Unit for recycling treating liquid of substrate and apparatus for treating substrate with the unit

Patent metadata

Field	Value
Publication number	US-11845113-B2
Application number	US-202117403063-A
Country	US
Kind code	B2
Filing date	Aug 16, 2021
Priority date	Nov 27, 2020
Publication date	Dec 19, 2023
Grant date	Dec 19, 2023

Abstract

A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.

First claim

What is claimed is:

1. An apparatus for treating a substrate comprising:
a substrate support unit for supporting a substrate; and
a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid discharged to the substrate, and including a first recovery container,
wherein the first recovery container comprises a third portion disposed on one side of the substrate support unit and a fourth portion disposed on another side of the substrate support unit, each of the third portion and the fourth portion including:
a first base;
a first sidewall extending upwardly from one end of the first base;
a first upper plate extending obliquely and upwardly from an end of the first sidewall; and
a first inner wall extending upwardly from another end of the first base,
wherein the third portion and the fourth portion have different heights,
wherein the first base of the third portion includes a first portion and a second portion, the first portion connected to a first recovery line for discharging the substrate treating liquid to an outside, the second portion adjacent the first portion,
wherein the first base of the fourth portion comprises a flat planar surface,
wherein at least a part of the second portion of the first base extends obliquely relative to the flat planar surface and downwardly toward the first portion.

2. The apparatus of claim 1 , wherein the fourth portion is higher than the third portion.

3. The apparatus of claim 1 , wherein the second portion is formed to be inclined downwardly in a straight shape, formed to be inclined downwardly in a curved shape, or formed to be inclined downwardly in a step shape.

4. The apparatus of claim 1 , wherein an inclination angle of the second portion with respect to the first portion is 20 degrees or more and 70 degrees or less.

5. The apparatus of claim 1 , wherein the first base is installed in a vertical direction with respect to a height direction of the substrate support unit, or is installed to be tilted.

6. The apparatus of claim 5 , wherein, when the first base is installed to be tilted, an angle formed between a longitudinal direction of the first base and a height direction of the substrate support unit is 15 degrees or less.

7. The apparatus of claim 1 , wherein an end of the first upper plate has a narrower width toward an end.

8. The apparatus of claim 1 , wherein the substrate treating liquid recovery unit further comprises:
a second recovery container surrounding the first recovery container; and
a third recovery container surrounding the second recovery container.

9. The apparatus of claim 8 , wherein the first recovery container, the second recovery container, and the third recovery container recover different substrate treating liquids.

10. The apparatus of claim 8 , wherein the first recovery container recovers water as the substrate treating liquid, and
wherein the first inner wall is not coupled to a guide wall that is formed to be inclined downwardly in an inward direction.

11. The apparatus of claim 8 , wherein the second recovery container comprises:
a second base for discharging the substrate treating liquid to an outside through a second recovery line, and including a fifth portion disposed on one side of the substrate support unit and a sixth portion disposed on another side of the substrate support unit;
a second sidewall extending upwardly from one end of the second base;
a second upper plate extending obliquely and upwardly from an end of the second sidewall; and
a second inner wall extending upwardly from another end of the second base,
wherein the fifth portion and the sixth portion have different heights.

12. The apparatus of claim 8 , wherein the third recovery container comprises:
a third base for discharging the substrate treating liquid to an outside through a third recovery line, and including a seventh portion disposed on one side of the substrate support unit and an eighth portion disposed on another side of the substrate support unit;
a third sidewall extending upwardly from one end of the third base;
a third upper plate extending obliquely and upwardly from an end of the third sidewall; and
a third inner wall extending upwardly from another end of the third base,
wherein the seventh portion and the eighth portion have different heights.

13. The apparatus of claim 1 further comprises an elevating unit for elevating the substrate treating liquid recovery unit.

14. The apparatus of claim 13 , wherein the elevating unit adjusts a height of the substrate treating liquid recovery unit according to a rotation speed of the substrate support unit.

15. The apparatus of claim 1 , wherein the substrate treating apparatus is a facility for wet cleaning the substrate.

16. The apparatus of claim 15 , wherein at least one of an injection unit used for cleaning the substrate and a nozzle installed in the substrate support unit is used when cleaning the substrate treating liquid recovery unit.

17. An apparatus for treating a substrate comprising:
a substrate support unit for supporting a substrate; and
a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid discharged to the substrate, and including a first recovery container,
wherein the first recovery container comprises:
a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on another side of the substrate support unit; and
a first sidewall extending upwardly from one end of the first base;
a first upper plate extending obliquely and upwardly from an end of the first sidewall;
a first inner wall extending upwardly from another end of the first base,
wherein the third portion and the fourth portion have different heights,
wherein the first base of the third portion includes a first portion and a second portion, the first portion connected to a first recovery line for discharging the substrate treating liquid to an outside, the second portion adjacent the first portion,
wherein the first base of the fourth portion comprises a flat planar surface,
wherein at least a part of the second portion of the first base extends obliquely relative to the flat planar surface and downwardly toward the first portion, and
wherein an angle formed between the flat planar surface and a height direction of the substrate support unit is less than 90 degrees.

18. A substrate treating liquid recovery unit,
wherein the substrate treating liquid recovery unit surrounds a substrate support unit for supporting a substrate and recovers a substrate treating liquid discharged to the substrate,
wherein the substrate treating liquid recovery unit comprises a first recovery container,
wherein the first recovery container comprises a third portion disposed on one side of the substrate support unit and a fourth portion disposed on another side of the substrate support unit, each of the third portion and the fourth portion including:
a first base;
a first sidewall extending upwardly from one end of the first base;
a first upper plate extending obliquely and upwardly from an end of the first sidewall; and
a first inner wall extending upwardly from another end of the first base,
wherein the third portion and the fourth portion have different heights,
wherein the first base of the third portion includes a first portion and a second p

Assignees

• Semes Co Ltd

Inventors

• Choi Ye Jin
• Bang Byung Sun
• Kang Tae Ho
• Moon Jong Won

Classifications

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• B08B3/10 Primary

  with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration · CPC title

• B08B3/022

  Cleaning travelling work (B08B3/042 takes precedence) · CPC title