Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent

Patent metadata

Field	Value
Publication number	US-11874601-B2
Application number	US-202117304442-A
Country	US
Kind code	B2
Filing date	Jun 21, 2021
Priority date	Jul 7, 2020
Publication date	Jan 16, 2024
Grant date	Jan 16, 2024

Abstract

A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R 01 , R 02 , R 03 , and R 04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, R 01 and R 02 , R 02 and R 03 , or R 03 and R 04 are bonded to each other to form an aromatic ring; R 05 represents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and M m+ represents an m-valent organic cation.

First claim

What is claimed is:

1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base material component (A) exhibiting changed solubility in a developing solution under action of acid; and
a compound (D0) represented by General Formula (d0):

wherein R 01 , R 02 , R 03 and R 04 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R 01 and R 02 , R 02 and R 03 , or R 03 and R 04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R 05 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where M m+ represents an m-valent organic cation.

2. The resist composition according to claim 1 , wherein a content of the compound (D0) is in a range of 1 to 35 parts by mass with respect to 100 parts by mass of the base material component (A).

3. The resist composition according to claim 1 , further comprising an acid generator component (B) generating an acid upon exposure, provided that the compound (D0) is excluded from the acid generator component (B).

4. The resist composition according to claim 1 , wherein the base material component (A) contains a resin component (A1), and the resin component (A1) has a constitutional unit (a1) that contains an acid-decomposable group having a polarity which is increased by action of an acid.

5. A method of forming a resist pattern, comprising:
forming a resist film on a support using the resist composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.

6. The method of forming a resist pattern according to claim 5 , wherein the resist film is exposed with extreme ultraviolet (EUV) rays or electron beam (EB).

7. A compound represented by General Formula (d0):

wherein R 01 , R 02 , R 03 , and R 04 each independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R 01 and R 02 , R 02 and R 03 , or R 03 and R 04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where M m+ represents an m-valent organic cation selected from the group consisting of a sulfonium cation and an iodonium cation.

8. An acid diffusion-controlling agent comprising a compound represented by General Formula (d0):

wherein R 01 , R 02 , R 03 , and R 04 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R 01 and R 02 , R 02 and R 03 , or R 03 and R 04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R 05 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where M m+ represents an m-valent organic cation.

9. The acid diffusion-controlling agent according to claim 8 , wherein M m+ represents an m-valent organic cation selected from a group consisting of a sulfonium cation and an iodonium cation.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nguyen Khanhtin

Classifications

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• C07C381/12

  Sulfonium compounds · CPC title

• C07D311/66

  with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2 · CPC title

• C07D317/50

  with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to atoms of the carbocyclic ring · CPC title

• C07D319/20 Primary

  with substituents attached to the hetero ring · CPC title