Method of producing rinsing liquid

Patent metadata

Field	Value
Publication number	US-11975992-B2
Application number	US-201917040938-A
Country	US
Kind code	B2
Filing date	Mar 26, 2019
Priority date	Mar 27, 2018
Publication date	May 7, 2024
Grant date	May 7, 2024

Abstract

The present application discloses a method of producing an aqueous rinsing liquid in an electrochemical cell having an anode chamber with an anode and a cathode chamber with a cathode, the anode chamber and cathode chamber being separated by a cation-selective membrane, wherein the method includes the steps of (a) feeding an aqueous anode chamber feedstock into the anode chamber (b) feeding an aqueous cathode chamber feedstock comprising at least one electrolyte through the cathode chamber; and (c) applying an electrical voltage to the anode and cathode to form rinsing liquid in the cathode chamber; and wherein steps a, b and c are performed, at least in part, simultaneously. Also disclosed is apparatus suitable for carrying out such methods.

First claim

The invention claimed is:

1. A method of producing an aqueous rinsing liquid in an electrochemical cell of an apparatus, the electrochemical cell having an anode chamber with an anode and a cathode chamber with a cathode, the anode chamber and cathode chamber being separated by a cation-selective membrane, wherein the method comprises:
a. initially filling an anode chamber feedstock tank with only water;
b. feeding from the anode chamber feedstock tank into the anode chamber an aqueous anode chamber feedstock, the aqueous anode chamber feedstock initially being the water in the anode chamber feedstock tank;
b. feeding into the cathode chamber an aqueous cathode chamber feedstock consisting of an aqueous solution of ammonia as the sole cathode chamber feedstock; and
c. applying an electrical voltage to the anode and cathode to form rinsing liquid in the cathode chamber,
wherein a, b and c are performed, at least in part, simultaneously, and wherein an anode chamber output liquid that is the water and ozone gas resulting from c. either i) is fed from the anode chamber to a waste outlet, or ii) is recycled as anode chamber feedstock such that the anode chamber feedstock tank is also filled with the water and the ozone gas generated from the anode chamber.

2. The method according to claim 1 , wherein the aqueous cathode chamber feedstock has a pH value in a range of 7.5 to 10.5.

3. The method according to claim 1 , wherein a total electrolyte concentration in the aqueous cathode chamber feedstock is in a range of 30 micromolar to 3 millimolar.

4. The method according to claim 1 , wherein a flow rate of the aqueous anode chamber feedstock in the anode chamber is in a range of 0.5 to 10 litres per minute.

5. The method according to claim 1 , wherein a flow rate of cathode chamber feedstock in the cathode chamber is in a range of 3 to 100 litres per minute.

6. The method according to claim 1 , wherein an oxidation-reduction potential of electrolysed water in the cathode chamber is −550 mV or more negative.

7. The method according to claim 1 further comprising rinsing a spinning semiconductor wafer with the aqueous rinsing liquid from the cathode chamber generated in c.

8. The method according to claim 1 , wherein the apparatus comprises the electrochemical cell and further comprises:
a. a pH meter configured to measure the pH of the aqueous cathode chamber feedstock,
b. an oxidation-reduction potential (ORP) sensor configured to measure the ORP of the aqueous rinsing liquid,
c. first and second liquid flow meters configured to control a flow rate of the aqueous cathode chamber feedstock and the aqueous anode chamber feedstock, respectively, and
d. a controller in communication with the pH meter, the ORP sensor and the first and second liquid flow meters,
wherein, in response to data from at least one of the pH meter and the ORP sensor, the controller is configured to at least one of:
adjust a flow rate through the first and second liquid flow meters; and
adjust other parameters of the apparatus.

9. An apparatus for producing an aqueous rinsing liquid, the apparatus comprising:
an electrochemical cell having an anode in an anode chamber and a cathode in a cathode chamber and having an electrical voltage across the anode and cathode, wherein:
the anode chamber and the cathode chamber are separated by a cation-selective membrane,
the anode chamber includes an anode chamber inlet configured to receive an aqueous anode chamber feedstock and an anode chamber outlet configured to output an anode chamber output liquid that is water and ozone gas generated in the anode chamber, wherein the aqueous anode chamber feedstock is initially only water,
the cathode chamber includes a cathode chamber feedstock inlet configured to receive an aqueous cathode chamber feedstock, and
the aqueous cathode chamber feedstock consists of an aqueous solution of ammonia;

an anode chamber feedstock source in fluid communication with the anode chamber inlet via a first pipe and configured to initially be filled with only water, provide the aqueous anode chamber feedstock to the anode chamber via the first pipe,
wherein, during application of the electrical voltage, either i) the anode chamber output liquid is fed from the anode chamber outlet to a waste outlet, or ii) the anode chamber output liquid is recycled as anode chamber feedstock from the anode chamber outlet to the anode chamber feedstock source via a second pipe; and
a cathode chamber feedstock source in fluid communication with the cathode chamber feedstock inlet configured to provide the aqueous cathode chamber feedstock to the cathode chamber.

10. The apparatus according to claim 9 further comprising a wafer rinsing chamber in fluid communication with a cathode chamber outlet of the cathode chamber and configured to receive rinsing liquid generated in the cathode chamber and to rinse a semiconductor wafer with the rinsing liquid.

11. The apparatus according to claim 10 further comprising a rinsing liquid storage tank in fluid communication with the cathode chamber outlet and configured to store the rinsing liquid.

12. The apparatus according to claim 11 wherein the rinsing liquid storage tank includes a rinsing liquid storage tank exhaust port configured to exhaust excess gas.

13. The apparatus according to claim 9 wherein the cathode chamber feedstock source stores a cathode chamber feedstock concentrate and the apparatus includes a dilution point between the cathode chamber feedstock source and a cathode chamber inlet configured to dilute the cathode chamber feedstock concentrate with water before entering the cathode chamber.

14. The apparatus according to claim 9 , further comprising:
a pH meter configured to measure a pH of the aqueous cathode chamber feedstock;
an oxidation-reduction potential (ORP) sensor configured to measure an ORP of the aqueous rinsing liquid;
first and second liquid flow meters configured to control a flow rate of the aqueous cathode chamber feedstock and the aqueous anode chamber feedstock, respectively; and
a controller in communication with the pH meter, the ORP sensor and the first and second liquid flow meters, wherein, in response to data from at least one of the pH meter and the ORP sensor, the controller is configured to at least one of adjust a flow rate through the first and second liquid flow meters and adjust other parameters of the apparatus.

15. The method of claim 1 , wherein the ozone gas is released from the anode chamber feedstock tank via an exhaust port of the anode chamber feedstock tank.

16. The apparatus of claim 9 , wherein:
the anode chamber feedstock source comprises an exhaust port; and
the exhaust port releases the ozone gas from the anode chamber feedstock source.

Assignees

• Lam Res Ag

Inventors

• Hecke Angela
• Wang Hongzhi
• Zerza Guenther

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P70/20

  Cleaning during device manufacture · CPC title

• C02F1/4618 Primary

  for producing "ionised" acidic or basic water · CPC title

• B08B3/041

  Cleaning travelling work · CPC title