Film bulk acoustic resonator package with thin film sealing structure and manufacturing method therefor

US11949401B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11949401-B2
Application numberUS-202117202802-A
CountryUS
Kind codeB2
Filing dateMar 16, 2021
Priority dateJul 30, 2020
Publication dateApr 2, 2024
Grant dateApr 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for manufacturing a film bulk acoustic resonator (FBAR) package with a thin film sealing structure includes: forming an FBAR having a bottom electrode, a piezoelectric layer, and a top electrode on a substrate; forming a plurality of inner pad electrodes electrically connected to the top electrode and the bottom electrode of the FBAR; attaching a PR (photo-resist) film to tops of the inner pad electrodes; etching the PR film to expose the inner pad electrodes to the outside; and forming a sealing layer on top of the PR film and tops of the exposed inner pad electrodes.

First claim

Opening claim text (preview).

What is claimed is: 1. A film bulk acoustic resonator (FBAR) package with a thin film sealing structure, comprising: a substrate; an FBAR formed on the substrate and having a bottom electrode, a piezoelectric layer, and a top electrode; a plurality of inner pad electrodes electrically connected to the top electrode and the bottom electrode of the FBAR; a PR (photo-resist) film supportedly located on tops of the inner pad electrodes; a sealing layer stackedly formed on top of the PR film; and outer pad electrodes connected to the inner pad electrodes through vias penetrating the PR film and the sealing layer. 2. The FBAR package according to claim 1 , wherein the sealing layer comprises a plurality of thin film gas barriers. 3. The FBAR package according to claim 1 , further comprising a dam formed on the outsides of the inner pad electrodes to surround the entire package. 4. The FBAR package according to claim 3 , wherein the dam is made of the same material as the inner pad electrodes. 5. The FBAR package according to claim 3 , wherein the dam supports the PR film and the sealing layer together at the same height as the inner pad electrodes. 6. The FBAR package according to claim 2 , wherein at least neighboring thin film gas barriers of the plurality of thin film gas barriers are made of different kinds of materials from each other. 7. The FBAR package according to claim 2 , wherein the last thin film gas barrier of the plurality of thin film gas barriers has the highest degree of hydrophobicity. 8. The FBAR package according to claim 2 , wherein the last thin film gas barrier located on the topmost position of the plurality of thin film gas barriers is coated with a hydrophobic material. 9. The FBAR package according to claim 2 , wherein the sealing layer comprises at least one metal thin film gas barrier, and the vias penetrating the PR film and the sealing layer comprise insulating layers formed on the inner peripheral surfaces thereof so as to connect the inner pad electrodes and the outer pad electrodes. 10. The FBAR package according to claim 1 , further comprising a plurality of FBARS and an inner pad electrode located between the outer pad electrodes in such a manner as to be not connected to any outer pad electrode on the section traversing at least two or more FBARs of the plurality of FBARs.

Assignees

Inventors

Classifications

  • H03H9/105Primary

    the enclosure being defined by a cover cap mounted on an element forming part of the BAW device · CPC title

  • H03H3/02Primary

    for the manufacture of piezoelectric or electrostrictive resonators or networks (H03H3/08 takes precedence) · CPC title

  • consisting of mounting pads or bumps · CPC title

  • Air-gaps · CPC title

  • the resonators or networks being of the air-gap type · CPC title

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What does patent US11949401B2 cover?
A method for manufacturing a film bulk acoustic resonator (FBAR) package with a thin film sealing structure includes: forming an FBAR having a bottom electrode, a piezoelectric layer, and a top electrode on a substrate; forming a plurality of inner pad electrodes electrically connected to the top electrode and the bottom electrode of the FBAR; attaching a PR (photo-resist) film to tops of the i…
Who is the assignee on this patent?
Wisol Co Ltd
What technology area does this patent fall under?
Primary CPC classification H03H9/105. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).