Tape-casting apparatuses for preparing carbon nanostructure sheets and carbon nanostructure sheets prepared by the same

US11866331B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11866331-B2
Application numberUS-202117557371-A
CountryUS
Kind codeB2
Filing dateDec 21, 2021
Priority dateJun 7, 2017
Publication dateJan 9, 2024
Grant dateJan 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Apparatuses and methods for preparing carbon nanostructure sheets are provided. The apparatuses may include a casting body including a substrate configured to move along a first direction, a slurry reservoir configured to contain a slurry, a dispenser connected to the slurry reservoir and configured to dispense the slurry onto a surface of the substrate and a doctoring member that extends in a second direction traversing the first direction and that is positioned above the surface of the substrate. The slurry may include carbon nanostructures, and/or one or more functional materials. The doctoring member may be spaced apart from the surface of the substrate by a predetermined distance.

First claim

Opening claim text (preview).

That which is claimed is: 1. A method of preparing a carbon nanostructure sheet, the method comprising: providing a slurry that includes carbon nanostructures; degassing the slurry; applying the slurry to a substrate, wherein applying the slurry includes using a doctoring member to spread the slurry over the substrate to form a composite nanostructure sheet; drying the composite nanostructure sheet; and separating the composite nanostructure sheet from the substrate. 2. The method of claim 1 , wherein the slurry includes a solvent, a dispersion agent, and at least one functional material. 3. The method of claim 2 , wherein the at least one functional material is a surfactant, an emulsifying agent, or a binder. 4. The method of claim 1 , further including degassing the slurry after applying the slurry to the substrate. 5. The method of claim 1 , wherein the substrate has a surface that is patterned or textured. 6. The method of claim 5 , wherein the surface of the substrate has a microscopic patterned surface. 7. The method of claim 6 , wherein the microscopic patterned surface includes micro-pyramids or micro-pillars. 8. The method of claim 7 , wherein the microscopic patterned surface includes micro-pyramids and the micro-pyramids have a height in a range of about 500 nm to 2,500 nm and a distance between adjacent micro-pyramids is in a range of between 1,000 nm and 3,000 nm. 9. The method of claim 7 , wherein the microscopic patterned surface includes micro-pillars and the micro-pillars have a height in a range of about 500 nm to 2,500 nm and a distance between adjacent micro-pillars is in a range of between 1,000 nm and 3,000 nm. 10. The method of claim 5 , wherein the surface of the substrate includes a patterned surface that includes a slotted surface, a perforated surface, serpentine stripes, or quatrefoil shapes. 11. The method of claim 1 , wherein applying the slurry to the substrate includes directing the slurry from a slurry reservoir and through a dispenser configured to dispense the slurry onto the substrate. 12. The method of claim 11 , wherein the slurry reservoir includes a mixing device or a homogenizer and wherein one or more of the slurry reservoir, the mixing device, or the homogenizer is configured to degas the slurry at a temperature greater than or equal to room temperature under a pressure of less than 0.01 mbar for about 1 second to about 1 minute. 13. The method of claim 1 , wherein the substrate is configured to move along a first direction. 14. The method of claim 13 , wherein the doctoring member extends in a second direction traverse to the first direction and wherein the doctoring member is positioned above the surface of the substrate, wherein the doctoring member is spaced apart from the surface of the substrate by a distance greater than about 0.01 mm. 15. The method of claim 1 , wherein a surface of the substrate comprises a material having a surface energy that is greater than 300 mNm −1 . 16. The method of claim 1 , wherein the substrate has a beveled edge. 17. The method of claim 1 , wherein a surface of the substrate has a root mean squared roughness value of about 150 nm to about 500 nm. 18. The method of claim 1 , wherein the substrate is heated to a temperature greater than room temperature. 19. The method of claim 1 , further including pressing the composite carbon nanostructure sheets with a pressure that is greater than or equal to 1 Pa for 5 seconds to 10 minutes.

Assignees

Inventors

Classifications

  • C01B32/168Primary

    After-treatment · CPC title

  • Slip casting, i.e. applying a slip or slurry on a perforated or porous or absorbent surface with the liquid being drained away · CPC title

  • Removing articles from moulds, cores or other substrates {(B29C33/444 and B29C37/0017 take precedence)} · CPC title

  • Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title

  • Manufacture or treatment of nanostructures · CPC title

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What does patent US11866331B2 cover?
Apparatuses and methods for preparing carbon nanostructure sheets are provided. The apparatuses may include a casting body including a substrate configured to move along a first direction, a slurry reservoir configured to contain a slurry, a dispenser connected to the slurry reservoir and configured to dispense the slurry onto a surface of the substrate and a doctoring member that extends in a …
Who is the assignee on this patent?
Univ Khalifa Science & Technology
What technology area does this patent fall under?
Primary CPC classification C01B32/168. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).