Systems and methods for improved sustainment of a high performance FRC with multi-scaled capture type vacuum pumping

Patent metadata

Field	Value
Publication number	US-11894150-B2
Application number	US-202217965071-A
Country	US
Kind code	B2
Filing date	Oct 13, 2022
Priority date	Nov 4, 2016
Publication date	Feb 6, 2024
Grant date	Feb 6, 2024

Abstract

Systems and methods that facilitate forming and maintaining FRCs with superior stability as well as particle, energy and flux confinement and, more particularly, systems and methods that facilitate forming and maintaining FRCs with elevated system energies and improved sustainment utilizing multi-scaled capture type vacuum pumping.

First claim

What is claimed is:

1. A capture vacuum pump system comprising a first capture vacuum pump and a second capture vacuum pump, each of the first and second capture vacuum pumps comprising
an open sided chamber including
two or more plates with surfaces having a view of each other, the two or more plates comprising one or more side plates coupled to the end plate at a first end of the one or more side plates and extending to an opening defined by a second end of the one or more side plates, the opening defining an area equivalent to the surface of the end plate with the length of the one or more side plates defining a depth (D) of the capture vacuum pump and the two or more plates with surfaces having a view of the opening,
a film of titanium deposited on the surfaces of the plates, wherein the film deposited surfaces having a sticking factor corresponding to the probability of an individual gas molecule sticking to the film deposited surface due to a single hit of the individual gas molecule to the film deposited surface when the film deposited surfaces are exposed to the gas, wherein the capture vacuum pump has a sticking factor greater than a sticking factor of a flat plate defining an area equivalent to the open side of the first and second capture pumps,
wherein at least one of the two or more plates of the first and second capture vacuum pumps comprise a first array of individual capture vacuum pumps, wherein each individual capture vacuum pump in the first array of individual capture vacuum pumps comprising two or more plates with surfaces having a view of each other, the two or more plates comprising one or more side plates coupled to an end plate at a first end of the one or more side plates and extending to an opening defined by a second end of the one or more side plates, the opening defining an area equivalent to the surface of the end plate with the length of the one or more side plates defining a depth (D) of the individual capture vacuum pump, and the two or more plates with surfaces having a view of the opening.

2. The capture vacuum pump system of claim 1 , wherein at least one of the two or more plates of each individual capture vacuum pump in the array of the individual capture vacuum pumps comprising a second array of individual capture vacuum pumps, wherein each individual capture vacuum pump in the second array of individual capture vacuum pumps being a capture vacuum pump comprising two or more plates with surfaces having a view of each other, the two or more plates comprising one or more side plates coupled to an end plate at a first end of the one or more side plates and extending to an opening defined by a second end of the one or more side plates, the opening defining an area equivalent to the surface of the end plate with the length of the one or more side plates defining a depth (D) of the individual capture vacuum pump, and the two or more plates with surfaces having a view of the opening.

3. The capture vacuum pump system of claim 1 , wherein the first and second capture vacuum pumps having a sticking factor that is N times greater than a sticking factor of a flat plate defining an area equivalent to the open side of the first and second capture pumps, wherein N is 4<N<16.

4. The capture vacuum pump system of claim 1 , wherein the first and second capture vacuum pumps having a sticking factor that is N times greater than a sticking factor of a flat plate defining an area equivalent to the open side of the first and second capture pumps, wherein N is 4<N<16.

5. The capture vacuum pump system of claim 2 , wherein the first and second capture vacuum pumps having a sticking factor that is N times greater than a sticking factor of a flat plate defining an area equivalent to the open side of the first and second capture pumps, wherein N is 4<N<16.

Assignees

• Tae Tech Inc

Inventors

• Van Drie Alan

Classifications

• G21B1/17 Primary

  Vacuum chambers; Vacuum systems · CPC title

• F04B37/08

  by condensing or freezing, e.g. cryogenic pumps · CPC title

• F04B37/14

  to obtain high vacuum · CPC title

• G21B1/052 Primary

  reversed field configuration · CPC title

• G21B1/15

  Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors · CPC title