Low friction wear film and method for producing the same

Patent metadata

Field	Value
Publication number	US-11905586-B2
Application number	US-202117240075-A
Country	US
Kind code	B2
Filing date	Apr 26, 2021
Priority date	Apr 30, 2020
Publication date	Feb 20, 2024
Grant date	Feb 20, 2024

Abstract

A low friction wear film includes a chromium layer provided on a surface of a metal substrate, a tungsten carbide layer provided on a surface of the chromium layer, and a diamond-like carbon layer as a top layer provided on a surface of the tungsten carbide layer. The tungsten carbide layer includes a chromium-tungsten carbide gradient layer and a tungsten carbide uniform layer. In the tungsten carbide layer, a tungsten-concentrated layer in which a tungsten simple substance is present is not provided at a boundary between the chromium-tungsten carbide gradient layer and the tungsten carbide uniform layer.

First claim

What is claimed is:

1. A low friction wear film comprising:
a chromium layer provided on a surface of a metal substrate;
a tungsten carbide layer provided on a surface of the chromium layer, the tungsten carbide layer including a chromium-tungsten carbide gradient layer and a tungsten carbide uniform layer, the chromium-tungsten carbide gradient layer containing chromium and tungsten carbide and having a gradient composition in which a composition ratio of the chromium decreases and a composition ratio of the tungsten carbide increases as a distance from the chromium layer in a thickness direction increases, the tungsten carbide uniform layer being only made of tungsten carbide provided on a surface of the chromium-tungsten carbide gradient layer, and in the tungsten carbide layer, a tungsten-concentrated layer in which a tungsten simple substance is present is not provided at a boundary between the chromium-tungsten carbide gradient layer and the tungsten carbide uniform layer; and
a diamond-like carbon layer as a top layer provided on a surface of the tungsten carbide layer.

2. The low friction wear film according to claim 1 , wherein a ratio of an atomic concentration of tungsten to a total of the atomic concentration of the tungsten and an atomic concentration of carbon in the tungsten carbide layer is 50% or less.

3. A method for producing the low friction wear film according to claim 1 , the method comprising:
as a chromium layer deposition step, depositing the chromium layer by causing inert gas ions to collide with a chromium target made of chromium placed in a vacuum chamber to cause chromium atoms sputtered from the chromium target to adhere to the surface of the metal substrate;
as a chromium-tungsten carbide gradient layer deposition step, depositing the chromium-tungsten carbide gradient layer by causing inert gas ions to collide with the chromium target and a tungsten carbide target made of tungsten carbide placed in the vacuum chamber to cause chromium atoms sputtered from the chromium target and tungsten carbide component sputtered from the tungsten carbide target to adhere to the surface of the chromium layer;
as a tungsten carbide uniform layer deposition step, depositing the tungsten carbide uniform layer by causing inert gas ions to collide with the tungsten carbide target placed in the vacuum chamber to cause the tungsten carbide component sputtered from the tungsten carbide target to adhere to the surface of the chromium-tungsten carbide gradient layer;
as a hydrocarbon ionization step, introducing a hydrocarbon gas into the vacuum chamber and ionizing the introduced hydrocarbon gas; and
depositing the diamond-like carbon layer by causing hydrocarbon ionized in the hydrocarbon ionization step to adhere to the surface of the tungsten carbide uniform layer,
wherein the hydrocarbon ionization step is started before the tungsten carbide uniform layer deposition step is carried out.

4. The method according to claim 3 , wherein the hydrocarbon ionization step is started at the same time as start of the chromium-tungsten carbide gradient layer deposition step.

Assignees

• Aisin Corp
• Tohken Thermo Tech Co Ltd

Inventors

• Jin Chengji
• Suzuki Hodo
• Kajino Masaki
• Kitamura Kazuya
• Omori Naoyuki

Classifications

• C23C14/025 Primary

  Metallic sublayers · CPC title

• C23C14/0605

  Carbon · CPC title

• C23C14/0635

  Carbides · CPC title

• C23C14/165

  by cathodic sputtering · CPC title

• C23C14/34

  Sputtering · CPC title