Sampling assembly and testing instrument

US11933668B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11933668-B2
Application numberUS-202016780550-A
CountryUS
Kind codeB2
Filing dateFeb 3, 2020
Priority dateFeb 3, 2020
Publication dateMar 19, 2024
Grant dateMar 19, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A sampling assembly is described. The sampling assembly comprises an input, a light source unit, at least one deflector unit, and a light receiver. The input is configured to receive an electrical input signal. The light source unit is configured to generate and output a light beam in the direction of the deflector unit. The light source unit is configured to adapt an intensity of the light beam based on an amplitude of the input signal. The deflector unit is configured to obtain a deflection command signal. The deflector unit further is configured to deflect the light beam into at least one spatial direction based on the deflection command signal. The light receiver comprises at least two photosensitive pixels. The light receiver is configured to receive the light beam via at least one of the at least two photosensitive pixels, and the light receiver is configured to convert received light into an electrical output signal. Further, a testing instrument is described.

First claim

Opening claim text (preview).

The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows: 1. A method of converting an electrical input signal into a set of acquisition samples, the method comprising: receiving an electrical input signal; generating and outputting a light beam or a particle beam based on said electrical input signal; deflecting said light beam or said particle beam into at least one spatial direction based on a deflection command signal, wherein said light beam or said particle beam is deflected according to a predefined pattern, wherein the predefined pattern is determined by the deflection command signal; receiving said light beam or said particle beam by photosensitive pixels and converting said received light beam or said particle beam into electrical output signals; and determining a set of acquisition samples based on the electrical output signals, wherein the set of acquisition samples comprises a plurality of acquisition samples, wherein the acquisition samples comprise information about an amplitude of the electrical input signal, and wherein the acquisition samples comprise time information about a time relation between the acquisition samples. 2. The method of claim 1 , wherein said deflecting said light beam further comprises providing one of an electric field or a sound wave, said one of an electric field or a sound wave causing the light beam to be deflected into the at least one spatial direction. 3. The method of claim 1 , wherein said deflecting said particle beam further comprises providing one of an electric field or a magnetic field, said one of an electric field or a magnetic field causing the particle beam to be deflected into the at least one spatial direction. 4. The method of claim 1 , further comprising digitizing the electrical input signal to obtain a set of analog-to-digital converter (ADC) samples, and synchronizing the set of ADC samples with the set of acquisition samples. 5. The method of claim 4 , wherein the set of ADC samples is aligned with the set of acquisition samples such that a temporal accordance is obtained between the set of ADC samples and the set of acquisition samples. 6. The method of claim 1 , further comprising adapting an intensity of said light beam or an intensity of said particle beam based on a momentary amplitude of the electrical input signal. 7. The method of claim 1 , wherein said light beam or said particle beam is deflected such that the photosensitive pixels are hit by said light beam or said particle beam in a predetermined order, wherein the predetermined order is determined by the deflection command signal. 8. The method of claim 7 , wherein said light beam or said particle beam is deflected such that the photosensitive pixels are hit by said light beam or said particle beam in a periodic pattern. 9. The method of claim 8 , wherein the periodic pattern comprises a spiral pattern or a zig-zag pattern. 10. The method of claim 8 , wherein the said light beam or said particle beam is deflected such that at least 25 percent of the photosensitive pixels are hit by said light beam or said particle beam within one repetition of said periodic pattern. 11. The method of claim 8 , wherein the said light beam or said particle beam is deflected such that at least 50 percent of the photosensitive pixels are hit by said light beam or said particle beam within one repetition of said periodic pattern. 12. The method of claim 1 , wherein said time information about the time relation between the acquisition samples is derived from the deflection command signal. 13. The method of claim 1 , wherein the acquisition samples comprise information about a development of the amplitude of the electrical input signal over time.

Assignees

Inventors

Classifications

  • G01J1/44Primary

    Electric circuits {(for command of an exposure part G03B7/02)} · CPC title

  • using plane or convex mirrors, parallel phase plates, or plane beam-splitters · CPC title

  • Deflecting along given lines · CPC title

  • Detectors; Associated components or circuits therefor · CPC title

  • H03M1/1009Primary

    Calibration · CPC title

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What does patent US11933668B2 cover?
A sampling assembly is described. The sampling assembly comprises an input, a light source unit, at least one deflector unit, and a light receiver. The input is configured to receive an electrical input signal. The light source unit is configured to generate and output a light beam in the direction of the deflector unit. The light source unit is configured to adapt an intensity of the light bea…
Who is the assignee on this patent?
Rohde & Schwarz
What technology area does this patent fall under?
Primary CPC classification G01J1/44. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 19 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).