Gas management system

US11949202B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11949202-B2
Application numberUS-201816965458-A
CountryUS
Kind codeB2
Filing dateFeb 15, 2018
Priority dateFeb 15, 2018
Publication dateApr 2, 2024
Grant dateApr 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second range of acceptable values. If the measured amount of the at least one intended gas component is not within the first range of acceptable values, the control system causes the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas is not within the second range of acceptable values, the control system generates an error signal.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas recycle system comprising: a gas purifier system configured to receive an exhaust gas mixture from an excimer laser, the exhaust gas mixture comprising intended gas components and impurity gas components, the gas purifier system being configured to reduce an amount of at least one of the impurity gas components to form a purified gas mixture based on the exhausted gas mixture; a gas analysis system comprising a measurement system configured to receive at least a portion of the purified gas mixture and to measure an amount of at least one intended gas component in the purified gas mixture and an amount of at least one impurity gas component in the purified gas mixture; a gas blending system that prepares a recycled gas mixture based on the purified gas mixture; and a control system coupled to the gas analysis system and the gas blending system, the control system configured to: determine whether the measured amount of the at least one intended gas component is within a first range of acceptable values; determine whether the measured amount of the at least one impurity gas component is within a second range of acceptable values; if the measured amount of the at least one intended gas component is not within the first range of acceptable values, cause the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture; and if the measured amount of the at least one impurity gas component is not within the second range of acceptable values, generating an error signal. 2. The gas recycle system of claim 1 , wherein the impurity gas components comprise water (H 2 O), carbon dioxide (CO 2 ), tetrafluoromethane (CF 4 ), and/or nitrogen trifluoride (NF 3 ). 3. The gas recycle system of claim 1 , wherein the intended gas components comprise at least two noble gases, and the impurity gas components comprise any gas that is not a noble gas. 4. The gas recycle system of claim 1 , wherein the control system being configured to generate an error signal if the measured amount of the at least one impurity gas is not within the second range of acceptable values comprises the control system being configured to generate a command signal that, when provided to a fluid control switch that is connected to a pre-prepared gas mixture and to the recycled gas mixture, cause the fluid control switch to supply the pre-prepared gas mixture to a laser and to not supply the recycled gas mixture to the laser. 5. The gas recycle system of claim 1 , wherein each of the impurity gas components is associated with a respective range of acceptable values, and the control system is configured to determine whether the measured amount of each impurity gas component is within the acceptable range of values for that impurity gas component. 6. The gas recycle system of claim 1 , wherein the measurement system comprises a mass spectrometer, a gas chromatograph, or a Fourier-transform infrared (FTIR) spectrometer. 7. The gas recycle system of claim 1 , wherein the control system being configured to cause the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture comprises the control system being configured to add a noble gas to the purified gas mixture. 8. The gas recycle system of claim 7 , wherein the purified gas mixture comprises at least some of the noble gas prior to the control system causing the gas blending system to add the noble gas to the purified gas mixture. 9. A gas recycle system comprising: a gas blending system that receives a purified gas mixture and prepares a recycled gas mixture based on the received purified gas mixture; a gas analysis system comprising a measurement system configured to: measure an amount of at least one noble gas in the purified gas mixture received at the gas blending system, and measure an amount of the at least one noble gas in the prepared recycled gas mixture; and a control system configured to: determine whether the measured amount of the at least one noble gas in the purified gas mixture received at the gas blending system is within an acceptable range of values; if the measured amount of the at least one noble gas in the purified gas mixture is not within the range of acceptable values, cause the gas blending system to add at least one additional gas component to the purified gas mixture to prepare the recycled gas mixture; and determine whether the measured amount of the at least one noble gas in the prepared recycled gas mixture is within the acceptable range of values. 10. The gas recycle system of claim 9 , wherein the control system is further configured to cause a gas supply system to provide the prepared recycled gas to an excimer laser only if the measured amount of the at least one noble gas in the prepared recycled gas mixture is within the acceptable range of values. 11. The gas recycle system of claim 9 , wherein the purified gas mixture comprises at least two noble gases, the measurement system is configured to measure an amount of each of the at least two noble gases in the purified gas mixture received at the gas blending system, the measurement system is configured to measure an amount of each of the at least two noble gases in the prepared recycled gas mixture, each of the two or more noble gases is associated with an acceptable range of values, and the control system is configured to determine whether the measured amount of each noble gas in the purified gas mixture and in the prepared recycled gas mixture is within the acceptable range of values for that noble gas. 12. The gas recycle system of claim 9 , wherein the measurement system comprises a mass spectrometer, a gas chromatograph, or a Fourier-transform infrared (FTIR) spectrometer. 13. A gas recycle system comprising: a laser exhaust gas collection system comprising a plurality of inlet ports and an outlet port, each inlet port being configured to be fluidly coupled to an exhaust gas outlet port of an excimer laser; a gas purifier system fluidly coupled to the outlet port of the laser exhaust gas collection system and configured to produce a purified gas mixture based on gas mixtures exhausted from any of the excimer lasers fluidly coupled to the laser exhaust gas collection system; a gas analysis system comprising a measurement system configured to measure an amount of at least one impurity gas component in the purified gas mixture; a gas blending system that prepares a recycled gas mixture based on the purified gas mixture; and a control system coupled to the gas analysis system and the gas blending system, the control system configured to: determine whether the measured amount of the at least one impurity gas component is within a range of acceptable values; and if the measured amount of the at least one impurity gas component is not within the range of acceptable values, causing the gas blending system to add an additional gas component to the purified gas mixture to prepare the recycled gas mixture. 14. The gas recycle system of claim 13 , wherein the gas analysis system is further configured to measure an amount of the at least one impurity gas component in the recycled gas mixture. 15. The gas recycle system of claim 14 , wherein the control system is further configured to determine whether the measured amount of the at least one impurity gas component in the recycled gas mixture is within the acceptable range of values. 16. The gas recycle system of claim 15 , wherein the the purified gas mixture comprises a noble gas, and the gas an

Assignees

Inventors

Classifications

  • Process monitoring, e.g. flow or thickness monitoring · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

  • Production flow monitoring, e.g. for increasing throughput · CPC title

  • H01S3/036Primary

    Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube {(H01S3/031 takes precedence)} · CPC title

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What does patent US11949202B2 cover?
A gas recycle system includes a gas purifier system; a gas analysis system; a gas blending system that prepares a recycled gas mixture; and a control system configured to: determine whether a measured amount of at least one intended gas component is within a first range of acceptable values; and determine whether a measured amount of the at least one impurity gas component is within a second ra…
Who is the assignee on this patent?
Cymer LLC
What technology area does this patent fall under?
Primary CPC classification H10P72/0612. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).