Plasma processing apparatus including predictive control

Patent metadata

Field	Value
Publication number	US-11907235-B2
Application number	US-202117241826-A
Country	US
Kind code	B2
Filing date	Apr 27, 2021
Priority date	Mar 14, 2018
Publication date	Feb 20, 2024
Grant date	Feb 20, 2024

Abstract

A model learning unit learns a prediction model on the basis of learning data, a target setting unit sets a target output parameter value by interpolating between a goal output parameter value and an output parameter value which is the closest to the goal output parameter value in output parameter values in the learning data, a processing condition search unit estimates input parameter values which corresponds to the goal output parameter value and the target output parameter value, a model learning unit updates the prediction model by using a set of the estimated input parameter value and an output parameter value which is a result of processing that a processing device performs as additional learning data.

First claim

The invention claimed is:

1. A plasma processing apparatus which performs plasma processing on a sample using a plasma, comprising:
a processing chamber;
a plasma generation device which generates the plasma in the processing chamber; and
a control device which searches for an input parameter value of each control parameter of the apparatus which corresponds to a goal output parameter value of the sample and controls the plasma generation device to perform the plasma processing on the sample which is installed in the processing chamber on the basis of the searched-out input parameter value,
wherein the control device
learns a prediction model on the basis of learning data which is sets of predetermined input parameter values and output parameter values which are results of plasma processing performed on the sample on the basis of the predetermined input parameter values,
sets a target output parameter value by interpolating values between the goal output parameter value and an output parameter value which is the closest to the goal output parameter value in the output parameter values in the learning data,
estimates input parameter values which correspond to the goal output parameter value and the target output parameter value by using the prediction model,
in a case where it is decided that the output parameter value which is the result of the plasma processing performed on the sample on the basis of the input parameter value which is estimated by using the prediction model and corresponds to the goal output parameter value converges to the goal output parameter value, controls the plasma generation device to perform the plasma processing on the sample on the basis of the input parameter value with which convergence thereof is decided, and
in a case where it is decided that the output parameter value which is the result of the plasms processing performed on the sample on the basis of the input parameter value which is estimated by using the prediction model and corresponds to the goal output parameter value does not converge to the goal output parameter value, updates the prediction model by adding a set of the estimated input parameter value and the output parameter value which is the result of the plasma processing performed on the sample on the basis of the input parameter value to the learning data and resets the target output parameter value and thereby continues searching-for of an input parameter value which corresponds to the goal output parameter value.

2. The plasma processing apparatus according to claim 1 ,
wherein the control device
sets a plurality of initial input parameter values in such a manner that each of input parameters used in the prediction model includes three level values on the basis of input parameter value settable ranges and
the prediction model is learned by using a set of the initial input parameter value and an initial output parameter value which is a result of the plasma processing performed on the sample on the basis of the initial input parameter value as initial learning data.

3. The plasma processing apparatus according to claim 1 , wherein the goal output parameter value is given as a dimension of a processed shape of the sample obtained after plasma-processed.

Assignees

• Hitachi High Tech Corp

Inventors

• Okuyama Yutaka
• Ohmori Takeshi
• Kurihara Masaru
• Nakada Hyakka

Classifications

• G06F16/9535

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• G06F16/90335

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• G06N3/045

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• G06N3/04

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