Liquid, hybrid UV/vis radiation curable resin compositions for additive fabrication

US11866526B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11866526-B2
Application numberUS-202017637161-A
CountryUS
Kind codeB2
Filing dateAug 31, 2020
Priority dateAug 30, 2019
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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Liquid radiation curable compositions are disclosed which are suitable for hybrid (i.e. cationic and free-radical) polymerization when processed via additive fabrication equipment utilizing sources of actinic radiation with peak spectral intensities in the UV/vis region. According to one aspect, the compositions possess a first photoinitiator that is an iodonium salt of a non-fluorinated borate anion. According to another aspect, the composition is substantially devoid of a Norrish Type I and/or Type II photoinitiator. Also disclosed are methods of creating three-dimensional parts via additive fabrication processes utilizing sources of actinic radiation with peak spectral intensities in the UV/vis region employing liquid radiation curable compositions suitable for hybrid polymerization, and the parts cured therefrom.

First claim

Opening claim text (preview).

What is claimed is: 1. A radiation curable composition comprising a cationically curable constituent and a free-radically curable constituent, said composition further comprising at least a first photoinitiator that is an iodonium salt of a non-fluorinated borate anion, and a photosensitizer. 2. The radiation curable composition of claim 1 , wherein the iodonium salt of the non-fluorinated borate anion is an iodonium salt of a non-halogenated borate anion. 3. The radiation curable composition of claim 1 , wherein the non-fluorinated borate anion of the iodonium salt has the formula: wherein R 1 -R 4 are independently selected from the group consisting of alkyl, alkenyl, alkynyl, cycloalkyl, heterocycloalkyl, aryl, and heteroaryl, and further wherein (i) one or more substitutable carbon atoms of alkyl, alkenyl, or alkynyl is optionally substituted with hydroxy, carboxy, alkoxy, alkanoyl, hydroxyalkyl, carboxyalkyl, alkoxyalkyl, or alkanoylalkyl, or (ii) one or more substitutable carbon atoms of cycloalkyl, heterocycloalkyl, aryl, or heteroaryl is optionally substituted with alkyl, hydroxy, carboxy, alkoxy, alkanoyl, hydroxyalkyl, carboxyalkyl, alkoxyalkyl, or alkanoylalkyl. 4. The radiation curable composition of claim 3 , wherein R 1 -R 4 are independently selected from an aryl radical, optionally substituted at one or more substitutable carbon atoms with alkyl or alkoxy. 5. The radiation curable composition of claim 4 , wherein R 1 -R 4 are each phenyl, optionally independently substituted with alkyl or alkoxy, wherein alkyl or the alkyl portion of alkoxy has from 1-10 carbon atoms. 6. The radiation curable composition of claim 5 , wherein the non-fluorinated borate anion of the iodonium salt is a tetraphenyl borate anion having the formula: 7. The radiation curable composition of claim 1 , wherein the iodonium salt of the non-fluorinated borate anion has a diaryliodonium cation. 8. The radiation curable composition of claim 7 , wherein the diaryliodonium cation of the iodonium salt is a diphenyliodonium salt, having two phenyl radicals optionally substituted with alkyl or alkoxy, wherein alkyl or the alkyl portion of alkoxy has from 1-10 carbon atoms. 9. The radiation curable composition of claim 8 , wherein the diphenyliodonium cation of the iodonium salt is a bis 4-cumyl iodonium cation or a bis 4-tert-butyl iodonium cation having the structure: 10. The radiation curable composition of claim 1 , wherein the first photoinitiator is bis 4-cumyl iodonium tetraphenyl borate or bis 4-tert-butyl iodonium tetraphenyl borate. 11. The radiation curable composition of claim 1 , wherein the composition is substantially devoid of a free-radical phosphorous-containing photoinitiator, or contains an amount by weight of a free-radical phosphorous-containing photoinitiator of less than about 0.1 wt-%. 12. The radiation curable composition of claim 1 , wherein the composition is substantially devoid of a Norrish Type I and/or Norrish Type II photoinitiator, or contains an amount by weight of a Norrish Type I and/or Norrish Type II photoinitiator of less than about 0.1 wt-%. 13. The radiation curable composition of claim 1 , wherein the cationically curable constituent comprises both a cycloaliphatic epoxy compound and an oxetane compound. 14. The radiation curable composition of claim 13 , wherein when the composition is exposed to UV/vis optics emitting radiation with a peak spectral output from 375-405 nm and an irradiance at a surface of the composition of 2 mW/cm 2 for 10 seconds, the cycloaliphatic epoxy compound achieves a conversion of at least about 35%, and the oxetane compound achieves a conversion of at least about 40%. 15. The radiation curable composition of claim 1 , wherein the first photoinitiator is present in the composition in an amount from about 0.1 wt-% to about 1 wt-%. 16. The radiation curable composition of claim 1 , further comprising a second iodonium salt cationic photoinitiator, wherein the second iodonium salt cationic photoinitiator is present in the composition in an amount from about 0.5 wt-% to about 8 wt-%. 17. The radiation curable composition of claim 1 , further comprising a reductant, wherein said reductant possesses an electron-donating substituent bonded to a vinyl group. 18. The radiation curable composition of claim 17 , wherein the reductant comprises a vinyl ether compound, optionally wherein the vinyl ether compound possesses at least two vinyl groups. 19. The radiation curable composition of claim 1 , wherein the photosensitizer is present in the composition in an amount by weight from about 0.05 to about 0.8 wt %. 20. The radiation curable composition of claim 17 , wherein the reductant is present in the composition in an amount by weight from about 1 wt % to about 10 wt %.

Assignees

Inventors

Classifications

  • C08F2/50Primary

    with sensitising agents · CPC title

  • characterised by the energy source therefor, e.g. by global irradiation combined with a mask · CPC title

  • of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate · CPC title

  • carbocyclic · CPC title

  • aromatic {, e.g. C6H5-CH2-Cl} · CPC title

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What does patent US11866526B2 cover?
Liquid radiation curable compositions are disclosed which are suitable for hybrid (i.e. cationic and free-radical) polymerization when processed via additive fabrication equipment utilizing sources of actinic radiation with peak spectral intensities in the UV/vis region. According to one aspect, the compositions possess a first photoinitiator that is an iodonium salt of a non-fluorinated borate…
Who is the assignee on this patent?
Covestro Netherlands Bv, Stratasys Inc
What technology area does this patent fall under?
Primary CPC classification C08F2/50. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).