Organic vapor jet printing system

US11976360B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11976360-B2
Application numberUS-202318099339-A
CountryUS
Kind codeB2
Filing dateJan 20, 2023
Priority dateOct 12, 2015
Publication dateMay 7, 2024
Grant dateMay 7, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.

First claim

Opening claim text (preview).

We claim: 1. An organic printing deposition system, comprising: a print head that is resistively heated comprising: a nozzle block comprising a delivery aperture, the delivery aperture being in fluid communication with a source of organic material to be deposited on a substrate by the printing deposition system; one or more shield gas distribution channels fluidically coupled to a plurality of shield gas apertures, each shield gas aperture being disposed above or below the delivery aperture when viewed from below the nozzle block, and at least some of the plurality of shield gas apertures are located on a chiller plate between the print head and substrate; and one or more exhaust channels disposed adjacent to the delivery aperture such that, during operation of the print head, non-condensing gas flow generated by the delivery aperture is captured by an exhaust aperture; wherein the plurality of shield gas apertures are arranged to provide a flow of shield gas that prevents material from a chamber ambient in which the print head is operated from reaching the exhaust apertures of the nozzle block, wherein the chiller plate comprises a window that is configured to allow the print head to protrude through, and wherein at least one of the shield gas apertures that are disposed on the chiller plate are arranged on a first side of the window, and at least another of the shield as apertures are arranged on a second side of the window. 2. The system of claim 1 , wherein the print head is removeable from the chamber as a one-piece unit. 3. The system of claim 1 , wherein at least some of the plurality of shield gas apertures, eject shield gas into the space between the substrate and the print head during operation of the print head such that all gas ingested by the exhaust apertures originates from either the delivery aperture or one or more of the shield gas apertures. 4. The system of claim 3 , wherein the plurality of shield gas apertures are provided by nozzles surrounding the print head containing the nozzle block. 5. The system of claim 1 , wherein at least some of the shield gas apertures are arranged in arrays parallel to the direction of printed features. 6. The system of claim 1 , wherein the chiller plate comprises a plurality of exhaust apertures disposed on the chiller plate that withdraw shield gas from the deposition chamber. 7. The system of claim 1 , wherein the chiller plate comprises rounded edges, fairings, or a combination thereof to reduce turbulence in the shield gas flow. 8. The system of claim 1 , wherein the print head is moveable in the direction of the substrate normal independently of other components of the organic printing deposition system. 9. The system of claim 8 , wherein an angle between the nozzle block and the substrate can be adjusted independently of other components of the organic printing deposition system. 10. The system of claim 9 , wherein at least one of the plurality of shield gas apertures are disposed on the nozzle block. 11. The system of claim 1 , wherein the system comprises multiple print heads mounted in a single deposition chamber. 12. The system of claim 11 , wherein the multiple print heads are mounted on a common articulated carriage. 13. The system of claim 12 , wherein at least some of the plurality of shield gas apertures are arranged on the nozzle block along a perimeter of the substrate-facing side of the articulated carriage. 14. The system of claim 11 , wherein at least one of the print heads is a delivery-exhaust-confinement organic vapor jet printing (DEC OVJP) print head. 15. The system of claim 1 , wherein the at least one of the plurality of shield gas apertures that are located on the chiller plate eject a shield gas in a direction normal to the substrate when the system is operated. 16. The system of claim 15 , wherein the chiller plate further comprises one or more apertures through which at least a portion of the print heat extends.

Assignees

Inventors

Classifications

  • Gas nozzles · CPC title

  • Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed (mounting, arrangement or disposition of types or dies B41J1/00) · CPC title

  • Organic material · CPC title

  • Vacuum evaporation · CPC title

  • Crucibles for source material (C23C14/28, C23C14/30 take precedence) · CPC title

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What does patent US11976360B2 cover?
Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-con…
Who is the assignee on this patent?
Universal Display Corp
What technology area does this patent fall under?
Primary CPC classification C23C16/45563. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 07 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).