Deposition compositions and methods of making and using same

US11920102B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11920102-B2
Application numberUS-202117795387-A
CountryUS
Kind codeB2
Filing dateJan 21, 2021
Priority dateJan 29, 2020
Publication dateMar 5, 2024
Grant dateMar 5, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

First claim

Opening claim text (preview).

What is claimed is: 1. A deposition composition comprising: a solvent comprising a hydrofluorothioether represented by the following structural formula (I): Rf—S—Rh  (I) where Rf is a perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms; and a coating material that is soluble or dispersible in said solvent, wherein said coating material comprises a pigment, lubricant, stabilizer, adhesive, anti-oxidant, dye, polymer, pharmaceutical, release agent, or inorganic oxide. 2. The deposition composition of claim 1 , wherein said coating material comprises a perfluoropolyether, a hydrocarbon, a silicone lubricant, a fluorinated acrylate polymer, or polymer or copolymer of a fluorocarbon or perfluorocarbon monomer. 3. The deposition composition of claim 1 , wherein Rf is a perfluorinated, saturated group having 2-5 carbon atoms. 4. The deposition composition of claim 1 , wherein Rh is CH 3 or CH 3 CH 2 . 5. The deposition composition of claim 1 , wherein the compound having structural formula (I) is present in the deposition composition in an amount of at least 70% by weight, based on the total weight of the deposition composition. 6. A method of depositing a coating onto a substrate, the method comprising: (a) applying to a substrate a coating of the deposition composition according to claim 1 ; and (b) removing the hydrofluorothioether from the coating. 7. The method of claim 6 , wherein the substrate is a magnetic hard disk, electrical connector, or medical device. 8. A lubricant composition comprising a hydrofluorothioether represented by the following structural formula (I): Rf—S—Rh  (I) where Rf is a perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms; and a lubricant soluble or dispersible in the hydrofluorothioether. 9. The lubricant composition of claim 8 , comprising: (a) 0.001 to 10 wt. % perfluoropolyether lubricant; and (b) 90 to about 99.999 wt. % of the hydrofluorothioether, based on the total weight of the lubricant composition. 10. The lubricant composition of claim 9 , wherein the perfluoropolyether lubricant comprises a perfluoropolyether compound having polar groups. 11. The lubricant composition of claim 10 , wherein the polar groups comprise alcohol groups. 12. The lubricant composition of claim 11 , wherein the polar groups comprise at least 4 alcohol groups. 13. A method of lubricating a substrate comprising: (a) applying to a substrate a coating of a lubricant composition according to claim 8 ; and (b) removing the hydrofluorothioether from the coating. 14. The method of claim 13 , wherein the substrate is magnetic media. 15. A deposition composition comprising: a solvent comprising a hydrofluorothioether represented by the following structural formula (II): where n is 0 or 1; m is 0 or 1; X is an oxygen atom or a sulfur atom and Y is an oxygen atom or a sulfur atom, with the proviso X and Yare not both oxygen atoms; and R 1 , R 2 , R 3 , and R 4 are, independently, a fluorine atom, or a partially fluorinated or perfluorinated group having 1 to 4 carbon atoms and optionally includes one or more catenated heteroatoms, chlorine atoms, or bromine atoms; and a coating material that is soluble or dispersible in said solvent.

Assignees

Inventors

Classifications

  • C10M107/38Primary

    containing halogen · CPC title

  • Sulfides {, e.g. R-(S)x-R'} · CPC title

  • containing a sulfur-to-oxygen bond · CPC title

  • containing sulfur atoms bound to acyclic or cycloaliphatic carbon atoms · CPC title

  • Mixtures of base-materials and additives · CPC title

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What does patent US11920102B2 cover?
A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition fur…
Who is the assignee on this patent?
3M Innovative Properties Company
What technology area does this patent fall under?
Primary CPC classification C10M107/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 05 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).