Method for preparing a monolithic nanoporous silicate sol-gel material

US11897776B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11897776-B2
Application numberUS-201917282536-A
CountryUS
Kind codeB2
Filing dateOct 4, 2019
Priority dateOct 5, 2018
Publication dateFeb 13, 2024
Grant dateFeb 13, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method for preparing a monolithic nanoporous silicate sol-gel material for modulating the pore size distribution for one single starting composition without the addition of a structuring agent. The method includes the following steps: a) synthesising a gel from at least one organosilylated precursor, the synthesis being carried out in an aqueous medium, optionally including an organic solvent and without a structuring agent, and b) drying the gel obtained in step a) at a temperature between 10° C. and 70° C., preferably between 15° C. and 55° C. and more preferably between 20° C. and 40° C., in a gas flow in a drying chamber to obtain a monolithic nanoporous silicate sol-gel material and a residual relative humidity in the drying chamber of between 0.1 and 20%, preferably between 0.5 and 10% and more preferably about 5%.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for preparing monolithic nanoporous silicate sol-gel material, said process comprising the following steps: a) synthesizing a gel from at least one organosilyl precursor, the synthesis being carried out in aqueous medium optionally comprising an organic solvent and without structuring agent, b) drying the gel obtained in step a) at a temperature of between 10° C. and 70° C., in a stream of gas in a drying chamber until a monolithic nanoporous silicate sol-gel material is obtained and the residual relative humidity in the drying chamber is between 0.1% and 20%. 2. The process as claimed in claim 1 , wherein the drying step b) is carried out at a temperature of between 15° C. and 55° C. 3. The process as claimed in claim 1 , wherein the drying step b) is carried out at a temperature of between 20° C. and 40° C. 4. The process as claimed in claim 1 , wherein the residual relative humidity in the drying chamber in step b) is between 0.5% and 10%. 5. The process as claimed in claim 1 , wherein the residual relative humidity in the drying chamber in step b) is about 5%. 6. The process as claimed in claim 1 , wherein the synthesis is carried out without acidic or basic catalyst. 7. The process as claimed in claim 1 , wherein the at least one organosilyl precursor is selected from tetramethoxysilane, tetraethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, a fluoroalkyltrimethoxysilane, a fluoroalkyltriethoxysilane, a chloroalkyltrimethoxysilane, a chloroalkyltriethoxysilane, an alkyltrimethoxysilane, an alkyltriethoxysilane, an aminopropyltriethoxysilane, an aminopropyltrimethoxysilane and mixtures thereof. 8. The process as claimed in claim 1 , wherein the organic solvent is a C 1 to C 6 aliphatic alcohol. 9. The process as claimed in claim 1 , wherein the organic solvent is methanol or ethanol. 10. The process as claimed in claim 1 , wherein the organic solvent is methanol. 11. The process as claimed in claim 1 , wherein the drying step is carried out in a stream of dry gas. 12. The process as claimed in claim 1 , wherein the drying step comprises applying a stream of wet gas, said wet gas having a relative humidity of 30% to 80%. 13. The process as claimed in claim 6 , wherein the drying step is carried out in stages, each stage comprising decreasing the relative humidity in the chamber to a predefined level of relative humidity. 14. The process as claimed in claim 1 , wherein the drying step is carried out at a temperature of between 15° C. and 25° C. 15. The process as claimed in claim 1 , wherein the drying step is carried out at a temperature of about 20° C. 16. The process as claimed in claim 1 , wherein the drying step is carried out at a temperature of between 30° C. and 50° C. 17. The process as claimed in claim 1 , wherein the drying step is carried out at a temperature of about 40° C.

Assignees

Inventors

Classifications

  • C01B33/155Primary

    Preparation of hydroorganogels or organogels · CPC title

  • comprising silica · CPC title

  • Gels · CPC title

  • Purification; Drying; Dehydrating · CPC title

  • C01B33/163Primary

    by hydrolysis of organosilicon compounds, e.g. ethyl orthosilicate · CPC title

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What does patent US11897776B2 cover?
A method for preparing a monolithic nanoporous silicate sol-gel material for modulating the pore size distribution for one single starting composition without the addition of a structuring agent. The method includes the following steps: a) synthesising a gel from at least one organosilylated precursor, the synthesis being carried out in an aqueous medium, optionally including an organic solvent…
Who is the assignee on this patent?
Commissariat Energie Atomique, Centre National De La Rech Scientifique—Cnrs—
What technology area does this patent fall under?
Primary CPC classification C01B33/155. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 13 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).