Photocurable composition with enhanced thermal stability

US11945966B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11945966-B2
Application numberUS-202117643534-A
CountryUS
Kind codeB2
Filing dateDec 9, 2021
Priority dateDec 9, 2021
Publication dateApr 2, 2024
Grant dateApr 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one first polymerizable monomer having a structure of Formula (1): (R 1 ) x —Ar—(R 2 ) y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R 1 being a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; and R 2 being —CH═CH 2 or —CCH 3 =CH 2 covalently bonded to Ar; y being 1-4.

First claim

Opening claim text (preview).

What is claimed is: 1. A photocurable composition comprising a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one first polymerizable monomer having a structure of formula (1): (R 1 ) x —Ar—(R 2 ) y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R 1 being a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; R 2 being —CH═CH 2 or —CCH 3 ═CH 2 covalently bonded to Ar; y being 1-4, and wherein an amount of the at least one first polymerizable monomer is in a range from 50 wt % to 100 wt % based on the total weight of the polymerizable material. 2. The photocurable composition of claim 1 , wherein Ar is selected from benzene, phenylbenzene, or naphthalene. 3. The photocurable composition of claim 2 , wherein the at least one first polymerizable monomer comprises a structure of formula (2) or formula (3): with R 3 being C1-C5 alkyl or oxyalkyl, x being 1-4; R 4 being hydrogen or C1-C4 alkyl; y being 1-4, and z being 1-3. 4. The photocurable composition of claim 3 , wherein the at least one first polymerizable monomer comprises at least one of the following structures: 5. The photocurable composition of claim 1 , wherein the at least one first polymerizable monomer has a vapor pressure not greater than 0.01 mmHg at 25° C. 6. The photocurable composition of claim 5 A photocurable composition comprising a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one first polymerizable monomer having a structure of formula (1): (R 1 ) x —Ar—(R 2 ) y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R 1 being a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; R 2 being —CH═CH 2 or —CCH 3 ═CH 2 covalently bonded to Ar; y being 1-4, wherein the at least one first polymerizable monomer has a vapor pressure not greater than 0.001 mmHg at 25° C. 7. The photocurable composition of claim 1 , wherein the polymerizable material further comprises at least one second polymerizable monomer having a different structure than Formula I. 8. The photocurable composition of claim 7 , wherein the at least one second polymerizable monomer includes at least one mono-functional acrylate monomer. 9. The photocurable composition of claim 7 , wherein the at least one second polymerizable monomer comprises at least one mono-functional monomer and at least one multi-functional monomer. 10. The photocurable composition of claim 1 , wherein an amount of the polymerizable material is at least 80 wt % based on the total weight of the photocurable composition. 11. The photocurable composition of claim 1 , wherein a viscosity at 23° C. of the photocurable composition is not greater than 50 mPa s. 12. The photocurable composition of claim 1 , wherein the photocurable composition comprises a solvent in an amount of at least 15 vol % based on the total volume of the photocurable composition. 13. The photocurable composition of claim 1 , wherein the photocurable composition is essentially free of a solvent. 14. A laminate comprising a substrate and a photo-cured layer overlying the substrate, wherein the photo-cured layer is formed from the photocurable composition of claim 1 . 15. The laminate of claim 14 , wherein the photo-cured layer has an Ohnishi number of not greater than 3.2. 16. The laminate of claim 14 , wherein the photo-cured layer has degradation temperature of at least 300° C. 17. A method of forming a photo-cured layer on a substrate, comprising: applying a layer of a photocurable composition on the substrate, wherein the photocurable composition comprises a photoinitiator and a polymerizable material, the polymerizable material comprising at least one first polymerizable monomer having a structure of formula (1): (R 1 ) x —Ar—(R 2 ) y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R 1 being a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; R 2 being —CH═CH2 or —CCH 3 ═CH 2 covalently bonded to Ar; y being 1-4, and wherein an amount of the at least one first polymerizable monomer is in a range from 50 wt % to 100 wt % based on the total weight of the polymerizable material; bringing the photocurable composition into contact with a template or a superstrate; irradiating the photocurable composition with light to form a photo-cured layer; and removing the template or the superstrate from the photo-cured layer. 18. The method of claim 17 , wherein the cross-linking agent comprises a structure of formula (2) or formula (3): with R 3 being C 1 -C 5 being alkyl or oxyalkyl, x being 1-4; R 4 being hydrogen or C1-C4 alkyl, y being 1-4, and z being 1-3. 19. A method of manufacturing an article, comprising forming a photo-cured layer on a substrate according to claim 17 , and further comprising: forming a pattern on the substrate; processing the substrate on which the pattern has been formed in the forming; and manufacturing an article from the substrate processed in the processing.

Assignees

Inventors

Classifications

  • Homopolymers or copolymers of esters (C09D135/06, C09D135/08 take precedence) · CPC title

  • Homopolymers or copolymers of acrylic acid esters · CPC title

  • C09D4/00Primary

    Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond {; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16} · CPC title

  • with sensitising agents · CPC title

  • Monomers containing two or more unsaturated aliphatic radicals · CPC title

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Frequently asked questions

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What does patent US11945966B2 cover?
A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one first polymerizable monomer having a structure of Formula (1): (R 1 ) x —Ar—(R 2 ) y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R 1 being a structure covalently bonded to Ar including at least one acrylate group; x…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification C09D4/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).