Structure for microbe detection, manufacturing method therefor, and microbe detection method using same structure for microbe detection

US11940446B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11940446-B2
Application numberUS-201817044878-A
CountryUS
Kind codeB2
Filing dateMay 16, 2018
Priority dateApr 3, 2018
Publication dateMar 26, 2024
Grant dateMar 26, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method for manufacturing a structure for microbe detection comprises the steps of: reacting nitrilotriacetic acid (NTA) and an acid anhydride to prepare a first compound; chelation of metal ions to the first compound to prepare a second compound; binding the second compound and a microbe detector to prepare a third compound; and mixing an exfoliated transition metal-dichalcogenide (TMD) compound and the third compound to prepare a structure for microbe detection, in which the metal ions of the third compound are bound with the transition metal-dichalcogenide compound.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for manufacturing a structure for microbe detection, the method comprising: reacting nitrilotriacetic acid (NTA) and an acid anhydride to prepare a first compound; chelation of metal ions to the first compound to prepare a second compound; binding the second compound and a microbe detector to prepare a third compound; and mixing an exfoliated transition metal-dichalcogenide (TMD) compound and the third compound to prepare a structure for microbe detection, in which the metal ions of the third compound are bound with the transition metal-dichalcogenide compound. 2. The method of claim 1 , wherein the preparing of the first compound comprises: dissolving the nitrilotriacetic acid in a solvent; adding and stirring the acid anhydride and a non-nucleophilic basic material into the solvent in which the nitrilotriacetic acid is dissolved, so as to prepare a mixed solution containing a preliminary first compound; adding an excessive amount of ester into the mixed solution to precipitate the preliminary first compound of the mixed solution; and washing and freeze-drying the precipitated preliminary first compound to prepare the first compound. 3. The method of claim 1 , wherein the preparing of the second compound comprises dissolving the first compound in a solvent and adding the metal ions into a resulting solution. 4. The method of claim 3 , wherein the preparing of the second compound is performed at pH in a range of more than 3.7 and less than 6.0. 5. The method of claim 3 , wherein the preparing of the third compound comprises: adding a cross-linking agent including carbodiimide into the second compound; and adding and stirring the microbe detector into the second compound to which the cross-linking agent is added. 6. The method of claim 5 , wherein the adding of the cross-linking agent into the second compound comprises adding an activation material of the cross-linking agent in addition to the cross-linking agent. 7. The method of claim 1 , wherein the microbe detector comprises at least one of biomolecules including peptide, DNA or RNA.

Assignees

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Classifications

  • Enterobacteria, e.g. shigella, salmonella, klebsiella, serratia · CPC title

  • Selenium; Tellurium; Compounds thereof (phosphorus compounds C01B25/14) · CPC title

  • Compounds of tungsten · CPC title

  • Tellurides or selenides of metals (C01B19/002 takes precedence) · CPC title

  • Measuring fluorescence of biological material, e.g. DNA, RNA, cells (G01N21/6428 takes precedence) · CPC title

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What does patent US11940446B2 cover?
A method for manufacturing a structure for microbe detection comprises the steps of: reacting nitrilotriacetic acid (NTA) and an acid anhydride to prepare a first compound; chelation of metal ions to the first compound to prepare a second compound; binding the second compound and a microbe detector to prepare a third compound; and mixing an exfoliated transition metal-dichalcogenide (TMD) compo…
Who is the assignee on this patent?
Iucf Hyu Erica Campus
What technology area does this patent fall under?
Primary CPC classification G01N33/56916. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 26 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).