Wash water processing apparatus and sterilization and purification unit, and wash water processing method of semiconductor element or liquid-crystal glasses

Patent metadata

Field	Value
Publication number	US-11975995-B2
Application number	US-202217696425-A
Country	US
Kind code	B2
Filing date	Mar 16, 2022
Priority date	Oct 31, 2017
Publication date	May 7, 2024
Grant date	May 7, 2024

Abstract

A wash water processing apparatus of reusing wash water includes: a washing processing part washing a subject to be washed; a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated; a sterilization and purification unit causing, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and a filtration mechanism part configured to include a filter and an ion-exchange resin and sequentially filtrating the processed water to be reused as wash water in the washing processing part, as the ozone water is supplied as the processed water is mixed to dilute an ozone concentration in the wash water accommodation part. In a state where the ozone concentration is adjusted, the processed water is passed through the filter and the ion-exchange resin.

First claim

The invention claimed is:

1. A wash water processing apparatus of reusing wash water for use in an industrial product washing step, the apparatus comprising:
a washing processing part which washes a subject to be washed;
a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated;
a sterilization and purification unit which causes, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and
a filtration mechanism part configured to include a filter and an ion-exchange resin, the filtration mechanism part which sequentially filtrates the processed water to be reused as wash water in the washing processing part, as the ozone water is supplied as the processed water is mixed to dilute an ozone concentration in the wash water accommodation part, wherein
the sterilization and purification unit is connected to the wash water accommodation part so that the processed water is circulated in the wash water accommodation part and the sterilization and purification unit, and controls operation of ozone supply of the sterilization and purification unit to adjust an ozone concentration of the processed water in the wash water accommodation part, and
the processed water containing the ozone water with the diluted ozone concentration is passed through both of the filter and the ion-exchange resin, thereby suppressing growth of bacteria in the filter and the ion-exchange resin and also suppressing oxidative degradation thereof.

2. A sterilization and purification apparatus for use in a wash water processing apparatus including:
a washing processing part which washes a subject to be washed;
a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated;
a sterilization and purification unit which causes, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and
a filtration mechanism part configured to include a filter and an ion-exchange resin, the filtration mechanism part which sequentially filtrates the processed water in the wash water accommodation part to be reused as wash water in the washing processing part,
the sterilization and purification unit comprising:
an ozone supply part which supplies ozone, wherein
the sterilization and purification unit is connected to the wash water accommodation part so that the processed water is circulated in the wash water accommodation part and the sterilization and purification unit; controls operation of ozone supply; mixes the processed water flowing in from the wash water accommodation part with ozone for sterilization and purification and then returns the processed water to the wash water accommodation part for circulation in order to dilute an ozone concentration of the processed water accommodated in the wash water accommodation part; and sends the processed water containing the ozone water with the diluted ozone concentration to the filtration mechanism part to pass through both of the filter and the ion-exchange resin, thereby suppressing growth of bacteria in the filter and the ion-exchange resin and also suppressing oxidative degradation thereof.

3. A method of manufacturing a semiconductor element or liquid crystal glass, the method comprising a washing process step of washing the semiconductor element or liquid crystal glass by using a wash water processing apparatus including:
a washing processing part which washes a subject to be washed;
a wash water accommodation part into which processed water used in a washing process in the washing processing part is once accommodated;
a sterilization and purification unit which causes, while acting with an ozone supply function, ozone water to be contained in the processed water flowing through the wash water accommodation part in a circular manner; and
a filtration mechanism part configured to include a filter and an ion-exchange resin, the filtration mechanism part which sequentially filtrates the processed water in the wash water accommodation part to be reused as wash water in the washing processing part, wherein
in the washing process step,
in a state in which operation of ozone supply of the sterilization and purification unit is controlled to adjust an ozone concentration of the processed water in the wash water accommodation part, the processed water containing the ozone water with the diluted ozone concentration is passed through both of the filter and the ion-exchange resin, thereby suppressing growth of bacteria in the filter and the ion-exchange resin and also suppressing oxidative degradation thereof.

Assignees

• Kitz Corp
• Toyo Valve Co Ltd

Inventors

• Yata Katsuhisa
• Sakurai Takako
• Ito Satoshi
• Tanaka Toshiharu

Classifications

• H10P52/00

  Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

• G02F1/13

  based on liquid crystals, e.g. single liquid crystal display cells · CPC title

• C02F1/283

  using coal, charred products, or inorganic mixtures containing them · CPC title

• B01D63/02

  Hollow fibre modules · CPC title

• C02F1/44

  by dialysis, osmosis or reverse osmosis {(general membrane separation processes B01D61/00, membrane modules B01D63/00, electrodialysis C02F1/4693, combination of membrane modules and bioreactors C02F3/1268)} · CPC title