Gas management system

US11949203B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11949203-B2
Application numberUS-201916965461-A
CountryUS
Kind codeB2
Filing dateJan 10, 2019
Priority dateFeb 15, 2018
Publication dateApr 2, 2024
Grant dateApr 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas chamber supply system comprising: a first gas source configured to fluidly connect to a first inlet of a first gas chamber and configured to supply a first gas mixture that contains a first plurality of gases, at least one of the gases in the first plurality includes a halogen; a second gas source configured to fluidly connect to a second inlet of the first gas chamber and configured to supply a second gas mixture that contains a second plurality of gases, the second plurality of gases lacking a halogen, the second gas source comprising: a pre-prepared gas supply including the second gas mixture; a recycled gas supply including the second gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply; a gas analysis system that receives a sample of the recycled gas supply and analyzes gas components within the recycled gas supply; and a control system connected to the gas analysis system and to the fluid flow switch and configured to: receive the analysis from the gas analysis system; determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply as the second gas source based on the determination. 2. The gas chamber supply system of claim 1 , further comprising a pressure measurement system that measures a pressure of the recycled gas supply, wherein the control system receives an output from the pressure measurement system, and adjusts the signal to the fluid flow switch based on the output from the pressure measurement system. 3. The gas chamber supply system of claim 1 , wherein the second gas mixture includes at least a gain medium component having a noble gas and at least a buffer component. 4. The gas chamber supply system of claim 3 , wherein the noble gas in the gain medium component is argon (Ar) and the buffer component includes a noble gas. 5. The gas chamber supply system of claim 3 , wherein the analysis of the gas components within the recycled gas supply includes measuring an amount of the gain medium component having the noble gas and measuring an amount of the buffer component. 6. The gas chamber supply system of claim 1 , wherein the recycled gas supply including the gas mixture is received from a gas blending system of a gas recycle system. 7. The gas chamber supply system of claim 1 , wherein the gas analysis system comprises a mass spectrometer, a gas chromatograph, or a Fourier-transform infrared (FTIR) spectrometer. 8. The gas chamber supply system of claim 1 , further comprising a fluid conduit configured to fluidly connect the first gas source to the first fluid inlet, and a fluid bus configured to fluidly connect the second gas source to the second fluid inlet. 9. A gas chamber supply system comprising: a first gas source configured to fluidly connect to a first inlet of a first gas chamber and configured to supply a first gas mixture that contains a first plurality of gases, at least one of the gases in the first plurality includes a halogen; a second gas source configured to fluidly connect to a second inlet of the first gas chamber and configured to supply a second gas mixture that contains a second plurality of gases, the second plurality of gases lacking a halogen, the second gas source comprising: a pre-prepared gas supply including the second gas mixture; a recycled gas supply including the second gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply; and a gas recycle system configured to supply the second gas mixture to the recycled gas supply, the gas recycle system comprising: a gas purifier system configured to receive a gas mixture exhausted from a second gas chamber that is distinct from the first gas chamber; a gas analysis system that receives the purified gas mixture and analyzes the gas components within the purified gas mixture; and a gas blending system that prepares a recycled gas mixture and outputs the recycled gas mixture as the second gas mixture of the recycled gas supply; and a control system connected to the gas recycle system and to the fluid flow switch, and configured to provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply as the second gas source. 10. The gas chamber supply system of claim 9 , further comprising a pressure measurement system that measures a pressure of the recycled gas supply, wherein the control system receives an output from the pressure measurement system, and adjusts the signal to the fluid flow switch based on the output from the pressure measurement system. 11. The gas chamber supply system of claim 9 , wherein the purified gas mixture includes at least a gain medium component having a noble gas and at least a buffer component. 12. The gas chamber supply system of claim 11 , wherein the noble gas in the gain medium component is argon (Ar) and the buffer component includes a noble gas. 13. The gas chamber supply system of claim 11 , wherein the analysis of the gas components within the purified gas mixture includes measuring an amount of the gain medium component having the noble gas and measuring an amount of the buffer component. 14. The gas chamber supply system of claim 9 , wherein the gas analysis system comprises a mass spectrometer, a gas chromatograph, or a Fourier-transform infrared (FTIR) spectrometer. 15. A gas chamber supply system comprising: a first gas source configured to fluidly connect to a first inlet of a first set of gas chambers, and configured to supply a first gas mixture that contains a first plurality of gases, at least one of the gases in the first plurality includes a halogen; a second gas source configured to fluidly connect to a second inlet of the first set of gas chambers, and configured to supply a second gas mixture that contains a second plurality of gases, the second plurality of gases lacking a halogen, the second gas source comprising: a pre-prepared gas supply including the second gas mixture; a recycled gas supply including the second gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply; and a gas recycle system configured to supply the second gas mixture to the recycled gas supply, the gas recycle system comprising: a gas purifier system fluidly connected to the output to receive a gas mixture exhausted from at least one of the gas chambers of a second set of gas chambers; a gas analysis system that receives the purified gas mixture and analyzes the gas components within the purified gas mixture; and a gas blending system that prepares a recycled gas mixture and outputs the recycled gas mixture as the second gas mixture of the recycled gas supply; and a control system connected to the gas recycle system and to the fluid flow switch, and configured to provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply as the second gas source. 16. The gas chamber supply system of claim 15 , further comprising a pressure measurement system that measures a pressure of the recycled gas supply, wherein the control system receives an output from the pressure measurement system, and adjusts the signal to the fluid flow switch based on the output from the pressure measurement system. 17. The gas chamber supply system of claim 15 , wh

Assignees

Inventors

Classifications

  • H01S3/036Primary

    Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube {(H01S3/031 takes precedence)} · CPC title

  • with stationary adsorbents {(B01D53/025 takes precedence)} · CPC title

  • Controlling by gas-analysis apparatus (regulating non electrical variables in general G05D) · CPC title

  • characterised by the construction of the controlling means · CPC title

  • Concentration, pH, pOH, p(ION) or oxygen-demand (B01F35/2133 takes precedence) · CPC title

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What does patent US11949203B2 cover?
A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-pr…
Who is the assignee on this patent?
Cymer LLC
What technology area does this patent fall under?
Primary CPC classification H01S3/036. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).