Nanosurfactant formulations and use therefor

US11939481B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11939481-B2
Application numberUS-202117357805-A
CountryUS
Kind codeB2
Filing dateJun 24, 2021
Priority dateJun 25, 2020
Publication dateMar 26, 2024
Grant dateMar 26, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are an ink composition, comprising greater than 0.2% by weight a graphene quantum dot nanosurfactant, a printable material, and a solvent, wherein the printable material is dispersed in the solvent by the graphene quantum dot nanosurfactant, and a method of preparing an ink composition. Advantageously, the present ink composition may be printed onto 2D and 3D substrates to form printed films with improved mechanical stability and photoconductance.

First claim

Opening claim text (preview).

What is claimed is: 1. An ink composition, comprising: about 0.5% to about 2.0% by weight of a graphene quantum dot nanosurfactant; a printable material; and a solvent, wherein the printable material is dispersed in the solvent by the graphene quantum dot nanosurfactant, and wherein a weight ratio of the printable material to the graphene quantum dot nanosurfactant is about 0.1:1 to about 2:1. 2. The ink composition of claim 1 , wherein the graphene quantum dot nanosurfactant is produced by reacting citric acid and 4-styrenesulfonic acid sodium salt. 3. The ink composition of claim 1 , wherein the printable material comprises graphene, transition metal dichalcogenide (TMD), hexagonal boron nitride (h-BN), carbon nanotubes (CNT), or a combination thereof. 4. The ink composition of claim 1 , comprising about 0.1% to about 2.0% by weight the printable material. 5. The ink composition of claim 1 , comprising about 0.5% to about 2.0% by weight the printable material. 6. The ink composition of claim 1 , wherein the solvent comprises water, ethanol, isopropanol, cyclohexanone, terpineol, ethylene glycol, or a combination thereof. 7. The ink composition of claim 1 , having a Zeta potential of about −50 mV to about −65 mV. 8. An ink composition, comprising: greater than 0.2% by weight of a graphene quantum dot nanosurfactant; about 0.5% to about 2.0% by weight of a printable material; and a solvent, wherein the printable material is dispersed in the solvent by the graphene quantum dot nanosurfactant, and wherein a weight ratio of the printable material to the graphene quantum dot nanosurfactant is about 0.1:1 to about 2:1. 9. The ink composition of claim 8 , wherein the graphene quantum dot nanosurfactant is produced by reacting citric acid and 4-styrenesulfonic acid sodium salt. 10. The ink composition of claim 8 , wherein the printable material comprises graphene, transition metal dichalcogenide (TMD), hexagonal boron nitride (h-BN), carbon nanotubes (CNT), or a combination thereof. 11. The ink composition of claim 8 , wherein the solvent comprises water, ethanol, isopropanol, cyclohexanone, terpineol, ethylene glycol, or a combination thereof.

Assignees

Inventors

Classifications

  • C09D11/38Primary

    characterised by non-macromolecular additives other than solvents, pigments or dyes · CPC title

  • characterised by the solvent · CPC title

  • characterised by the pigment · CPC title

  • Pigment inks · CPC title

  • Electrically conductive inks · CPC title

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Frequently asked questions

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What does patent US11939481B2 cover?
Provided are an ink composition, comprising greater than 0.2% by weight a graphene quantum dot nanosurfactant, a printable material, and a solvent, wherein the printable material is dispersed in the solvent by the graphene quantum dot nanosurfactant, and a method of preparing an ink composition. Advantageously, the present ink composition may be printed onto 2D and 3D substrates to form printed…
Who is the assignee on this patent?
Univ Notre Dame Du Lac
What technology area does this patent fall under?
Primary CPC classification C09D11/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 26 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).