Computer-implemented method for defect analysis, apparatus for defect analysis, computer-program product, and intelligent defect analysis system

US11972548B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11972548-B2
Application numberUS-202017438734-A
CountryUS
Kind codeB2
Filing dateDec 3, 2020
Priority dateDec 3, 2020
Publication dateApr 30, 2024
Grant dateApr 30, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A computer-implemented method for defect analysis is provided. The computer-implemented method includes obtaining a plurality of sets of defect point coordinates, a respective set of the plurality of sets of detect point coordinates including coordinates of defect points in a respective substrate of a plurality of substrates, the coordinates of defect points in the respective substrate being coordinates in an image coordinate system; combining the plurality of sets of defect point coordinates according to the image coordinate system into a composite set of coordinates to generate a composite image; and performing a clustering analysis to classify defect points in the composite set in the composite image into a plurality of clusters.

First claim

Opening claim text (preview).

What is claimed is: 1. A computer-implemented method for defect analysis, comprising: obtaining a plurality of sets of defect point coordinates, a respective set of the plurality of sets of defect point coordinates comprising coordinates of defect points in a respective substrate of a plurality of substrates, the coordinates of defect points in the respective substrate being coordinates in an image coordinate system; combining the plurality of sets of defect point coordinates according to the image coordinate system into a composite set of coordinates to generate a composite image; performing a clustering analysis to classify defect points in the composite set in the composite image into a plurality of clusters determining a plurality of contours respectively of at least a plurality of selected clusters of the plurality of clusters, a respective one of the plurality of contours comprising a plurality of edge defect points in a respective one of the plurality of selected clusters; applying a fitting algorithm to edge defect points of the plurality of selected clusters to generate a plurality of mask areas respectively corresponding to the plurality of selected clusters; and generating a plurality of feature vectors respectively of the plurality of mask areas. 2. The computer-implemented method of claim 1 , further comprising obtaining a plurality of selected clusters from the plurality of clusters; wherein a number of defect points in each of the plurality of selected clusters is greater than a threshold number. 3. The computer-implemented method of claim 1 , wherein generating the plurality of feature vectors comprises: generating Hu geometric moment m i,j and center-to-center distance M i,j of a respective one of the plurality of mask areas, wherein m i,j =Σ (x,y)∈A x i y j ; calculating defect point density p, area a, center of mass O (O x , O y ), and direction θ of the respective one of the plurality of mask areas; and generating a respective one of the plurality of feature vectors for the respective one of the plurality of mask areas. 4. The computer-implemented method of claim 3 , wherein a respective one of the plurality of feature vectors is expressed as: F=[ρ,a,Ox,Oy,θ,L,W,r] T ; wherein ρ = N a ,  N stands tor a number of defect points in the respective one of the plurality of mask areas, a stands for an area of the respective one of the plurality of mask areas; O x = m 10 a ; ⁢ O y = m 01 a ; ⁢ θ = - 0.5 ⁢ atc ⁢ tan ⁡ ( 2 ⁢ M 11 M 02 - M 20 ) ; ⁢ M ij = ∑ ( x , y ) ∈ 𝒜 ( x - O x ) i ⁢ ( y - O y ) j ; ⁢ r = L W ;; L stands for a length of a minimal external rectangle of the respective one of the plurality of mask areas; and W stands for a width of a minimal external rectangle of the respective one of the plurality of mask areas. 5. The computer-implemented method of claim 1 , wherein the plurality of contours are determined using an alpha shapes-based method. 6. The computer-implemented method of claim 1 , further comprising: assigning one or more selected mask areas of the plurality of mask areas as a plurality of defect aggregation areas; wherein feature vectors respectively of the one or more selected mask areas satisfy a threshold condition. 7. The computer-implemented method of claim 6 , further comprising: comparing parameters of first defect points inside the one or more selected mask a

Assignees

Inventors

Classifications

  • G06T7/0002Primary

    Inspection of images, e.g. flaw detection · CPC title

  • Depth or shape recovery · CPC title

  • Hierarchical techniques, i.e. dividing or merging patterns to obtain a tree-like representation; Dendograms · CPC title

  • Fusion, i.e. combining data from various sources at the sensor level, preprocessing level, feature extraction level or classification level (multimodal speaker identification or verification G10L17/10) · CPC title

  • G06T7/0004Primary

    Industrial image inspection · CPC title

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What does patent US11972548B2 cover?
A computer-implemented method for defect analysis is provided. The computer-implemented method includes obtaining a plurality of sets of defect point coordinates, a respective set of the plurality of sets of detect point coordinates including coordinates of defect points in a respective substrate of a plurality of substrates, the coordinates of defect points in the respective substrate being co…
Who is the assignee on this patent?
Boe Technology Group Co Ltd
What technology area does this patent fall under?
Primary CPC classification G06T7/0002. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 30 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).