Manufacturing apparatus and manufacturing method of porous glass base material

Patent metadata

Field	Value
Publication number	US-11878929-B2
Application number	US-202117501512-A
Country	US
Kind code	B2
Filing date	Oct 14, 2021
Priority date	Oct 26, 2020
Publication date	Jan 23, 2024
Grant date	Jan 23, 2024

Abstract

A manufacturing apparatus of porous glass base material includes deposition apparatuses that manufacture a porous glass base material by generating raw material particles from vaporized raw material compounds in an oxyhydrogen flame, and then depositing the generated raw material particles on a rotating starting material. The manufacturing apparatus includes a storage container that stores liquid raw material compounds for each compound, a vapor generation mechanism that vaporizes the raw material compounds, and a gas channel that supplies the vaporized raw material compounds to the deposition apparatuses. The gas channel includes a common gas channel shared to supply vaporized raw material compounds to the plurality of deposition apparatuses, and individual gas channels branched off from the common gas channel to supply vaporized raw material compounds to each of the deposition apparatuses individually. Each of the individual gas channels has a flow controller, a steam valve, and a valve.

First claim

What is claimed is:

1. A manufacturing apparatus of porous glass base material, including a plurality of deposition apparatuses that manufacture a porous glass base material by generating raw material particles from vaporized raw material compounds in an oxyhydrogen flame, and then depositing the generated raw material particles on a rotating starting material, the manufacturing apparatus comprises:
at least one storage container for storing a raw material compound in liquid form for each respective compound;
at least one vapor generation mechanism for vaporizing the raw material compound in each storage container of the at least one storage container; and
at least one gas channel for supplying a respective vaporized raw material compound vaporized by a respective vapor generation mechanism of the at least one vapor generation mechanism to the plurality of deposition apparatuses,
wherein each gas channel includes:
a common gas channel that is shared to supply respective vaporized raw material compounds to the plurality of deposition apparatuses; and
a plurality of individual gas channels that are branched off from the common gas channel to supply respective vaporized raw material compounds to each of the deposition apparatuses individually, and

wherein each of the plurality of individual gas channels includes:
a flow controller that controls a flow rate of the respective vaporized raw material compound;
a steam valve that controls an on/off distribution of the respective vaporized raw material compound; and
a valve that is provided upstream from the flow controller and can adjust a flow channel cross-section area,

the manufacturing apparatus further comprising a control unit that adjusts an opening of each valve so that a pressure downstream of each valve in a respective individual gas channel of the plurality of individual gas channels is 60-95% of a pressure of the respective vaporized raw material compound in the respective vapor generation mechanism,
wherein PICs are provided in the common gas channel and immediately downstream of each valve, and the openings of the valves are automatically adjusted based on a detected pressure detected by each PIC, and
wherein each individual deposition apparatus produces a separate porous glass base material.

2. The manufacturing apparatus according to claim 1 , wherein at least one of the raw material compounds is a silicon compound and/or a compound for doping.

3. The manufacturing apparatus according to claim 2 , wherein the compound for doping is a germanium compound.

4. A manufacturing method of porous glass base material comprising, in the manufacturing apparatus according to claim 1 , adjusting the opening of each valve so that the pressure downstream of each valve is 60-95% of the pressure of the respective vaporized raw material compound in the respective vapor generation mechanism.

Assignees

• Shinetsu Chemical Co

Inventors

• Kojima Hiroki

Classifications

• C03B19/1423 Primary

  Reactant deposition burners · CPC title

• C03B19/1484

  Means for supporting, rotating or translating the article being formed · CPC title

• C03B2201/31

  doped with germanium · CPC title

• C03B2207/70

  Control measures · CPC title

• C03C11/00 Primary

  Multi-cellular glass {; Porous or hollow glass or glass particles} · CPC title