Bismuth electroplating baths and methods of electroplating bismuth on a substrate
US-2017067174-A1 · Mar 9, 2017 · US
US11913128B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11913128-B2 |
| Application number | US-202217568889-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 5, 2022 |
| Priority date | May 28, 2021 |
| Publication date | Feb 27, 2024 |
| Grant date | Feb 27, 2024 |
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A method for compact and flat bismuth metal preparation by electrolysis is provided. In the method, one or more of β-naphthol, acacia, sulfonated and vulcanized alkylphenol ethoxylate and naphthol ethoxylate oxides are added to the acidic solution of bismuth methanesulfonate as additives, and the cathodic bismuth is obtained by electrolysis at 20-80° C. The method for bismuth metal preparation is simple and easy to promote, environment-friendly, and the obtained bismuth metal has a flat and compact surface and good plate formation effect.
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What is claimed is: 1. A method for compact and flat bismuth metal preparation by electrolysis, comprising: 1) preparing an acidic solution of bismuth methanesulfonate as an electrolyte, and adding an additive which is one or more selected from the group consisting of acacia, sulfonated and vulcanized alkylphenol ethoxy and naphthol ethoxy oxide to the electrolyte to obtain a mixed electrolyte consisting of the acidic solution of bismuth methanesulfonate and the additive; and 2) injecting the mixed electrolyte obtained in step 1) into an electrolytic cell, inserting an anodic plate and a cathodic plate into the electrolytic cell, and applying direct current electrolysis to obtain compact and flat bismuth metal, wherein a concentration of the additive is in a range from 0.2 grams per liter (g/L) to 2.0 g/L. 2. The method for compact and flat bismuth metal preparation by electrolysis according to claim 1 , wherein the acidic solution of bismuth methanesulfonate comprises bismuth methanesulfonate and free methanesulfonic acid, a concentration of the free methanesulfonic acid is in a range from 50 g/L to 100 g/L, and a concentration of bismuth ions of the electrolyte is in a range from 50 g/L to 120 g/L. 3. The method for compact and flat bismuth metal preparation by electrolysis according to claim 1 , wherein the cathodic plate is a titanium plate, the anodic plate is a graphite plate, and a distance between the anodic plate and the cathodic plate is in a range from 3 centimeters (cm) to 5 cm. 4. The method for compact and flat bismuth metal preparation by electrolysis according to claim 1 , wherein a temperature of the electrolyte is controlled to be in a range from 20 Celsius degrees (° C.) to 80° C. during electrolysis. 5. The method for compact and flat bismuth metal preparation by electrolysis according to claim 1 , wherein a cathodic current density of the electrolysis is in a range from 60 amperes per square meter (A/m 2 ) to 300 A/m 2 . 6. The method for compact and flat bismuth metal preparation by electrolysis according to claim 1 , wherein a duration of the electrolysis is in a range from 4 hours (h) to 72 h. 7. The method for compact and flat bismuth metal preparation by electrolysis according to claim 1 , wherein the electrolyte circulates in a way of down-in-up-out or up-in-down-out. 8. A method for compact and flat bismuth metal preparation by electrolysis, comprising: 1) mixing bismuth methanesulfonate and free methanesulfonic acid to obtain an electrolyte, and adding sulfonated and vulcanized alkylphenol ethoxy and naphthol ethoxy oxide to the electrolyte to obtain a mixed electrolyte consisting of the bismuth methanesulfonate, the free methanesulfonic acid, the sulfonated and vulcanized alkylphenol ethoxy and the naphthol ethoxy oxide; and 2) injecting the mixed electrolyte into an electrolytic cell, inserting an anodic plate and a cathodic plate into the electrolytic cell, and applying direct current electrolysis to obtain compact and flat bismuth metal.
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