Method of manufacturing an implantable neural electrode interface platform

US11938314B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11938314-B2
Application numberUS-202016921486-A
CountryUS
Kind codeB2
Filing dateJul 6, 2020
Priority dateFeb 22, 2016
Publication dateMar 26, 2024
Grant dateMar 26, 2024

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present disclosure discusses a method of manufacturing an implantable neural electrode. The method includes cutting a metal layer to form a plurality of electrode sites, contact pads and metal traces connecting the electrode sites to the contact pads. A first silicone layer including a mesh is formed and coupled to the metal layer. A second silicone layer is formed and laminated to the first silicone layer coupled with the metal layer. Holes are formed in the first or second silicone layer exposing the contact pads and electrode sites. Wires are welded to the exposed contact pads and a third layer of silicone is overmolded over the contact pads and wires.

First claim

Opening claim text (preview).

What is claimed: 1. A method of manufacturing an implantable neural electrode comprising: cutting a metal layer to form a plurality of electrode sites, contact pads and metal traces, wherein the metal layer is about 5 μm to 25 μm thick and wherein the metal traces connect one or more electrode sites to one or more contact pads; forming a first silicone layer by: knife-coating a polymer mesh with silicone, such that the first silicone layer has a thickness between about 50 μm and about 100 μm, and curing the first silicone layer; coupling the metal layer to the first silicone layer; forming a second silicone layer by calendaring silicone to a thickness between about 50 μm and about 100 μm; laminating the first silicone layer to the second silicone layer such that the metal layer is positioned between the first silicone layer and the second silicone layer; forming a first set of holes in the first or second silicone layers to expose one or more electrode sites and a second set of holes in the first or second silicone layers to expose one or more contact pads in the metal layer; after exposing the one or more contact pads, welding one or more wires to the one or more exposed contact pads; and overmolding a third silicone layer over the one or more welded contact pads and a portion of the wires. 2. The method of claim 1 , further comprising applying a release tape to the metal layer prior to cutting the metal layer. 3. The method of claim 2 , further comprising removing the release tape from the metal layer after coupling the cut metal layer to the first silicone layer. 4. The method of claim 3 , wherein removing the release tape comprises one of heating the release tape, dissolving the release tape with a solvent and exposing the release tape to ultraviolet light. 5. The method of claim 1 , wherein prior to laminating the first silicone layer to the second silicone layer the method further comprises cleaning the metal layer with oxygen plasma. 6. The method of claim 5 , wherein after cleaning the metal layer with oxygen plasma the method further comprises depositing a primer on the metal layer. 7. The method of claim 1 , wherein forming the first silicone layer comprises knife-coating the mesh such that the first silicone layer is between about 60 μm and about 90 μm thick and forming the second silicone layer comprises calendaring the second layer of silicone to be between about 60 μm and about 90 μm thick. 8. The method of claim 1 , wherein forming the first silicone layer comprises knife-coating the mesh such that the first silicone layer is between about 70 μm and about 80 μm thick and forming the second silicone layer comprises calendaring the second silicone layer to be between about 70 μm and about 80 μm thick. 9. The method of claim 1 , further comprising cutting the metal layer and forming the first set of holes and the second set of holes in the first or second silicone layers using laser ablation. 10. The method of claim 9 , wherein the laser ablation comprises using a picosecond pulsed laser. 11. The method of claim 1 , wherein the mesh comprises nylon, polyamide or polyester fibers. 12. The method of claim 11 , wherein the mesh includes an open area comprising between 40% and 50% of the total area of the mesh. 13. The mesh of claim 11 , wherein each fiber comprises a diameter between about 30 μm and about 50 μm. 14. The mesh of claim 11 , wherein the fibers are spaced about 60 μm and about 70 μm apart. 15. The method of claim 11 , wherein the mesh is between about 40 μm and about 50 μm thick. 16. The method of claim 1 , wherein welding comprises resistance welding or laser welding. 17. The method of claim 1 , wherein the third silicone layer is overmolded onto the second silicone layer, and the overmolding achieves a gradual transition between the second silicone layer and the third silicone layer. 18. The method of claim 1 , wherein the third silicone layer is overmolded onto the first silicone layer, and the overmolding achieves a gradual transition between the first silicone layer and the third silicone layer. 19. The method of claim 1 , wherein the first set of holes and the second set of holes are both formed in the first layer of silicone or are both formed in the second layer of silicone. 20. The method of claim 1 , wherein the first set of holes are formed in a different layer of silicone than the layer of silicone in which the second set of holes are formed.

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What does patent US11938314B2 cover?
The present disclosure discusses a method of manufacturing an implantable neural electrode. The method includes cutting a metal layer to form a plurality of electrode sites, contact pads and metal traces connecting the electrode sites to the contact pads. A first silicone layer including a mesh is formed and coupled to the metal layer. A second silicone layer is formed and laminated to the firs…
Who is the assignee on this patent?
Charles Stark Draper Laboratory Inc
What technology area does this patent fall under?
Primary CPC classification A61N1/0551. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Mar 26 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).