Lamda/4 TYPE RADIO WAVE ABSORBER
US-2021265738-A1 · Aug 26, 2021 · US
US11844201B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11844201-B2 |
| Application number | US-201917276550-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 20, 2019 |
| Priority date | Sep 26, 2018 |
| Publication date | Dec 12, 2023 |
| Grant date | Dec 12, 2023 |
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A radio wave absorber ( 1 a ) includes a resistive layer ( 20 ), an electrical conductor ( 30 ), and a dielectric layer ( 10 ). The resistive layer ( 20 ) includes indium tin oxide as a main component. The electrical conductor ( 30 ) reflects a radio wave. The dielectric layer ( 10 ) is disposed between the resistive layer ( 20 ) and the electrical conductor ( 30 ) in the thickness direction of the resistive layer ( 20 ). The dielectric layer ( 10 ) is formed of a polymer. The content of tin oxide in the indium tin oxide included in the resistive layer ( 20 ) is more than 0 weight % and less than 20 weight %. The number of hydrogen atoms included in the resistive layer ( 20 ) is 5% or more of the total number of indium atoms, tin atoms, oxygen atoms, and hydrogen atoms included in the resistive layer ( 20 ).
Opening claim text (preview).
The invention claimed is: 1. A radio wave absorber comprising: a resistive layer comprising indium tin oxide as a main component; an electrical conductor that reflects a radio wave; and a dielectric layer disposed between the resistive layer and the electrical conductor in the thickness direction of the resistive layer and formed of a polymer, wherein the content of tin oxide in the indium tin oxide is more than 0 weight % and less than 20 weight %, and the number of hydrogen atoms comprised in the resistive layer is 5% or more of the total number of indium atoms, tin atoms, oxygen atoms, and hydrogen atoms comprised in the resistive layer. 2. The radio wave absorber according to claim 1 , wherein the resistive layer remains in an amorphous state after the resistive layer is subjected to annealing at 150° C. and for 1 hour. 3. The radio wave absorber according to claim 1 , wherein the resistive layer comprises at least one selected from the group consisting of silicon oxide, magnesium oxide, and zinc oxide. 4. The radio wave absorber according to claim 1 , wherein the electrical conductor comprises indium tin oxide. 5. The radio wave absorber according to claim 1 , wherein the electrical conductor comprises at least one selected from the group consisting of aluminum, copper, an aluminum alloy, and a copper alloy. 6. The radio wave absorber according to claim 1 , wherein the resistive layer has a sheet resistance of 180 to 600 Ω/□. 7. The radio wave absorber according to claim 1 , wherein the resistive layer has a thickness of 18 to 100 nm. 8. The radio wave absorber according to claim 1 , wherein the resistive layer has a Hall mobility of less than 40 cm 2 /(V·s). 9. The radio wave absorber according to claim 1 , wherein the dielectric layer has a relative permittivity of 2.0 to 20.0. 10. The radio wave absorber according to claim 1 , wherein the dielectric layer comprises at least one polymer selected from the group consisting of ethylene-vinyl acetate copolymer, vinyl chloride resin, urethane resin, acrylic resin, acrylic urethane resin, polyethylene, silicone, and polyethylene terephthalate. 11. The radio wave absorber according to claim 1 , further comprising an adhesive layer, wherein the electrical conductor is disposed between the dielectric layer and the adhesive layer. 12. The radio wave absorber according to claim 1 , further comprising an adhesive layer, wherein the adhesive layer is disposed between the dielectric layer and the electrical conductor. 13. The radio wave absorber according to claim 1 , wherein the dielectric layer adheres to the electrical conductor. 14. A laminate for radio wave absorbers comprising: a resistive layer comprising indium tin oxide as a main component; and a dielectric layer disposed in contact with the resistive layer in the thickness direction of the resistive layer and formed of a polymer, wherein the content of tin oxide in the indium tin oxide is more than 0 weight % and less than 20 weight %, and the number of hydrogen atoms comprised in the resistive layer is 5% or more of the total number of indium atoms, tin atoms, oxygen atoms, and hydrogen atoms comprised in the resistive layer.
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