Target material control in an EUV light source

Patent metadata

Field	Value
Publication number	US-11963285-B2
Application number	US-202017435861-A
Country	US
Kind code	B2
Filing date	Mar 9, 2020
Priority date	Mar 15, 2019
Publication date	Apr 16, 2024
Grant date	Apr 16, 2024

Abstract

Provided is an apparatus that includes a first reservoir system including a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, a second reservoir system including a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system, a priming system configured to produce a fluid target material from a solid matter, and a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system. The fluid control system is configured to, during operation of the nozzle supply system: isolate at least one fluid reservoir and the nozzle supply system from the priming system, and maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system.

First claim

The invention claimed is:

1. An apparatus for supplying a target material, the apparatus comprising:
a first reservoir system comprising a first fluid reservoir configured to be in fluid communication with a nozzle supply system during operation of the nozzle supply system, the first fluid reservoir maintained at a first pressure;
a second reservoir system comprising a second fluid reservoir configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the first reservoir system;
a priming system configured to receive a solid matter that includes a target material and to produce a fluid target material from the solid matter, the priming system maintained at a priming pressure that is less than the first pressure; and
a fluid control system fluidly connected to the priming system, the first reservoir system, the second reservoir system, and the nozzle supply system, wherein the fluid control system is configured to:
isolate at least one fluid reservoir and the nozzle supply system from the priming system during operation of the nozzle supply system, and
maintain a fluid flow path between at least one fluid reservoir and the nozzle supply system during operation of the nozzle supply system.

2. The apparatus of claim 1 , wherein the priming pressure is less than about 600 kilopascals (kPa).

3. The apparatus of claim 1 , wherein the first pressure is at least 6000 kPa, at least 10,000 kPA, at least 25,000 kPA, or in a range of about 6000-60,000 kPa.

4. The apparatus of claim 1 , wherein, while the second fluid reservoir is being refilled with fluid target material from the priming system, the priming system and the second fluid reservoir are maintained at the priming pressure and the priming system and the second fluid reservoir are positioned relative to each other such that the second fluid reservoir is prevented from overfilling with the fluid target material.

5. The apparatus of claim 1 , wherein the fluid control system is configured to, while the second fluid reservoir is being refilled with fluid target material from the priming system, maintain the fluid flow path between the first fluid reservoir and the nozzle supply system during operation of the nozzle supply system.

6. The apparatus of claim 1 , wherein the fluid control system is configured to clear a target fluid material from each interface defined between the first fluid reservoir, the second fluid reservoir, the priming system, and the nozzle supply system.

7. The apparatus of claim 1 , wherein the fluid control system is configured to maintain the fluid flow path between at least one fluid reservoir and the nozzle supply system during operation of the nozzle supply system by maintaining the fluid flow path between the first fluid reservoir and the nozzle supply system and between the second fluid reservoir and the nozzle supply system during operation of the nozzle supply system and while maintaining the nozzle supply system and the second fluid reservoir at the first pressure.

8. The apparatus of claim 7 , wherein the fluid control system is further configured to maintain the fluid flow path between the at least one fluid reservoir and the nozzle supply system during operation of the nozzle supply system and enabling the fluid flow path between the first fluid reservoir and the second fluid reservoir.

9. The apparatus of claim 1 , further comprising an environment control apparatus configured to:
independently and separately control the first pressure in the first fluid reservoir and a second pressure in the second fluid reservoir, and
independently and separately control a temperature of the first fluid reservoir and a temperature of the second fluid reservoir.

10. The apparatus of claim 9 , wherein the environment control apparatus is further configured to adjust or reset the second pressure of the second fluid reservoir based on a measured amount of fluid target material within the second fluid reservoir.

11. The apparatus of claim 9 , wherein the environment control apparatus includes a pressurized reservoir configured to contain an inert gas and to transfer inert gas from the pressurized reservoir to one or more of the first fluid reservoir and the second fluid reservoir through an orifice.

12. The apparatus of claim 1 , wherein the fluid control system includes a reservoir fluid control valve between the first fluid reservoir and the second fluid reservoir and a refill fluid control valve between the second fluid reservoir and the priming system, wherein the fluid control system is configured to independently control the reservoir fluid control valve and the refill fluid control valve.

13. The apparatus of claim 12 , wherein the reservoir fluid control valve includes a freeze valve and the refill fluid control valve includes a freeze valve.

14. The apparatus of claim 1 , wherein the fluid control system is further configured to maintain the fluid flow path between the first fluid reservoir and the second fluid reservoir during operation of the nozzle supply system.

15. The apparatus of claim 1 , wherein the second fluid reservoir is further configured to be, at least part of the time during operation of the nozzle supply system, in fluid communication with the nozzle supply system.

16. The apparatus of claim 1 , wherein the priming system comprises:
a first chamber including a door that is configured to open so that solid matter can be received within a first volume defined by the first chamber;
a second chamber defining a second volume and being in fluid communication with the fluid control system; and
a flow blocking device formed in an otherwise unobstructed fluid path between the first chamber and the second chamber.

17. The apparatus of claim 16 , wherein the flow blocking device is a freeze valve in which a fluid flow path is blocked by the solid matter when maintained at a temperature below the melting point of the solid matter.

18. The apparatus of claim 1 , further comprising a sensing system configured to estimate a volume of the fluid target material in one or more of the first fluid reservoir, the second fluid reservoir, and the priming system and/or a presence of solid matter within the priming system.

19. The apparatus of claim 18 , further comprising a control system in communication with the sensing system, the control system being configured to determine a consumption rate of the fluid target material in the second fluid reservoir, the consumption rate being the amount of the fluid target material used per a time period, based on the output from the high pressure transducer.

20. A method for continuously supplying a target material in an uninterrupted manner, the method comprising:
receiving a solid matter that includes a target material in a priming system maintained at a priming pressure and producing a fluid target material from the solid matter;
maintaining fluid communication between a first fluid reservoir and a nozzle supply system during operation of the nozzle supply system while maintaining the first fluid reservoir at a first pressure that is greater than the priming pressure; and
at least part of the time during operation of the nozzle supply system, enabling a transfer of fluid target material between the first fluid reservoir and a second fluid reservoir at the first pressure while the fluid target material is being produced in the priming system at the priming pressure.

21. The method of claim 20 , further comprising maintaining the

Assignees

• Asml Netherlands Bv

Inventors

• Govindaraju Abhiram Lakshmi Ganesh
• Bessems David
• Rai Sandeep
• Willems Petrus Adrianus
• Kincal Serkan
• Lukens Joshua Mark
• Tedrow Jon David

Classifications

• H05G2/0027 Primary

  Arrangements for controlling the supply; Arrangements for measurements · CPC title

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H05G2/006 Primary

  Electricity · mapped topic

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title