Modulating a working beam of an additive manufacturing machine with a solid-state optical modulator

Patent metadata

Field	Value
Publication number	US-11874535-B2
Application number	US-202117385091-A
Country	US
Kind code	B2
Filing date	Jul 26, 2021
Priority date	Jul 26, 2021
Publication date	Jan 16, 2024
Grant date	Jan 16, 2024

Abstract

An irradiation device for an additively manufacturing apparatus may include a working beam generation device configured to provide a working beam, a modulation beam generation device configured to provide a modulation beam, and a solid-state optical modulator that includes a crystalline material that exhibits a change in refractive index in response to photoexcitation of free electrons within the crystalline material. The irradiation device may include a power source coupled to the solid-state optical modulator and configured to introduce free electrons into the crystalline material. The modulation beam may cause photoexcitation of the free electrons within the crystalline material. The photoexcitation of the free electrons within the crystalline material may cause the crystalline material to exhibit a change in refractive index. The working beam, when incident upon the crystalline material, may exhibit a change in one or more parameters, such as a phase shift, attributable at least in part to the change in refractive index exhibited by the crystalline material.

First claim

What is claimed is:

1. An irradiation device for an apparatus for additively manufacturing three-dimensional objects, the irradiation device comprising:
a working beam generation device configured to provide a working beam;
a modulation beam generation device configured to provide a modulation beam;
a solid-state optical modulator comprising a crystalline material that exhibits a change in refractive index in response to photoexcitation of free electrons within the crystalline material; and
a power source coupled to the solid-state optical modulator, the power source configured to introduce free electrons into the crystalline material;
wherein the modulation beam, when incident upon the crystalline material, causes photoexcitation of the free electrons within the crystalline material, and the photoexcitation of the free electrons within the crystalline material causes the crystalline material to exhibit the change in refractive index; and
wherein the working beam, when incident upon the crystalline material, undergoes a phase shift attributable at least in part to the change in refractive index exhibited by the crystalline material.

2. The irradiation device of claim 1 , wherein the working beam, when used to irradiate a powder material, becomes incident upon the powder material at a zone of incidence, and wherein the phase shift causes a change to an intensity distribution of the working beam at the zone of incidence.

3. The irradiation device of claim 1 , comprising a beam modulator disposed upstream from the solid-state optical modulator, the beam modulator configured to modulate at least a portion of the modulation beam.

4. The irradiation device of claim 3 , wherein the modulation beam, when incident upon a modulation region of the crystalline material, causes photoexcitation of the free electrons within the modulation region, and the photoexcitation of the free electrons within the modulation region causing the modulation region to exhibit the change in refractive index relative to a nominal region of the crystalline material.

5. The irradiation device of claim 4 , wherein the working beam comprises a modulated portion that propagates through the modulation region and a nominal portion that propagates through the nominal region, and wherein the change in refractive index exhibited by the modulation region causes the modulated portion of the working beam to undergo a phase shift relative to the nominal portion of the working beam.

6. The irradiation device of claim 5 , wherein the modulated portion and the nominal portion of the working beam exhibit superposition that augments an intensity of the working beam with respect to the modulated portion and the nominal portion being directed upon a powder material when additively manufacturing a three-dimensional object.

7. The irradiation device of claim 1 , comprising:
a beam modulator disposed upstream from the solid-state optical modulator, the beam modulator configured to modulate the modulation beam with respect to amplitude and/or phase.

8. The irradiation device of claim 1 , comprising:
a beam combiner disposed upstream from the solid-state optical modulator, the beam combiner configured to at least partially align the modulation beam with the working beam;
and/or a beam splitter disposed downstream from the crystalline material of the solid-state optical modulator, the beam splitter configured to at least partially split the modulation beam from the working beam.

9. The irradiation device of claim 1 , wherein the solid-state optical modulator comprises a transmissive solid-state optical modulator, a reflective solid-state optical modulator, or a reflective-transmissive solid-state optical modulator.

10. The irradiation device of claim 9 , wherein the solid-state optical modulator comprises a reflective solid-state optical modulator or a reflective-transmissive solid-state optical modulator, and wherein the solid-state optical modulator comprises a highly reflective coating.

11. The irradiation device of claim 1 , wherein the solid-state optical modulator comprises a cathode layer and an anode layer, wherein the power source is coupled to the cathode layer and the anode layer.

12. The irradiation device of claim 1 , wherein the solid-state optical modulator comprises an anti-reflective medium.

13. The irradiation device of claim 1 , wherein the crystalline material exhibits a Kerr effect.

14. The irradiation device of claim 1 , wherein the crystalline material comprises a perovskite-type structure.

15. The irradiation device of claim 14 , wherein the perovskite-type structure comprises one of: potassium tantalate niobate, lithium niobate, lead lanthanum zirconate titanate, lead magnesium niobate-lead titanate, lead zinc niobate-lead titanate, lead scandium niobate-lead titanate.

16. The irradiation device of claim 14 , wherein the perovskite-type structure comprises a dopant, the dopant comprising a metal element and/or a rare-earth element.

17. The irradiation device of claim 1 , wherein the working beam exhibits a wavelength of from 900 nanometers to 1,100 nanometers; and/or wherein the modulation beam exhibits a wavelength of from 315 nm to 750 nm.

18. The irradiation device of claim 1 , wherein the working beam exhibits a power of from 50 watts to 2000 watts; and/or wherein the modulation beam exhibits a power of from 1 milliwatt to 10 Watts.

Assignees

• Concept Laser Gmbh

Inventors

• Zimmermann Maik
• Bechmann Florian

Classifications

• G02F1/0327 Primary

  Operation of the cell; Circuit arrangements (G02F1/05 takes precedence) · CPC title

• B22F10/28 Primary

  Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM] · CPC title

• B22F12/43

  pulsed; frequency modulated · CPC title

• B23K26/064

  by means of optical elements, e.g. lenses, mirrors or prisms · CPC title

• B23K26/0604

  by a combination of beams · CPC title