Borehole cement slurry additive, method for storing same, borehole cement slurry, and borehole cementing method

US11965130B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11965130-B2
Application numberUS-202017603287-A
CountryUS
Kind codeB2
Filing dateApr 7, 2020
Priority dateApr 25, 2019
Publication dateApr 23, 2024
Grant dateApr 23, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A borehole cement slurry additive that is capable of suppressing the generation of free water from cement slurries in any environment, whether cold regions, mild regions, or hot regions; and a method for storing the same. The borehole cement slurry additive contains: an aqueous dispersion of silica having an average particle size of 3-200 nm as determined via dynamic light scattering; and a compound having an alcoholic hydroxyl group as a dispersion stabilizer, the compound being included in an amount of 1-30 mol per 1,000 g dispersion medium in the aqueous silica dispersion.

First claim

Opening claim text (preview).

The invention claimed is: 1. An additive for cement slurry for a well, comprising: an aqueous dispersion of colloidal silica particles having an average particle size of 3 to 200 nm by a dynamic light scattering method; and a dispersion stabilizer consisting of at least one compound having an alcoholic hydroxyl group selected from the group consisting of methanol, ethanol, isopropyl alcohol, ethylene glycol, diethylene glycol, propylene glycol, and glycerin, optionally in combination with a water-soluble primary, secondary or tertiary amine, wherein the additive for cement slurry for a well comprises 1 to 30 mol of the compound per 1000 g of a dispersion medium in the aqueous dispersion of the colloidal silica particles, in the case of retaining the additive for cement slurry for a well at −20° C. for 48 hours and subsequently measuring an average particle size by the dynamic light scattering method at +20° C., the average particle size falls within a range of 1.0 to 7.0 times the initial average particle size before the retention, and in the case of retaining the additive for cement slurry for a well at +50° C. for 7 days and subsequently measuring an average particle size by the dynamic light scattering method at +20° C., the average particle size falls within a range of 1.0 to 7.0 times the initial average particle size before the retention. 2. The additive for cement slurry for a well according to claim 1 , wherein the at least one compound having an alcoholic hydroxyl group is at least one polyhydric alcohol selected from the group consisting of ethylene glycol, diethylene glycol, propylene glycol, and glycerin. 3. The additive for cement slurry for a well according to claim 1 , wherein the at least one compound having an alcoholic hydroxyl group is propylene glycol. 4. The additive for cement slurry for a well according to claim 1 , wherein the additive for cement slurry for a well comprises 1 to 25 mol of the compound having an alcoholic hydroxyl group per 1000 g of a dispersion medium in the aqueous dispersion of the colloidal silica particles. 5. The additive for cement slurry for a well according to claim 1 , wherein the additive for cement slurry for a well comprises 1 to 20 mol of the compound having an alcoholic hydroxyl group per 1000 g of a dispersion medium in the aqueous dispersion of the colloidal silica particles. 6. The additive for cement slurry for a well according to claim 1 , which comprises said water-soluble primary, secondary or tertiary amine as a dispersion stabilizer and an antifreezing agent. 7. A method for storing an additive for cement slurry for a well according to claim 1 , comprising the step of retaining the additive for cement slurry for a well in a liquid state in a temperature range of −30° C. to +60° C. 8. A method for storing an additive for cement slurry for a well according to claim 1 , comprising the steps of: freezing the additive for cement slurry for a well; and thawing the frozen additive for cement slurry for a well, followed by redispersion. 9. A cement slurry for a well, comprising an additive according to claim 1 , wherein the cement slurry for a well comprises 0.1% to 10% BWOC of silica, 30 to 60% BWOC of water, and 0.03 to 3.0% BWOC of a dispersion stabilizer. 10. The cement slurry for a well according to claim 9 , further comprising 0.1 to 5% BWOC of a cement hardening retarder, and 0.001 to 10% BWOC of at least one auxiliary agent selected from the group consisting of a dehydration regulator, an antifoamer, a hardening accelerator, a cement dispersant, a cement strength stabilizer, and a lost circulation material. 11. A cementing method for a well, comprising injecting cement slurry for a well according to claim 9 to a gap between a casing pipe inserted in the well and the stratum in boring of the well, followed by hardening.

Assignees

Inventors

Classifications

  • C09K8/467Primary

    containing additives for specific purposes · CPC title

  • Oxides, Hydroxides (C04B22/0013 takes precedence) · CPC title

  • Alcohols; Phenols; Ethers · CPC title

  • containing hydraulic cements other than calcium sulfates · CPC title

  • Hardening retarders · CPC title

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What does patent US11965130B2 cover?
A borehole cement slurry additive that is capable of suppressing the generation of free water from cement slurries in any environment, whether cold regions, mild regions, or hot regions; and a method for storing the same. The borehole cement slurry additive contains: an aqueous dispersion of silica having an average particle size of 3-200 nm as determined via dynamic light scattering; and a com…
Who is the assignee on this patent?
Nissan Chemical Corp
What technology area does this patent fall under?
Primary CPC classification C09K8/467. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 23 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).