Fluoropolyether compound, lubricant, and magnetic disk

US11866550B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11866550-B2
Application numberUS-202217863602-A
CountryUS
Kind codeB2
Filing dateJul 13, 2022
Priority dateJul 16, 2021
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a fluoropolyether compound having high heat resistance and capable of maintaining a surface protection layer even under high temperature, and a lubricant and a magnetic disk that contain the fluoropolyether compound. The fluoropolyether compound includes: three groups whose main chain contains a perfluoropolyether chain; and a trivalent linking group represented by Formula (1) below, the three groups being bound together via the trivalent linking group: where R 1 is a saturated hydrocarbon group having 1 to 3 carbon atoms, a perfluoroalkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a hydroxyl group, or an amino group, and A 1 , A 2 , and A 3 are each independently an aromatic group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A fluoropolyether compound represented by a Formula below: where R 1 is a saturated hydrocarbon group having 1 to 3 carbon atoms, a perfluoroalkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a hydroxyl group, or an amino group, and A 1 , A 2 , and A 3 are each independently a phenylene group, a naphthylene group, a biphenyl group, or a diphenyl ether group, and each —(CF 2 ) a — is independently a linear of branched perfluoroalkylene group, each a is independently a real number of 1 to 3, and Rf is represented by Formula (4) below: Rf;(OCF 2 ) b (OCF 2 CF 2 ) c (OCF 2 CF 2 CF 2 ) d (OCF 2 CF 2 CF 2 CF 2 ) e (OCF 2 CF(CF 3 )) r   (4) where b, c, d, e, and f are independently real numbers of 0 to 21 for each Rf, and at least any one of b, c, d, e, and f is a real number of not less than 1, R 2 , R 3 , and R 4 are each independently F, CH 2 OH, CH 2 OCH 2 CH(OH)CH 2 OH, CH 2 OCH 2 CH(OH)CH 2 OCH 2 CH(OH)CH 2 OH, CH 2 O(CH 2 ) g OH, CH 2 OCH 2 CH(OH)CH 2 OC 6 H 4 OC 6 H 5 , CH 2 OCH 2 CH(OH)CH 2 OC 10 H 7 , CH 2 OCH 2 CH(OH)CH 2 OC 6 H 4 —R 5 , CH 2 OCH 2 CH(OH)CH 2 O(CH 2 ) h OC 6 H 4 —O(CH 2 ) h OH, or CH 2 OCH 2 CH(OH)CH 2 (OCH 2 CH 2 ) i OC 6 H 4 (OCH 2 CH 2 ) i OH, R 5 is hydrogen, and alkoxy group having 1 to 4 carbon atoms, an amino group, a hydroxyl group, or an amide group, g and i are each independently a real number of 1 to 3, and each h is independently a real number of 1 to 6. 2. The fluoropolyether compound according to claim 1 , wherein the fluoropolyether compound is represented by Formula (3) below: 3. A lubricant comprising the fluoropolyether compound according to claim 1 . 4. A magnetic disk comprising: a recording layer; a protective layer disposed on the recording layer; and a lubricant layer disposed on the protective layer, the lubricant layer containing the lubricant according to claim 3 .

Assignees

Inventors

Classifications

  • C08G65/007Primary

    containing fluorine · CPC title

  • containing halogen · CPC title

  • Special methods of preparation of lubricating compositions; Chemical modification by after-treatment of components or of the whole of a lubricating composition, not covered by other classes · CPC title

  • Perfluoropolyether lubricant · CPC title

  • used as base material · CPC title

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What does patent US11866550B2 cover?
Provided are a fluoropolyether compound having high heat resistance and capable of maintaining a surface protection layer even under high temperature, and a lubricant and a magnetic disk that contain the fluoropolyether compound. The fluoropolyether compound includes: three groups whose main chain contains a perfluoropolyether chain; and a trivalent linking group represented by Formula (1) belo…
Who is the assignee on this patent?
Moresco Corp
What technology area does this patent fall under?
Primary CPC classification C08G65/007. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).