Resist under layer film composition and patterning process
US-2016342088-A1 · Nov 24, 2016 · US
US11852973B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11852973-B2 |
| Application number | US-201917273401-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 4, 2019 |
| Priority date | Sep 18, 2018 |
| Publication date | Dec 26, 2023 |
| Grant date | Dec 26, 2023 |
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The present invention relates to a photosensitive resin composition having high sensitivity, high bending resistance for the cured film, and high long-term reliability for an organic EL display device in which the cured film is used. The present invention is a photosensitive resin composition containing an alkali-soluble resin (a), a phenolic resin (b) having a halogen atom, and a photosensitive compound (c).
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The invention claimed is: 1. A photosensitive resin composition comprising an alkali-soluble resin (a), a phenolic resin (b) having a halogen atom, and a photosensitive compound (c), wherein said phenolic resin (b) having a halogen atom has structural units represented by formula (1) and/or formula (2): wherein in formulae (1) and (2), A represents a divalent substituent having a halogen atom; R 1 , R 2 , R 5 , and R 6 independently represent a hydrogen atom or an optionally substituted C 1-10 hydrocarbon group, methylol group, or alkoxymethyl group; R 3 , R 4 , R 7 , and R 8 independently represent a hydrogen atom or an optionally substituted C 1-10 hydrocarbon group; p represents an integer of 0 to 2; q represents an integer of 0 to 4; and r and s represent an integer of 0 to 3. 2. The photosensitive resin composition according to claim 1 , wherein the halogen atom of said phenolic resin (b) having a halogen atom comprises a fluorine atom. 3. The photosensitive resin composition according to claim 1 , wherein A in the general formula (1) and/or the general formula (2) is -C(CF 3 ) 2 -. 4. The photosensitive resin composition according to claim 1 , wherein said alkali-soluble resin (a) comprises a polyimide, a polybenzoxazole, a polyamide-imide, a precursor thereof, and/or a copolymer thereof. 5. The photosensitive resin composition according to claim 1 , wherein the amount of said phenolic resin (b) having a halogen atom is 10 to 100 parts by mass with respect to 100 parts by mass of said alkali-soluble resin (a). 6. The photosensitive resin composition according to claim 1 , wherein said phenolic resin (b) having a halogen atom has, as a repeating unit(s), 50 to 100 mol % of a structure represented by formula (1) and/or general formula (2) with respect to 100 mol % of all repeating units constituting said phenolic resin (b) having a halogen atom. 7. The photosensitive resin composition according to claim 1 , wherein the amount of said photosensitive compound (c) is 25 to 100 parts by mass with respect to 100 parts by mass of the total of said alkali-soluble resin (a) and said resin (b). 8. The photosensitive resin composition according to claim 1 , wherein said photosensitive compound (c) comprises a quinone diazide compound. 9. The photosensitive resin composition according to claim 1 , further comprising a thermal crosslinking agent (d). 10. The photosensitive resin composition according to claim 1 , further comprising a phenolic compound (e) having an electron-withdrawing group and a phenolic hydroxyl group and having a molecular weight of 100 or more and less than 500. 11. A photosensitive resin sheet formed from said photosensitive resin composition according to claim 1 . 12. A cured film formed by curing said photosensitive resin composition according to claim 1 . 13. An organic EL display device comprising a driving circuit, a planarization layer, a first electrode, an insulation layer, a light-emitting layer, and a second electrode on a substrate, wherein said planarization layer and/or insulation layer contain(s) said cured film according to claim 12 . 14. The organic EL display device according to claim 13 , wherein said substrate comprises a resin film. 15. The organic EL display device according to claim 13 , wherein at least a part of said planarization layer and/or said insulation layer has a bendable portion and/or a bent and fixed portion, and wherein the curvature radius of said bendable portion and/or the bent and fixed portion is in the range of 0.1 mm or more and 5 mm or less. 16. The organic EL display device according to claim 13 , wherein said planarization layer is multilayered. 17. A semiconductor electronic component or semiconductor device having an electrode, a metal wiring, an interlayer insulation layer, and/or a surface protective layer on a substrate, wherein said interlayer insulation layer and/or said surface protective layer contain(s) said cured film according to claim 12 . 18. A method of producing an organic EL display device, comprising the steps of: forming a photosensitive resin film on a substrate using said photosensitive resin composition according to claim 1 ; exposing said photosensitive resin film; developing the exposed photosensitive resin film; and heating the developed photosensitive resin film.
Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins · CPC title
characterised by the non-macromolecular additives · CPC title
by ultraviolet or visible light · CPC title
of manganese, iron group metals or platinum group metals · CPC title
Phenols or alcohols · CPC title
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