Composition, production method for composition, and production method for unsaturated compound

US11891472B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11891472-B2
Application numberUS-201917269147-A
CountryUS
Kind codeB2
Filing dateAug 16, 2019
Priority dateAug 20, 2018
Publication dateFeb 6, 2024
Grant dateFeb 6, 2024

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The composition comprises a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R 1 —COO) n —R 2 —(NCO) m   (1) (R 1 —COO) n —R 2 —NHC(═O)NH—R 2 —(OCO—R 1 ) m   (2) wherein in general formulae (1) and (2), R 1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R 2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally contain an ether group; R 1 and R 2 in the general formula (1) are the same as R 1 and R 2 in the general formula (2); and n and m each represent an integer of one or two.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition comprising: a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), wherein the composition comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R 1 —COO) n —R 2 —(NCO) m   (1) (R 1 —COO) n —R 2 —NHC(═O)NH—R 2 —(OCO—R 1 ) m   (2) wherein in the general formulae (1) and (2), R 1 is an ethylenically unsaturated group having 2 to 7 carbon atoms; R 2 is a (m+n)-valent hydrocarbon group having 1 to 7 carbon atoms and optionally comprises an ether group; R 1 and R 2 in the general formula (1) are the same as R 1 and R 2 in the general formula (2); and n and m each represent an integer of 1 or 2. 2. The composition according to claim 1 , wherein the compound (A) is at least one compound selected from the group consisting of 2-methacryloyloxyethyl isocyanate, 2-(isocyanatoethyloxy) ethyl methacrylate, 2-acryloyloxyethyl isocyanate, 2-(isocyanatoethyloxy) ethyl acrylate, and 1,1-bis(acryloyloxymethyl)ethyl isocyanate. 3. The composition according to claim 1 , wherein a content of the compound (A) in the composition is 95.0% by mass or more. 4. The composition according to claim 1 , wherein the content of the compound (A) in the composition is 97.0% by mass to 99.9% by mass. 5. The composition according to claim 1 , further comprising as an additive any one selected from the group consisting of hydroquinone, methoxyhydroquinone, catechol, p-tert-butylcatechol, cresol, 2,6-di-tert-butyl-4-methylphenol (BHT), and phenothiazine. 6. A method of producing an unsaturated compound, comprising the steps of: mixing the composition according to claim 1 with a compound having active hydrogen; and reacting the compound (A) contained in the composition with the compound having active hydrogen to obtain a reaction product. 7. The method of producing an unsaturated compound according to claim 6 , wherein the compound having the active hydrogen is an alcohol, a thiol, an amine or a carboxylic acid. 8. The method of producing an unsaturated compound according to claim 6 , wherein the reaction product is an unsaturated urethane compound, an unsaturated thiourethane compound, an unsaturated urea compound, or an unsaturated amide compound. 9. The method of producing an unsaturated compound according to claim 6 , wherein the reaction product is any one selected from the group consisting of 2-butanone oxime-O-(carbamoylethyl-2-methacrylate), 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl methacrylate, 2-butanone oxime-O-(carbamoylethyl-2-acrylate), and 2-[(3,5-dimethylpyrazolyl)carbonylamino]ethyl acrylate. 10. The method of producing an unsaturated compound according to claim 6 , wherein a reaction temperature at which the compound (A) contained in the composition is reacted with the compound having the active hydrogen is −10 to 100° C.

Assignees

Inventors

Classifications

  • having nitrogen atoms of thiocarbamic groups bound to hydrogen atoms or to acyclic carbon atoms · CPC title

  • having the carbon atom of the carboxamide group bound to a hydrogen atom or to a carbon atom of an acyclic saturated carbon skeleton · CPC title

  • from compounds not provided for in groups C07C231/02 - C07C231/08 · CPC title

  • being further substituted by singly-bound oxygen atoms · CPC title

  • of substituted ureas · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11891472B2 cover?
The composition comprises a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), and comprises 0.00002 to 2.0 parts by mass of the compound (B) with respect to 100 parts by mass of the compound (A), (R 1 —COO) n —R 2 —(NCO) m   (1) (R 1 —COO) n —R 2 —NHC(═O)NH—R 2 —(OCO—R 1 ) m   (2) wherein in general formulae (1) and (2), R 1 is an ethy…
Who is the assignee on this patent?
Showa Denko Kk, Resonac Corp
What technology area does this patent fall under?
Primary CPC classification C08G18/8116. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 06 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).