Display panel
US-2019157363-A1 · May 23, 2019 · US
Method of manufacturing display apparatus
US11869903B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11869903-B2 |
| Application number | US-202117554078-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 17, 2021 |
| Priority date | Aug 21, 2019 |
| Publication date | Jan 9, 2024 |
| Grant date | Jan 9, 2024 |
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- Title
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- Abstract
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- Assignees and inventors
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- First independent claim
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- CPC / IPC classifications
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- Citations and related patents
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Abstract
Official abstract text for this publication.
A method of manufacturing a display apparatus includes forming a first conductive layer on a base substrate including a panel area and a margin area disposed next to the panel area, the margin area including a dummy pattern area, forming a photoresist layer on the first conductive layer, forming a photoresist pattern by exposing and developing the photoresist layer, forming a first conductive pattern by etching the first conductive layer using the photoresist pattern, and removing the photoresist pattern. The forming the first conductive pattern includes forming a first pixel circuit pattern in the panel area, and forming a dummy pattern in the dummy pattern area of the margin area. An opening ratio of a portion where the dummy pattern is not formed with respect to the dummy pattern area is about 30% or more.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a display apparatus comprising: forming a thin film transistor in a panel area on a base substrate including the panel area and a margin area disposed next to the panel area; forming a conductive layer on the base substrate on which the thin film transistor is formed; patterning the conductive layer to form a dummy pattern in the margin area and a pixel electrode electrically connected to the thin film transistor in the panel area; forming a light emitting layer and an opposite electrode on the pixel electrode; and cutting the margin area of the base substrate to separate the margin area from the panel area. 2. The method of claim 1 , wherein the forming the conductive layer includes forming a layer containing silver (Ag). 3. The method of claim 1 , wherein the patterning the conductive layer comprises: forming a photoresist layer on the conductive layer; forming a photoresist pattern by exposing and developing the photoresist layer; and forming the pixel electrode and the dummy pattern by etching the conductive layer using the photoresist pattern. 4. The method of claim 3 , wherein the etching the conductive layer includes wet etching the conducive layer using an organic acid based etching solution.
Assignees
Inventors
Classifications
by liquid etching only · CPC title
- H10P50/71Primary
using masks for conductive or resistive materials · CPC title
Dummy elements, i.e. elements having non-functional features · CPC title
of multiple TFTs · CPC title
wherein the TFTs are in active matrices · CPC title
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Frequently asked questions
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- What does patent US11869903B2 cover?
- A method of manufacturing a display apparatus includes forming a first conductive layer on a base substrate including a panel area and a margin area disposed next to the panel area, the margin area including a dummy pattern area, forming a photoresist layer on the first conductive layer, forming a photoresist pattern by exposing and developing the photoresist layer, forming a first conductive p…
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P50/71. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).