Nanostructure featuring nano-topography with optimized electrical and biochemical properties

Patent metadata

Field	Value
Publication number	US-11959874-B2
Application number	US-201816204545-A
Country	US
Kind code	B2
Filing date	Nov 29, 2018
Priority date	Nov 29, 2018
Publication date	Apr 16, 2024
Grant date	Apr 16, 2024

Abstract

A nanostructure includes a base layer including a surface. The nanostructure further includes nano-patterned features including non-random topography located on the surface of the base layer. The nanostructure also includes an encapsulating layer including a conductive material arranged on the nano-patterned features.

First claim

What is claimed is:

1. A nanostructure comprising:
a base layer comprising a surface;
nano-patterned features comprising non-random topography located on the surface of the base layer;
a textured metal layer comprising a conductive material arranged directly on the nano-patterned features, the textured metal layer being a coating that covers all exposed sidewall surfaces of the nano-patterned features, the textured metal layer comprising dendritic structures; and
a biological functionalization material arranged directly on the textured metal layer such that portions of the dendritic structures extend through portions of the biological functionalization material.

2. The nanostructure of claim 1 , wherein the nano-patterned features comprise gold, platinum, copper, silver, tungsten, aluminum, iron, palladium, nickel, titanium, zirconium, phosphorus, carbon, or a combination thereof.

3. The nanostructure of claim 1 , wherein the textured metal layer comprises platinum, copper, silver, gold, tungsten, aluminum, iron, palladium, nickel, titanium, zirconium, phosphorus, carbon, or a combination thereof.

4. The nanostructure of claim 1 , wherein the non-random topography comprises repeating individually articulated features, and each repeating individually articulated feature has a width from 5 to 900 nm, and a height from 5 nm to 20 μm.

5. The nanostructure of claim 3 , wherein the textured metal layer is platinum.

6. The nanostructure of claim 1 , wherein the conductive material of the textured metal layer is in a crystalline state.

7. The nanostructure of claim 1 , wherein the conductive material of the textured metal layer is in an amorphous state.

8. The nanostructure of claim 1 , wherein the conductive material includes a metallic material.

9. The nanostructure of claim 1 , wherein the conductive material includes a metallic alloy.

10. The nanostructure of claim 1 , wherein the conductive material includes a non-metallic component.

Assignees

• IBM

Inventors

• Camagong Cristina
• Deligianni Hariklia
• Kinser Emily R
• Yu Roy

Classifications

• G01N27/3278 Primary

  involving nanosized elements, e.g. nanogaps or nanoparticles (nanopores G01N33/48721; magnetic beads G01N27/745) · CPC title

• B82B1/005

  Constitution or structural means for improving the physical properties of a device · CPC title

• B82B3/008

  Processes for improving the physical properties of a device · CPC title

• G01N27/3276

  being a hybridisation with immobilised receptors (using a FET type sensor G01N27/4145; concerning the hybridisation C12Q1/68) · CPC title

• B81C1/00031

  Regular or irregular arrays of nanoscale structures, e.g. etch mask layer (photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002) · CPC title