry may be set in the second harmonic vibrating motion and a second seismic mass of the second pair mirror symmetrical to the second seismic mass of the first pair with respect to the second plane of symmetry may be set in the first harmonic vibrating motion, the first harmonic vibrating motion being phase-shifted by 180° relative to the second harmonic vibrating motion. 8. The micromechanical component as recited in claim 7 , wherein the four seismic masses are situated in such a way that the four seismic masses set in their respective harmonic vibrating motion are also adjustable parallel to the second plane of symmetry. 9. A rotation rate sensor, comprising: a micromechanical component including: a substrate including a substrate surface, a one-piece first rotor mass and a one-piece second rotor mass, which are situated mirror symmetrically with respect to a first plane of symmetry aligned perpendicularly to the substrate surface and passing through a center of the first rotor mass and of the second rotor mass in such a way that the first rotor mass may be set in a first rotational vibrating motion about a first rotational axis aligned perpendicularly to the substrate surface, and the second rotor mass may be set in a second rotational vibrating motion phase-shifted by 180° to the first rotational vibrating motion about a second rotational axis aligned in parallel to the first rotational axis, and four seismic masses, which are situated mirror symmetrically with respect to the first plane of symmetry in such a way that the four seismic masses are each deflectable in parallel to the first plane of symmetry using the first and second rotor masses set in their first and second rotational vibrating motions, respective, wherein the first rotor mass and a first pair of the four seismic masses connected to the first rotor mass are situated mirror symmetrically to the second rotor mass and a second pair of the four seismic masses connected to the second rotor mass, with respect to a second plane of symmetry aligned perpendicularly to the substrate surface and perpendicularly to the first plane of symmetry. 10. A manufacturing method for a micromechanical component for a data rate sensor comprising the following steps: situating a one-piece first rotor mass and a one-piece second rotor mass of the micromechanical component mirror symmetrically with respect to a first plane of symmetry aligned perpendicularly to a substrate surface of a substrate of the micromechanical component and passing through a center of the first rotor mass and of the second rotor mass in such a way that the first rotor mass may be set in a first rotational vibrating motion about a first rotational axis aligned perpendicularly to the substrate surface and the second rotor mass may be set in a second rotational vibrating motion phase-shifted by 180° relative to the first rotational vibrating motion about a second rotational axis aligned in parallel to the first rotational axis; and situating four seismic masses of the micromechanical component mirror symmetrically with respect to the first plane of symmetry in such a way that the four seismic masses are deflectable in each case in parallel to the first plane of symmetry using the first and second rotor masses set in their first and second rotational vibrating motions,

Assignees

Inventors

Classifications

  • the devices involving a micromechanical structure · CPC title

  • the devices involving a micromechanical structure · CPC title

  • Manufacturing, calibrating, cleaning, or repairing instruments or devices referred to in the other groups of this subclass (testing, calibrating or compensating compasses G01C17/38) · CPC title

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What does patent US11988511B2 cover?
A micromechanical component for a rotation rate sensor. The micromechanical component includes two rotor masses, mirror symmetrical with respect to a first plane of symmetry aligned perpendicularly to a substrate surface and passing through the center of the two rotor masses, which may be set in rotational vibrating motion about rotational axes aligned perpendicularly to the substrate surface, …
Who is the assignee on this patent?
Bosch Gmbh Robert
What technology area does this patent fall under?
Primary CPC classification G01C19/5712. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 21 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).