Method for measuring concentration of fluorine gas in halogen fluoride-containing gas using mass spectrometer

Patent metadata

Field	Value
Publication number	US-11984308-B2
Application number	US-202017608527-A
Country	US
Kind code	B2
Filing date	Nov 12, 2020
Priority date	Nov 27, 2019
Publication date	May 14, 2024
Grant date	May 14, 2024

Abstract

A method for measuring the concentration of fluorine gas (F 2 ) contained in a halogen fluoride-containing gas using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer, the method including, before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.

First claim

The invention claimed is:

1. A method for measuring a concentration of fluorine gas (F2) contained in a halogen fluoride-containing gas by using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer,
the method comprising:
before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary by using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.

2. The method for measuring a concentration of fluorine gas according to claim 1 , wherein
the fluorine-containing gas is at least one kind of gas selected from the group consisting of F 2 , HF, NF 3 , SF 6 , and a halogen fluoride.

3. The method for measuring a concentration of fluorine gas according to claim 1 , wherein
a temperature used to perform the passivation treatment is 70 to 500° C.

4. The method for measuring a concentration of fluorine gas according to claim 1 , wherein
time to perform the passivation treatment is 1 to 5 hours.

5. The method for measuring a concentration of fluorine gas according to claim 1 , wherein
a concentration of the fluorine-containing gas in the passivation gas is 8 to 100 volume %.

6. The method for measuring a concentration of fluorine gas according to claim 5 , wherein
the analysis apparatus further has a diluent gas supply source, and adjusts the concentration of the fluorine-containing gas in the passivation gas by using a diluent gas supplied from the diluent gas supply source.

7. The method for measuring a concentration of fluorine gas according to claim 6 , wherein
the diluent gas is at least one selected from helium, argon, nitrogen gas (N 2 ), carbon dioxide, and carbon tetrafluoride.

8. The method for measuring a concentration of fluorine gas according to claim 1 , wherein
a halogen fluoride contained in the halogen fluoride-containing gas is at least one selected from the group consisting of chlorine fluoride, chlorine trifluoride, bromine fluoride, bromine trifluoride, bromine pentafluoride, iodine fluoride, iodine trifluoride, iodine pentafluoride, and iodine heptafluoride.

9. An apparatus for measuring a concentration of fluorine gas, the apparatus comprising:
a halogen fluoride-containing gas supply source;
a fluorine-containing gas supply source;
a tube;
a capillary; and
a mass spectrometer,
wherein the tube and the capillary have been subjected to passivation treatment with a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.

Assignees

• Showa Denko Kk
• Resonac Corp

Inventors

• Suzuki Atsushi

Classifications

• H01J49/0422 Primary

  for gaseous samples (interfaces to gas chromatographs G01N30/7206) · CPC title

• H01J49/0031

  Step by step routines describing the use of the apparatus (H01J49/0081 takes precedence) · CPC title

• H01J49/40

  Time-of-flight spectrometers (H01J49/36 takes precedence) · CPC title

• G01N27/62 Primary

  by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode · CPC title

• C01B7/19 Primary

  Fluorine; Hydrogen fluoride · CPC title