Apparatus for purifying gas

US11980848B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11980848-B2
Application numberUS-202318136938-A
CountryUS
Kind codeB2
Filing dateApr 20, 2023
Priority dateMay 9, 2017
Publication dateMay 14, 2024
Grant dateMay 14, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is supplied to a second ejector stage having so that a second motive medium which includes liquid, steam or gaseous agent is injected to the ejector and the gas and/or the liquid phase is sucked into the same ejector in which the gas and/or liquid phase is mixed with the second motive medium for forming a second mixture, at least one of the mixtures includes an additive for removing impurities of the gas, and a purified gas is formed.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for purifying gas, wherein the apparatus comprises at least two ejector stages, in which each ejector stage comprises at least one ejector, for treating a gas in a multistage treatment and for absorbing the gas to a liquid, and the apparatus comprises: at least one feeding device for injecting a pressurized motive medium which comprises liquid, steam or gaseous agent at high pressure to at least one ejector of the first ejector stage and at least one supplying device for sucking the gas into the same ejector in which the gas is mixed with the motive medium for forming a mixture comprising a gas phase and a liquid phase, at least one separation device for separating at least a part of the gas phase from the mixture after the first ejector stage to form a liquid phase, at least one second feeding device for injecting a second or later motive medium which comprises liquid, steam or gaseous agent to a second or later ejector stage which comprises at least one ejector and at least one gas phase supplying device for supplying at least a part of the gas phase of the mixture to the same ejector in which the gas phase is mixed with the second or later motive medium for forming a second or later mixture, at least one separation device for separating at least a part of the gas phase from the second or later mixture after the second or later ejector stage to form a purified gas, at least one regeneration device for treating at least a part of the separated liquid phase by a regeneration for removing carbon dioxide and other impurities from the liquid phase and/or for recovering a desired chemical compound from the liquid phase at least after the first separation stage, wherein at least a part of the regenerated liquid phase is arranged to be supplied back to the motive medium of the same first ejector stage, and at least one addition device for adding an additive to at least one of the mixtures for removing impurities of the gas. 2. The apparatus according to claim 1 , wherein high pressure liquid is the motive medium in the first ejector stage and/or in the second or later ejector stage. 3. The apparatus according to claim 1 , wherein high pressure steam is the motive medium in the first ejector stage and/or in the second or later ejector stage. 4. The apparatus according to claim 1 , wherein the pressure of the motive medium is arranged to 1.3-100 bar if the motive medium is liquid. 5. The apparatus according to claim 1 , wherein the pressure of the motive medium is arranged to 3-300 bar if the motive medium is steam. 6. The apparatus according to claim 1 , wherein the apparatus comprises 2-8 ejector stages. 7. The apparatus according to claim 1 , wherein the ejector is a liquid motivated ejector. 8. The apparatus according to claim 1 , wherein the ejector is a vapor ejector. 9. The apparatus according to claim 1 , wherein the ejector of the first ejector stage is a liquid motivated ejector and the ejector of the second or later ejector stage is a vapor ejector. 10. The apparatus according to claim 1 , wherein at least a part of the liquid phase separated in the separation stage is arranged to be fed as the motive medium to the at least two ejector stages. 11. The apparatus according to claim 1 , wherein the apparatus comprises at least one reactor for treating the two-phase mixture of the liquid phase and gas phase or the gas phase or the liquid phase in order to form a chemical compound and/or improve a recovery of a desired component.

Assignees

Inventors

Classifications

  • by refrigeration (condensation) · CPC title

  • B01D53/75Primary

    Multi-step processes · CPC title

  • Multiple stage absorption · CPC title

  • Removing carbon dioxide · CPC title

  • Selection of liquid materials for use as absorbents · CPC title

Patent family

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Frequently asked questions

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What does patent US11980848B2 cover?
An apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is sup…
Who is the assignee on this patent?
Teknologian Tutkimuskeskus Vtt Oy
What technology area does this patent fall under?
Primary CPC classification B01D53/75. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 14 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).