Programmable nanolithography mask

Patent metadata

Field	Value
Publication number	US-11868051-B2
Application number	US-202117995230-A
Country	US
Kind code	B2
Filing date	Apr 2, 2021
Priority date	Apr 2, 2020
Publication date	Jan 9, 2024
Grant date	Jan 9, 2024

Abstract

Conventional optical lithography uses masks with static patterns that are expensive and labor intensive to produce. The present disclosure is directed to a programmable optical lithography mask with an array of cells that use a hydrogen-mediated mechanism to tune their optical properties (e.g., transmission, absorption, refractive index, and/or reflectivity) dynamically and reversibly. Each cell in the programmable mask may be individually addressable to produce a large variety of patterns. The programmable mask may be configured for ultra-fine spatial resolution or coarse spatial resolution, facilitating a wide range of applications. The programmable mask may be stable against short wavelength light, such as broadband ultraviolet (UV) light, and can thus act as a light valve for short wavelength light.

First claim

The invention claimed is:

1. A reconfigurable mask comprising:
a first electrode;
a second electrode;
a third electrode;
a hydrogen loading layer, disposed between the first electrode and the second electrode and between the first electrode and the third electrode, comprising:
a first hydrogen loading region, disposed between the first electrode and the second electrode, having a first transmission, absorption, phase shift, and/or reflectivity that varies with a first concentration of hydrogen ions in the first hydrogen loading region; and
a second hydrogen loading region, disposed between the first electrode and the third electrode, having a second transmission, absorption, phase shift, and/or reflectivity that varies with a second concentration of hydrogen ions in the second hydrogen loading region;

a proton-conducting electrolyte, disposed between the first electrode and the second electrode and between the first electrode and the third electrode, comprising:
a first proton conducting region, disposed between the first electrode and the second electrode, defining a first interface in direct contact with the first electrode; and
a second proton conducting region, disposed between the first electrode and the third electrode, defining a second interface in direct contact with the first electrode;

a water storage layer, disposed on the first electrode, to store water, hydrate compounds, or hydroxide ions and to provide hydrogen ions to the hydrogen loading layer via electrochemical reactions of the water, hydrate compounds, or hydroxide ions at the first interface and the second interface; and
a capping layer, deposited on top of the water storage layer, to prevent or reduce dehydration of the water storage layer,
wherein the first electrode is porous or permeable to water, hydrogen, or hydrogen ions.

2. The reconfigurable mask of claim 1 , wherein the water storage layer stores water and:
the first interface is configured to split water into oxygen and hydrogen ions in response to a first voltage, applied across the first electrode and the second electrode, the first voltage generating a first electric field, at least some of the hydrogen ions propagating towards the first hydrogen loading region via at least one of the first electric field or diffusion, to change the first concentration of hydrogen ions in the first hydrogen loading region and the first transmission, absorption, phase shift, and/or reflectivity of the first hydrogen loading region; and
the second interface is configured to split water into oxygen and hydrogen ions in response to a second voltage, applied across the first electrode and the third electrode, the second voltage generating a second electric field, at least some of the hydrogen ions propagating towards the second hydrogen loading region via at least one of the second electric field or diffusion, to change the second concentration of hydrogen ions in the second hydrogen loading region and the second transmission, absorption, phase shift, and/or reflectivity of the second hydrogen loading region.

3. The reconfigurable mask of claim 2 , further comprising:
a voltage source, in electrical communication with the first electrode, the second electrode, and the third electrode, to apply the first voltage and the second voltage,
the first voltage equal to a sum of a first terminal voltage applied to the first electrode and a second terminal voltage applied to the second electrode,
the second voltage equal to a sum of the first terminal voltage and a third terminal voltage applied to the third electrode.

4. The reconfigurable mask of claim 3 , wherein the first voltage is one of a loading voltage to change the first transmission, absorption, phase shift, and/or reflectivity by splitting water at the first interface, an idle voltage to hold the first transmission, absorption, phase shift, and/or reflectivity constant by preventing a change in the first concentration of hydrogen ions, or an unloading voltage to change the first transmission, absorption, phase shift, and/or reflectivity by recombining the oxygen and the hydrogen ions into water at the first interface.

5. The reconfigurable mask of claim 4 , wherein the loading voltage is greater than about 2.5 V, the idle voltage is between about 0 V and about 2.5 V, and the unloading voltage is less than about 0 V.

6. The reconfigurable mask of claim 4 , wherein the first voltage is the loading voltage and the second voltage is the idle voltage to hold the second transmission, absorption, phase shift, and/or reflectivity constant by preventing a change in the second concentration of hydrogen ions in the second hydrogen loading region.

7. The reconfigurable mask of claim 1 , wherein:
the first electrode is orthogonal to the second electrode; and
the second electrode is parallel to the third electrode.

8. The reconfigurable mask of claim 7 , wherein the second electrode and the third electrode have identical widths and wherein the second electrode and the third electrode are separated by a distance less than about 100 nm such that a ratio of the distance to the width of the second electrode and the third electrode is less than 1:1.

9. The reconfigurable mask of claim 1 , wherein the first electrode, the second electrode, and the third electrode each have a width ranging between about 10 nm and about 100 μm.

10. The reconfigurable mask of claim 1 , wherein the hydrogen loading layer and the proton-conducting electrolyte form a stack having a thickness between about 10 nm and about 200 nm.

11. The reconfigurable mask of claim 1 , wherein the first electrode, the second electrode, and the third electrode each have a thickness less than about 100 nm.

12. The reconfigurable mask of claim 1 , wherein the first transmission, absorption, phase shift, and/or reflectivity and the second transmission, absorption, phase shift, and/or reflectivity correspond to a wavelength less than about 700 nm.

13. The reconfigurable mask of claim 1 , wherein the water storage layer is transparent to wavelengths of light modulated by the reconfigurable mask.

14. The reconfigurable mask of claim 1 , wherein the water storage layer comprises at least one of a transparent hydrogel or an oxide.

15. A lithography system comprising:
a light source to emit light;
a photoresist to receive a first portion of the light; and
the reconfigurable mask of claim 1 , disposed between the light source and the photoresist, to receive the light and transmit the first portion of the light, the first portion of the light corresponding to the light transmitted through the first and second hydrogen loading regions,
wherein the second electrode and the third electrode of the reconfigurable mask are separated by a gap,
wherein the gap is at least one of (1) sufficiently small such that a second portion of the light is transmitted through the gap with an intensity insufficient to change a chemical structure of the photoresist or (2) filled with a material that prevents the transmission of the second portion of the light.

16. A lithography system comprising:
a reconfigurable mask comprising:
a first electrode porous or permeable to water, hydrogen, and/or hydrogen ions;
a second electrode;
a third electrode; and
a hydrogen loading layer, disposed between the first electrode and the second electrode and between the first electrode and the third electrode, comprising:
a first hydrogen loading region, disposed between the first electrode and the second electrode, having a first optical property that varies with a first concentration of hydrogen ions in the

Assignees

• Massachusetts Inst Technology

Inventors

• Tan Aik Jun
• Huang Mantao
• Beach Geoffrey S D

Classifications

• G03F7/70291 Primary

  Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices · CPC title

• C25B1/04

  by electrolysis of water · CPC title

• C25B9/23

  comprising ion-exchange membranes in or on which electrode material is embedded · CPC title

• Y02E60/36

  Hydrogen production from non-carbon containing sources, e.g. by water electrolysis · CPC title