Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried

US11867643B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11867643-B2
Application numberUS-201917050373-A
CountryUS
Kind codeB2
Filing dateApr 15, 2019
Priority dateJan 31, 2019
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmission antenna for applying the microwave and the upper surface of the reception antenna for receiving the microwave are planar, and side surfaces of the upper surfaces of the transmission antenna and the reception antenna face each other.

First claim

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The invention claimed is: 1. A planar-type plasma diagnosis apparatus comprising: a transmission antenna configured to apply a frequency-variable microwave to plasma; a reception antenna configured to receive the microwave from the plasma; and a body part configured to encompass the transmission antenna and the reception antenna so that the transmission antenna and the reception antenna are insulated from each other, wherein, each of an upper surface of the transmission antenna configured to apply the microwave and an upper surface of the reception antenna configured to receive the microwave has a planar shape, the upper surface of the transmission antenna and the upper surface of the reception antenna are horizontally adjacent to each other to face each other, and in each of the upper surface of the transmission antenna and the upper surface of the reception antenna, a length from one end to the other end in an opposite direction is smaller than a length from one end to the other end in a direction perpendicular to the opposite direction. 2. The planar-type plasma diagnosis apparatus of claim 1 , wherein each of the upper surfaces of the transmission antenna and the reception antenna has a quadrangular shape. 3. The planar-type plasma diagnosis apparatus of claim 2 , wherein the transmission antenna and the reception antenna have rectangular parallelepiped shapes disposed in the body part to be adjacent to and face each other. 4. The planar-type plasma diagnosis apparatus of claim 2 , wherein: a longitudinal length of the upper surface is greater than a lateral length of the upper surface; and the longitudinal length of the upper surface of the transmission antenna and the longitudinal length of the upper surface of the reception antenna are disposed to face each other. 5. The planar-type plasma diagnosis apparatus of claim 4 , wherein the longitudinal length of each of the upper surfaces of the transmission antenna and the reception antenna ranges from 2 mm to 30 mm. 6. The planar-type plasma diagnosis apparatus of claim 5 , wherein the lateral length of each of the upper surfaces of the transmission antenna and the reception antenna ranges from 0.1 mm to 10 mm. 7. The planar-type plasma diagnosis apparatus of claim 1 , wherein an interval (D) between the upper surface of the transmission antenna and the upper surface of the reception antenna ranges from 1 mm to 15 mm. 8. The planar-type plasma diagnosis apparatus of claim 1 , wherein insulating films are respectively formed on the upper surface of the transmission antenna and the upper surface of the reception antenna. 9. The planar-type plasma diagnosis apparatus of claim 1 , wherein a cable configured to transmit or receive an ultra-high frequency is connected through a lower surface of the transmission antenna or the reception antenna facing the upper surface of the transmission antenna or the reception antenna. 10. The planar-type plasma diagnosis apparatus of claim 9 , wherein the cable configured to transmit or receive the ultra-high frequency is connected in a range from a center of a longitudinal length of the lower surface to a quarter of the longitudinal length. 11. A wafer-type plasma diagnosis apparatus with a planar-type plasma diagnosis apparatus embedded therein, comprising a circular member in which at least one planar-type plasma diagnosis apparatus is embedded, wherein, the planar-type plasma diagnosis apparatus includes a transmission antenna configured to apply a frequency-variable microwave to plasma, a reception antenna configured to receive the microwave from the plasma, and a body part configured to encompass the transmission antenna and the reception antenna so that the transmission antenna and the reception antenna are insulated from each other, each of an upper surface of the transmission antenna configured to apply the microwave and an upper surface of the reception antenna configured to receive the microwave has a planar shape, the upper surface of the transmission antenna and the upper surface of the reception antenna are horizontally adjacent to each other to face each other, and in each of the upper surface of the transmission antenna and the upper surface of the reception antenna, a length from one end to the other end in an opposite direction is smaller than a length from one end to the other end in a direction perpendicular to the opposite direction. 12. The wafer-type plasma diagnosis apparatus of claim 11 , wherein the planar-type plasma diagnosis apparatus is embedded in a center portion or an edge of the circular member. 13. The wafer-type plasma diagnosis apparatus of claim 11 , wherein the planar-type plasma diagnosis apparatus is embedded in plurality in the circular member. 14. The wafer-type plasma diagnosis apparatus of claim 13 , wherein the planar-type plasma diagnosis apparatus is radially embedded in plurality from the center portion of the circular member. 15. The wafer-type plasma diagnosis apparatus of claim 13 , wherein the planar-type plasma diagnosis apparatus is embedded in plurality in the circular member in a lattice shape or a cross shape. 16. An electrostatic chuck in which a planar-type plasma diagnosis apparatus is embedded, wherein, the planar-type plasma diagnosis apparatus includes a transmission antenna configured to apply a frequency-variable microwave to plasma, a reception antenna configured to receive the microwave from the plasma, and a body part configured to encompass the transmission antenna and the reception antenna so that the transmission antenna and the reception antenna are insulated from each other, each of an upper surface of the transmission antenna configured to apply the microwave and an upper surface of the reception antenna configured to receive the microwave has a planar shape, the upper surface of the transmission antenna and the upper surface of the reception antenna are horizontally adjacent to each other to face each other, in each of the upper surface of the transmission antenna and the upper surface of the reception antenna, a length from one end to the other end in an opposite direction is smaller than a length from one end to the other end in a direction perpendicular to the opposite direction, and the planar-type plasma diagnosis apparatus is embedded in a surface of the electrostatic chuck. 17. The electrostatic chuck of claim 16 , wherein the planar-type plasma diagnosis apparatus is buried in a center portion or an edge of the electrostatic chuck. 18. The electrostatic chuck of claim 16 , wherein the planar-type plasma diagnosis apparatus is embedded in plurality. 19. The electrostatic chuck of claim 18 , wherein the planar-type plasma diagnosis apparatus is radially embedded in plurality from a center portion of the electrostatic chuck. 20. The electrostatic chuck of claim 18 , wherein the planar-type plasma diagnosis apparatus is embedded in plurality in a lattice shape or a cross shape.

Assignees

Inventors

Classifications

  • Details of electrostatic chucks · CPC title

  • for supporting or gripping · CPC title

  • G01N22/00Primary

    Investigating or analysing materials by the use of microwaves or radio waves, i.e. electromagnetic waves with a wavelength of one millimetre or more (G01N3/00 - G01N17/00, G01N24/00 take precedence) · CPC title

  • Antennas · CPC title

  • Workpiece holder · CPC title

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What does patent US11867643B2 cover?
The present invention relates to a planar-type plasma diagnosis apparatus comprising: a transmission antenna for applying a frequency-variable microwave to plasma; a reception antenna for receiving the microwave from the plasma; and a body part encompassing the transmission antenna and the reception antenna so that same are insulated from each other, wherein the upper surface of the transmissio…
Who is the assignee on this patent?
Korea Res Inst Standards & Sci
What technology area does this patent fall under?
Primary CPC classification G01N22/00. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).