Anti-reflective surface structures

US11906701B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11906701-B2
Application numberUS-201815733255-A
CountryUS
Kind codeB2
Filing dateDec 21, 2018
Priority dateDec 29, 2017
Publication dateFeb 20, 2024
Grant dateFeb 20, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Anti-reflective article includes a layer defining an anti-reflective surface. The anti-reflective surface includes a series of alternating micro-peaks and micro-spaces extending along an axis. The surface also includes a series of nano-peaks extending along an axis. The nano-peaks are disposed at least on the micro-spaces and, optionally, the micro-peaks. The article may be disposed on a photovoltaic module or skylight to reduce reflections and resist the collection of dust and dirt.

First claim

Opening claim text (preview).

What is claimed is: 1. An article comprising a layer defining an anti-reflective surface extending along an axis, wherein a plane containing the axis defines a cross section of the layer and intersects the surface to define a line describing the surface in two dimensions, the layer comprising: a series of micro-structures at least partially defined by the line, the line defining a series of alternating micro-peaks and micro-spaces along the axis, wherein each micro-space comprises a maximum absolute slope defining an angle from the axis of at most 30 degrees, wherein each micro-peak comprises a first micro-segment defining a first average slope and a second micro-segment defining a second average slope, and wherein an angle formed between the first and second average slopes is at most 120 degrees; and a plurality of nano-structures at least partially defined by the line, the line defining at least one series of nano-peaks disposed on at least the micro-spaces along the axis, wherein each nano-peak has a height and each corresponding micro-peak has a height of at least 10 times the height of the nano-peak, and wherein the micro-spaces have a width of at least 50 micrometers. 2. An article comprising a layer defining an anti-reflective surface extending along an axis, wherein a plane containing the axis defines a cross section of the layer and intersects the surface to define a line describing the surface in two dimensions, the layer comprising: a series of micro-structures at least partially defined by the line, the line defining a series of alternating micro-peaks and micro-spaces along the axis, wherein a boundary between each adjacent micro-peak and micro-space includes at least one of a bend or an inflection point of the line; and a plurality of nano-structures at least partially defined by the line, the line defining at least one series of nano-peaks disposed on at least the micro-spaces along the axis, wherein each nano-peak has a height and each corresponding micro-peak has a height at least 10 times the height of the nano-peak, and wherein the micro-spaces have a width of at least 50 micrometers. 3. The article of claim 1 , wherein the micro-peak first average slope is positive, and the micro-peak second average slope is negative. 4. The article of claim 1 , wherein an absolute value of the micro-peak first average slope is equal to an absolute value of the micro-peak second average slope. 5. The article of claim 1 , wherein a width of each micro-space is at least one of: at least 10% of a corresponding micro-peak distance. 6. The article of claim 1 , wherein a micro-peak distance between micro-peaks is at least 100 micrometers. 7. The article of claim 1 , wherein the micro-peaks have a height of at least 10 micrometers. 8. The article of claim 1 , wherein each nano-peak comprises a first nano-segment defining a first average slope and a second nano-segment defining a second average slope, wherein an angle formed between the nano-peak first average slope and the nano-peak second average slope is at most 120 degrees. 9. The article of claim 8 , wherein an absolute value of the nano-peak first average slope is different than an absolute value of the nano-peak second average slope. 10. The article of claim 1 , wherein the plurality of nano-structures is further disposed on the micro-peaks. 11. The article of claim 1 , wherein each nano-peak defines a nano-peak distance and the corresponding micro-peaks define a micro-peak distance of at least 10 times the nano-peak distance. 12. The article of claim 1 , wherein a maximum nano-peak distance between nano-peaks is in a range from 1 nanometer to 1 micrometer. 13. The article of claim 1 , wherein the layer defining the anti-reflective surface comprises at least one of a fluoropolymer, a polyolefin polymer, or an ultraviolet stable material. 14. The article of claim 1 , wherein the nano-peaks comprise at least one masking element. 15. The article of claim 14 , wherein the masking element has a diameter of at most 1 micrometer. 16. The article of claim 1 , wherein the micro-peaks are non-uniform in at least one of height or shape. 17. The article of claim 1 , further comprising an ultraviolet stable adhesive coupled to a side of the layer opposite to the anti-reflective surface, wherein the adhesive is at least one of self-wetting to glass or an air bleed adhesive. 18. A method of forming an article comprising a layer defining an anti-reflective surface, the method comprising: forming a series of micro-structures on a surface of a layer, the series of micro-structures comprising a series of alternating micro-peaks and micro-spaces along an axis; disposing a series of nano-sized masking elements on at least the micro-spaces along the axis, wherein the masking elements define a maximum diameter and the corresponding micro-peaks have a height of at least 10 times the maximum diameter of the masking elements; and exposing the surface of the layer to reactive ion etching to form a plurality of nano-structures on the surface of the layer including a series of nano-peaks along the axis, each nano-peak comprising the masking element and a column between the masking element and the layer, wherein the micro-spaces have a width of at least 50 micrometers. 19. A method of forming an article comprising a layer defining an anti-reflective surface, the method comprising: extruding a hot melt material comprising an ultraviolet-stable material; shaping the extruded material with a micro-replication tool comprising a mirror image of a series of micro-structures to form the series of micro-structures on the surface of the layer, the series of micro-structures comprising a series of alternating micro-peaks and micro-spaces along an axis; and forming a plurality of nano-structures on the surface of the layer on at least the micro-spaces, the plurality of nano-peaks comprising at least one series of nano-peaks along the axis, wherein the micro-spaces have a width of at least 50 micrometers. 20. The method of claim 19 , wherein the plurality of nano-peaks comprises at least one series of nano-peaks along the axis.

Assignees

Inventors

Classifications

  • the coatings being antireflective or having enhancing optical properties · CPC title

  • H10F19/80Primary

    Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells · CPC title

  • G02B1/118Primary

    having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

  • Production of other optical elements not provided for in B29D11/00009- B29D11/0073 · CPC title

  • Sky-lights; Domes; Ventilating sky-lights (E04D13/14 takes precedence; structures therefor, {e.g. dormer windows} E04B7/18; {saw-tooth roofs with light-transmission E04B7/12}) · CPC title

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What does patent US11906701B2 cover?
Anti-reflective article includes a layer defining an anti-reflective surface. The anti-reflective surface includes a series of alternating micro-peaks and micro-spaces extending along an axis. The surface also includes a series of nano-peaks extending along an axis. The nano-peaks are disposed at least on the micro-spaces and, optionally, the micro-peaks. The article may be disposed on a photov…
Who is the assignee on this patent?
3M Innovative Properties Company
What technology area does this patent fall under?
Primary CPC classification H10F19/80. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 20 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).