Bearing monitoring apparatus and method for monitoring bearing

US11867227B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11867227-B2
Application numberUS-202017596755-A
CountryUS
Kind codeB2
Filing dateJun 11, 2020
Priority dateJun 21, 2019
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A bearing monitoring apparatus includes a rolling bearing, multiple rolling elements, a strain gauge configured to detect strain of the outer ring or the inner ring, the strain gauge including at least two resistors, and the resistors being arranged in a same direction as an arrangement direction of the rolling elements so as to correspond to spacing between rolling elements that are next to each other. The bearing monitoring apparatus includes a first circuit configured to generate a first distorted waveform based on an output of one resistor and to generate a second distorted waveform based on an output of another resistor. The bearing monitoring apparatus includes a second circuit configured to subtract the second distorted waveform from the first distorted waveform to generate a differential waveform. The second circuit is configured to compare the differential waveform against a reference value to detect a wear state of the rolling bearing.

First claim

Opening claim text (preview).

The invention claimed is: 1. A bearing monitoring apparatus comprising: a rolling bearing including an outer ring, an inner ring disposed coaxially with the outer ring, the inner ring being on an inner peripheral side of the outer ring, multiple rolling elements disposed between the outer ring and the inner ring, and a strain gauge configured to detect strain of the outer ring or the inner ring, the strain gauge including at least two resistors, and the resistors being arranged in a same direction as an arrangement direction of the rolling elements so as to correspond to spacing between rolling elements that are next to each other; a first circuit configured to generate a first distorted waveform based on an output of one resistor of the at least two resistors and to generate a second distorted waveform based on an output of another resistor of the at least two resistors; and a second circuit configured to: subtract the second distorted waveform from the first distorted waveform to generate a differential waveform; and compare the differential waveform against a reference value to detect a wear state of the rolling bearing. 2. The bearing monitoring apparatus according to claim 1 , wherein the at least two resistors in the rolling bearing are disposed on an outer peripheral surface of the outer ring or an inner peripheral surface of the inner ring. 3. The bearing monitoring apparatus according to claim 2 , wherein the at least two resistors in the rolling bearing are disposed on a side opposite a preload. 4. The bearing monitoring apparatus according to claim 1 , wherein the at least two resistors in the rolling bearing are disposed on an end surface of the outer ring or an end surface of the inner ring. 5. The bearing monitoring apparatus according to claim 1 , wherein the rolling bearing includes a housing disposed in contact with the outer periphery of the outer ring, and wherein the at least two resistors are disposed on an outer peripheral surface of the housing. 6. The bearing monitoring apparatus according to claim 1 , wherein the rolling bearing includes a housing disposed in contact with the outer periphery of the outer ring, and wherein the at least two resistors are disposed on an end surface of the housing. 7. The bearing monitoring apparatus according to claim 1 , wherein the at least two resistors in the rolling bearing are arranged such that a longitudinal direction of each resistor is directed in a circumferential direction of the outer ring or the inner ring. 8. The bearing monitoring apparatus according to claim 1 , wherein each of the at least two resistors in the rolling bearing is formed of a Cr composite film. 9. A method for monitoring a bearing, the method comprising: generating a first distorted waveform based on an output of one resistor of at least two resistors in a rolling bearing, and generating a second distorted waveform based on an output of another resistor of the at least two resistors, the rolling bearing including an outer ring; an inner ring disposed coaxially with the outer ring, the inner ring being on an inner peripheral side of the outer ring, multiple rolling elements disposed between the outer ring and the inner ring, and a strain gauge configured to detect strain of the outer ring or the inner ring, the strain gauge including the at least two resistors, and the resistors being arranged in a same direction as an arrangement direction of the rolling elements so as to correspond to spacing between rolling elements that are next to each other; subtracting the second distorted waveform from the first distorted waveform to generate a differential waveform; and comparing the differential waveform against a reference value to detect a wear state of the rolling bearing.

Assignees

Inventors

Classifications

  • F16C19/06Primary

    with a single row or balls · CPC title

  • related to load on the bearing, e.g. bearings with load sensors or means to protect the bearing against overload · CPC title

  • outside the space between the races, e.g. end faces or bore of inner ring · CPC title

  • between shaft and inner race ring · CPC title

  • between housing and outer race ring · CPC title

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Frequently asked questions

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What does patent US11867227B2 cover?
A bearing monitoring apparatus includes a rolling bearing, multiple rolling elements, a strain gauge configured to detect strain of the outer ring or the inner ring, the strain gauge including at least two resistors, and the resistors being arranged in a same direction as an arrangement direction of the rolling elements so as to correspond to spacing between rolling elements that are next to ea…
Who is the assignee on this patent?
Minebea Mitsumi Inc
What technology area does this patent fall under?
Primary CPC classification F16C19/06. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).