Filtration and purification processing method

Patent metadata

Field	Value
Publication number	US-11898554-B2
Application number	US-202117386461-A
Country	US
Kind code	B2
Filing date	Jul 27, 2021
Priority date	Aug 31, 2020
Publication date	Feb 13, 2024
Grant date	Feb 13, 2024

Abstract

A filtration and purification processing method includes following steps: (1) providing a filtration and purification device; (2) performing a gas introduction, filtration, and detection procedure; (3) performing a detection and determination procedure to the purified gas; (4) performing a circulating filtration and detection procedure to the purified gas; and (5) repeating filtration and purification procedures to the purified gas several times and guiding out the purified gas.

First claim

What is claimed is:

1. A filtration and purification processing method, comprising:
(1) providing a filtration and purification device, wherein the filtration and purification device comprises a plurality of filtration passage layers stacked with each other, and each of the filtration passage layers comprises a plurality of purification chambers, a convergence chamber, and a circulation channel, wherein the purification chambers are arranged in parallel and bottoms of the purification chambers are in communication with the convergence chamber, and the circulation channel is in communication with the convergence chamber, wherein each of the purification chambers comprise at least one flow-guiding unit, at least one filtration unit, at least one gas sensor, and an outlet valve, wherein the circulation channel has an inlet valve disposed between the convergence chamber and the circulation channel, and each of the outlet valves is disposed between the corresponding purification chamber and the convergence chamber, and wherein each of the outlet valves controls the communication between the corresponding purification chamber and the convergence chamber, and the inlet valve control the communication between the convergence chamber and the circulation channel;
(2) performing a gas introduction, filtration, and detection procedure, wherein in each of the filtration passage layers, the outlet valve of each of the purification chambers is opened and the at least one flow-guiding unit is driven to introduce a gas outside the filtration and purification device into each of the purification chambers, and in each of the purification chambers of each of the filtration passage layers, the at least one filtration unit filters the gas to obtain a purified gas, and the purified gas is introduced to the convergence chamber;
(3) performing a detection and determination procedure to the purified gas, wherein the at least one gas sensor of each of the purification chambers of each of the filtration passage layers detects a gas quality of the purified gas to determine if a gas quality of the purified gas reaches a threshold for breathing;
(4) performing a circulating filtration and detection procedure to the purified gas, wherein when the purified gas of each of the filtration passage layers does not reach the threshold for breathing, the purified gas of each of the filtration passage layers is circulated, filtered, and detected again, in each of the filtration passage layers, the outlet valve of the purification chamber where the at least one gas sensor is located is controlled to be closed, the outlet valves of the purification chambers of a next filtration passage layer are closed, and the inlet valve of the circulation channel of a previous filtration passage layer is opened, so that the purified gas of the previous filtration passage layer is capable of being introduced back to the previous filtration passage layer for circulating, filtering, and detecting; and
(5) repeating filtration and purification procedures to the purified gas several times and guiding out the purified gas, wherein the purified gas in the convergence chamber of the previous filtration passage layer enters into the filtration units of the purification chambers of the next filtration passage layer to be filtered and purified for second-time, and the outlet valves of the next filtration passage layer are opened when the purified gas of the next filtration passage layer reaches the threshold for breathing, and the purified gas of the next filtration passage layer is introduced into a last filtration passage layer to be filtered and purified and discharged out of the filtration and purification device.

2. The filtration and purification processing method according to claim 1 , wherein the filtration and purification device comprises a main body having an inlet end and an outlet end, and the filtration passage layers are disposed in the main body.

3. The filtration and purification processing method according to claim 2 , wherein the main body is made of a soft, flexible, and antiallergic material.

4. The filtration and purification processing method according to claim 2 , wherein the filtration passage layers are formed and stacked with each other by semiconductor manufacturing processes, the at least one flow-guiding unit of each of the purification chambers of each of the filtration passage layers is disposed adjacent to the inlet end, wherein in each of the purification chambers of each of the filtration passage layers, the at least one filtration unit and the at least one gas sensor are sequentially disposed below the at least one flow-guiding unit, and the outlet valve is disposed below the at least one gas sensor and closes the purification chamber, wherein in each of the purification chambers of each of the filtration passage layers, the at least one flow-guiding unit drives the gas into the purification chamber, and the gas is filtered by the at least one filtration unit to obtain the purified gas, and the purified gas passes through the at least one gas sensor to detect the gas quality of the purified gas and determine if the gas quality of the purified gas reaches the threshold for breathing, and the purified gas is discharged out of the purification chamber and introduced into the convergence chamber from the outlet valve.

5. The filtration and purification processing method according to claim 1 , wherein the filtration and purification device comprises a driving chip and a battery, the battery provides operation power for the driving chip, so that the driving chip is capable of driving the at least one flow-guiding unit, the at least one gas sensor, the inlet valve, and the outlet valves of each of the filtration passage layers.

6. The filtration and purification processing method according to claim 5 , wherein the driving chip further comprises a microprocessor and a communication device, wherein the microprocessor is capable of controlling the at least one flow-guiding unit, the at least one gas sensor, the inlet valve, and the outlet valves of each of the filtration passage layers, receiving a gas quality data of the purified gas detected by the at least one gas sensor for calculating and processing to the gas quality data, and transmitting the gas quality data to an external device through the communication device, and the external device is capable of receiving the gas quality data, issuing a warning notice, and display a record of the gas quality data.

7. The filtration and purification processing method according to claim 1 , wherein the at least one flow-guiding unit is a microelectromechanical systems (MEMS) blower-type pump, and the MEMS blower-type pump comprises:
an outlet base formed with a penetration hole and a compression chamber through a silicon substrate etching process, wherein a penetration hole is in communication between the compression chamber;
a first oxide layer formed and stacked on the outlet base by deposition, wherein a portion of the first oxide layer corresponding to the compression chamber is removed by etching;
a nozzle resonance layer formed and stacked on the first oxide layer by deposition, wherein a plurality of inlet holes is formed at a portion of the nozzle resonance layer corresponding to the compression chamber by partially etching, and wherein a portion of the nozzle resonance layer corresponding to a central portion of the compression chamber is etched to form a nozzle hole, thereby forming a suspension area capable of being vibrated between the plurality of inlet holes and the nozzle hole;
a second oxide layer formed and stacked on the suspension area of the nozzle resonance layer by deposition, wherein a portion of the second oxide layer is etched to form a resonance chamber area in com

Assignees

• Microjet Technology Co Ltd

Inventors

• Mou Hao-Jan
• Huang Chi-Feng
• Han Yung-Lung
• Tsai Chang-Yen
• Lee Wei-Ming
• Lin Tsung-I
• Ku Yang

Classifications

• F04B53/20 Primary

  Filtering · CPC title

• B01D46/0005

  Mounting of filtering elements within casings, housings or frames (B01D46/2422 takes precedence) · CPC title

• B01D46/0028

  provided with antibacterial or antifungal means · CPC title

• F04B43/043

  Micropumps · CPC title

• B81B2201/036

  Micropumps · CPC title