Gas core vortex ring generator

US11867208B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11867208-B2
Application numberUS-202117489438-A
CountryUS
Kind codeB2
Filing dateSep 29, 2021
Priority dateSep 29, 2021
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method is provided for producing a vortex ring in a liquid medium. The method includes concatenating pairs of insulated anode and cathode rings into a stack; inserting the stack into a vertically oriented chamber; disposing a cylindrical cavity below the chamber; inserting a piston into the cavity; connecting the chamber to the medium; and raising the piston to displace the medium while the stack produces an annular bubble that induces the vortex ring. In particular, the medium is water and the stack separates the medium into hydrogen and oxygen gas.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for producing a gaseous core vortex ring in a liquid medium, said method comprising: concatenating pairs of insulated anode and cathode rings into a stack; inserting said stack into a vertically oriented chamber; disposing a cylindrical cavity below said chamber; inserting a piston into said cavity; connecting said chamber to the medium; and raising said piston to displace the medium while said stack produces an annular bubble that induces the vortex ring. 2. The method according to claim 1 , wherein the medium is water and said stack separates the medium into hydrogen and oxygen gas. 3. The method according to claim 1 , wherein said anode and cathode rings have a respective difference potential of at least 1.23 V. 4. A device for producing a vortex ring in a liquid medium, said device comprising: a housing containing a cylindrical chamber oriented vertically; a column having a cylindrical cavity disposed beneath said chamber; a piston contained within and movable along said cavity, said piston being movable by an external influence; and a stack of interweaving anode and cathode rings, each ring having a circular through-hole, wherein said stack is contained within said chamber, said cavity and said through-hole in said each ring forming a continuous circular channel, and said influence causes said piston to translate from said cavity into said stack to induce motion in the medium for said stack to generate a gas bubble around which the vortex ring forms. 5. The device according to claim 4 , wherein the medium is water and said anode and cathode rings separate said water into hydrogen and oxygen by electrolysis. 6. The device according to claim 4 , wherein said anode and cathode rings comprise copper. 7. The device according to claim 4 , wherein said anode and cathode rings have a respective difference potential of at least 1.23 V. 8. The device according to claim 4 , wherein an insulator ring separates each said anode and cathode ring from each other in said stack. 9. The device according to claim 8 , wherein said insulation ring comprises a non-conductive polymer. 10. The device according to claim 8 , wherein said insulation ring comprises polytetrafloroethylene. 11. The device according to claim 8 , wherein said insulation ring comprises polyvinyl chloride.

Assignees

Inventors

Classifications

  • F15D1/009Primary

    by means of vortex rings · CPC title

  • Means to cause rotational flow of fluid [e.g., vortex generator] · CPC title

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Frequently asked questions

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What does patent US11867208B2 cover?
A method is provided for producing a vortex ring in a liquid medium. The method includes concatenating pairs of insulated anode and cathode rings into a stack; inserting the stack into a vertically oriented chamber; disposing a cylindrical cavity below the chamber; inserting a piston into the cavity; connecting the chamber to the medium; and raising the piston to displace the medium while the s…
Who is the assignee on this patent?
Weiland Christopher J, Us Navy
What technology area does this patent fall under?
Primary CPC classification F15D1/009. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).