Partial eversion anastomosis juncture formation and suturing

US11857193B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11857193-B2
Application numberUS-202117400926-A
CountryUS
Kind codeB2
Filing dateAug 12, 2021
Priority dateMay 8, 2018
Publication dateJan 2, 2024
Grant dateJan 2, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed embodiments include apparatuses, systems, and methods for facilitating surgical anastomosis between bodily passages. In an illustrative embodiment, an eversion mechanism is configured to partially evert a distal portion of an opening of a receiving passage and further configured to leave a proximal portion of the opening of the receiving passage in a non-everted position. A donor support mechanism is configured to partially evert a distal portion of an opening at an end of a donor passage and further configured to leave a first proximal portion of the end of the donor passage in a non-everted position. The donor support mechanism is further configured to form a passage juncture at the end of the donor passage and the opening of the receiving passage. A suturing mechanism is configured to motivate a filament through a generally helical path around the passage juncture to suture the donor passage to the receiving passage.

First claim

Opening claim text (preview).

What is claimed is: 1. A method comprising: everting a distal portion of an end of a donor passage, a proximal portion of the end of the donor passage remaining in a non-everted position; everting a distal portion of an opening of a receiving passage, a proximal portion of the opening of the receiving passage remaining in a non-everted position; forming a passage juncture between the end of the donor passage and the opening of the receiving passage; and motivating a filament along a generally helical path around the passage juncture to suture the donor passage to the receiving passage, wherein the proximal portion of the donor passage meets the proximal portion of the receiving passage at an acute angle. 2. The method of claim 1 , further comprising presenting a plurality of guide sections around the periphery of the passage juncture where internal faces of the guide sections each define a partial helical channel. 3. The method of claim 2 , further comprising motivating the filament along the partial helical channel defined by the interior surface of each guide section with a helical needle shaped to travel along the partial helical channel. 4. The method of claim 1 , further comprising forming the opening of the donor passage in a side of the receiving passage. 5. The method of claim 1 , wherein everting the distal portion of the opening of the receiving passage is performed by applying suction to an exterior surface of the distal portion of the opening. 6. The method of claim 1 , wherein the receiving passage includes a coronary artery and the donor passage includes a saphenous vein. 7. The method of claim 1 , further comprising making a subxiphoid incision to provide access to a heart to access the coronary artery.

Assignees

Inventors

Classifications

  • applying the staples on the outside of the lumen · CPC title

  • Suturing instruments for use in minimally invasive surgery, e.g. endoscopic surgery · CPC title

  • for performing anastomosis; Buttons for anastomosis · CPC title

  • Image-producing devices, e.g. surgical cameras · CPC title

  • Surgical systems with images on a monitor during operation · CPC title

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What does patent US11857193B2 cover?
Disclosed embodiments include apparatuses, systems, and methods for facilitating surgical anastomosis between bodily passages. In an illustrative embodiment, an eversion mechanism is configured to partially evert a distal portion of an opening of a receiving passage and further configured to leave a proximal portion of the opening of the receiving passage in a non-everted position. A donor supp…
Who is the assignee on this patent?
Gyrus Acmi Inc
What technology area does this patent fall under?
Primary CPC classification A61B17/1152. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Jan 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).