Copper alloy plate, copper alloy plate with plating film, and methods for producing these

US11926889B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11926889-B2
Application numberUS-202017630691-A
CountryUS
Kind codeB2
Filing dateAug 5, 2020
Priority dateAug 6, 2019
Publication dateMar 12, 2024
Grant dateMar 12, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A copper alloy plate containing in a center part of a plate thickness direction more than 2.0% (% by mass) and 32.5% or less of Zn; 0.1% or more and 0.9% or less of Sn; 0.05% or more and less than 1.0% of Ni; 0.001% or more and less than 0.1% of Fe, and 0.005% or more and 0.1% or less of P; and the balance Cu, including a surface layer part in which a surface Zn concentration in a surface is 60% or less of a center Zn concentration in the center part, having a depth from the surface to where Zn concentration is 90% of the center Zn concentration; and in the surface layer, the Zn concentration increases from the surface toward the center part in the plate thickness direction at a concentration gradient of 10% by mass/μm or more and 1000% by mass/μm or less.

First claim

Opening claim text (preview).

The invention claimed is: 1. A copper alloy plate comprising a surface layer part, wherein in a center in a plate thickness direction more than 2% (% by mass, the same hereafter) and 32.5% or less of Zn as a center Zn concentration; 0.1% or more and 0.9% or less of Sn; 0.05% or more and less than 1.0% of Ni; 0.001% or more and less than 0.1% of Fe, and 0.005% or more and 0.1% or less of P; and the balance Cu with inevitable impurities are contained, wherein a surface Zn concentration at a surface of the copper alloy plate is 40% or less of the center Zn concentration, wherein the surface layer part has a depth from the surface to where Zn concentration is 90% of the center Zn concentration; and wherein in the surface layer part, the Zn concentration increases from the surface toward the center at a concentration gradient of 10% by mass/μm or more and 1000% by mass/μm or less, and the Zn concentration in the surface layer part does not decrease from the surface Zn concentration. 2. The copper alloy plate according to claim 1 , further containing 0.001% or more and less than 0.1% of Co. 3. The copper alloy plate according to claim 1 , wherein a thickness of the surface layer part is 1 μm or less. 4. A copper alloy plate with a plating film comprising the copper alloy plate according to claim 1 and a plating film formed on the surface layer part of the copper alloy plate. 5. The copper alloy plate with the plating film according to claim 4 , wherein an average concentration of Zn in the plating film is 10% or less of the center Zn concentration. 6. The copper alloy plate with the plating film according to claim 4 , wherein the plating film consists of one or more layers selected from tin, copper, zinc, gold, silver, palladium, and alloy of them. 7. A method of manufacturing the copper alloy plate according to claim 1 comprising steps of a Zn condense treatment step in diffusing Zn on a surface and concentrating Zn to form a surface part in which Zn is concentrated; and a surface part removal treatment step in removing the surface part and forming the surface layer part. 8. A method of manufacturing the copper alloy plate with a plating film according to claim 4 , wherein the plating film is formed by electroplating at 0.1 A/dm 2 or more and 60 A/dm 2 or less of an electric current density. 9. The method of manufacturing the copper alloy plate with a plating film according to claim 8 , wherein the plating film contains tin; and after the electroplating treatment is performed, reflow treatment is performed at 230° C. or more and 330° C. or less of heating peak temperature for 0.5 seconds or more and 30 seconds or less of heating time at the heating peak temperature.

Assignees

Inventors

Classifications

  • C22C9/04Primary

    with zinc as the next major constituent · CPC title

  • all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

  • comprising aluminium or copper {(B32B15/016 and B32B15/017 take precedence)} · CPC title

  • of copper · CPC title

  • by heat-treatment · CPC title

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What does patent US11926889B2 cover?
A copper alloy plate containing in a center part of a plate thickness direction more than 2.0% (% by mass) and 32.5% or less of Zn; 0.1% or more and 0.9% or less of Sn; 0.05% or more and less than 1.0% of Ni; 0.001% or more and less than 0.1% of Fe, and 0.005% or more and 0.1% or less of P; and the balance Cu, including a surface layer part in which a surface Zn concentration in a surface is 60…
Who is the assignee on this patent?
Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification C22C9/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 12 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).