Method of manufacturing printed circuit board
US-2024414849-A1 · Dec 12, 2024 · US
US11877397B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11877397-B2 |
| Application number | US-202017605939-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 15, 2020 |
| Priority date | May 15, 2019 |
| Publication date | Jan 16, 2024 |
| Grant date | Jan 16, 2024 |
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The printed circuit board includes, a first conductive layer including copper foil, an insulating base layer, and a second conductive layer including copper foil in this order, and includes a via-hole laminate that is stacked on an inner circumference and a bottom of a connection hole extending through the first conductive layer and the base layer in a thickness direction. The via-hole laminate has an electroless copper plating layer stacked on the connection hole and an electrolytic copper plating layer stacked on the electroless copper plating layer. The copper foil has copper crystal grains oriented in a (100) plane orientation, and an average crystal grain size of copper of 10 μm or more. The electroless copper plating layer includes palladium and tin, and an amount of the palladium stacked per unit area of a surface of the copper foil is 0.18 μg/cm 2 or more and 0.40 μg/cm 2 or less.
Opening claim text (preview).
The invention claimed is: 1. A printed circuit board comprising: an insulating base layer; a first conductive layer that is stacked on a front surface of the base layer either directly or indirectly and that includes copper foil; a second conductive layer that is stacked on a back surface of the base layer either directly or indirectly and that includes copper foil; and a via-hole laminate that is stacked on an inner circumference and a bottom of a connection hole extending through the first conductive layer and the base layer in a thickness direction and that electrically connects the first conductive layer to the second conductive layer, wherein the via-hole laminate has an electroless copper plating layer that is stacked on the inner circumference and the bottom of the connection hole and an electrolytic copper plating layer stacked on a surface of the electroless copper plating layer, the copper foil contains copper crystal grains oriented in a (100) plane orientation, and an average crystal grain size of copper of the copper foil is 10 μm or more, the electroless copper plating layer includes palladium and tin, and an amount of the palladium stacked per unit area of a surface of the copper foil is 0.18 μg/cm 2 or more and 0.40 μg/cm 2 or less. 2. The printed circuit board according to claim 1 , wherein an amount of the tin stacked per unit area of the surface of the copper foil is 0.05 μg/cm 2 or more and 1.20 μg/cm 2 or less. 3. The printed circuit board according to claim 1 , wherein a ratio of an area of copper crystal grains oriented in the (100) plane orientation and present on the surface of the copper foil relative to an area of the surface of the copper foil is 50% or more. 4. The printed circuit board according to claim 1 , wherein the amount of the palladium stacked per unit area of the surface of the copper foil is 0.18 μg/cm 2 or more and 0.35 μg/cm 2 or less. 5. The printed circuit board according to claim 1 , wherein a ratio of an area of copper crystal grains oriented in the (100) plane orientation and present on the surface of the copper foil relative to an area of the surface of the copper foil is 60% or more. 6. The printed circuit board according to claim 1 , wherein the electroless copper plating layer has an average thickness of 0.01 μm or more and 1.0 μm.
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