Plasma ashing for coated devices

Patent metadata

Field	Value
Publication number	US-11849543-B2
Application number	US-202017084618-A
Country	US
Kind code	B2
Filing date	Oct 29, 2020
Priority date	Oct 29, 2019
Publication date	Dec 19, 2023
Grant date	Dec 19, 2023

Abstract

A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate.

First claim

What is claimed is:

1. A plasma ashing system comprising:
a plasma generator configured to generate a plasma from a gas source;
a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate and heat the plasma reaction chamber; and
a control processor configured to control a residence time and an ash rate for applying the plasma, wherein the system further comprises at least one sensor in the plasma reaction chamber, the at least one sensor configured to determine a stop time for the exposure, wherein the stop time is generated by determining a plasma composition and material composition of the Parylene coating.

2. The plasma ashing system of claim 1 , further comprising a UV pretreatment system, wherein the UV pretreatment system is configured to apply UV radiation to the surfaces of the Parylene coating on the substrate prior to exposing the surfaces of the Parylene coating to the plasma.

3. The plasma ashing system of claim 1 , wherein the gas source comprises an argon-, oxygen-, hydrogen-, or a nitrogen-containing gas, or a fluorocarbon gas, or a combination thereof.

4. The plasma ashing system of claim 1 , further comprising a masking fixture configured to shield areas of the substrate from plasma ashing.

5. The plasma ashing system of claim 1 , wherein the plasma is configured to heat the plasma reaction chamber.

6. The plasma ashing system of claim 1 , wherein the plasma is generated in a plasma generation chamber separate from the plasma reaction chamber.

7. The plasma ashing system of claim 1 , further comprising a masking fixture configured to shield areas of the substrate from plasma ashing, wherein the masking fixture is made of a material configured to withstand a temperature of up to 400° C., and wherein the masking fixture is configured to be reusable.

8. The plasma ashing system of claim 1 , wherein the plasma reaction chamber is configured to remove only a selected portion of the Parylene coating on the substrate by applying a plasma to the selected portion of the Parylene coating.

9. A plasma ashing system comprising:
a UV pretreatment system, wherein the UV pretreatment system is configured to apply UV radiation to surfaces of a Parylene coating on a substrate;
a plasma generator configured to generate a plasma from a gas source; and
a plasma reaction chamber configured to house the substrate, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate and heat the plasma reaction chamber; and
a control processor configured to control a residence time and an ash rate for applying the plasma, wherein the system further comprises at least one sensor in the plasma reaction chamber, the at least one sensor configured to determine a stop time for the exposure, wherein the stop time is generated by determining a plasma composition and material composition of the Parylene coating.

10. The plasma ashing system of claim 9 , wherein the plasma is generated in a plasma generation chamber separate from the plasma reaction chamber.

Assignees

• Hzo Inc

Inventors

• Clancy Sean
• Lawrence Benjamin
• Niebroski Alexander

Classifications

• H05K3/0041 Primary

  by plasma etching · CPC title

• G03F7/038

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title

• G03F7/039

  Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title

• H01J37/32963

  End-point detection · CPC title