Cleaning apparatus

US11839904B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11839904-B2
Application numberUS-202117329628-A
CountryUS
Kind codeB2
Filing dateMay 25, 2021
Priority dateJun 4, 2020
Publication dateDec 12, 2023
Grant dateDec 12, 2023

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A cleaning apparatus capable of thoroughly cleaning all parts of a workpiece is provided. The cleaning apparatus includes: a cleaning chamber; a table rotation shaft that rotates about a first axis; a first swivel fitting disposed inside the table rotation shaft; a table on which the cleaning workpiece is placed; a first motor that rotates the table rotation shaft; a propeller shaft that rotates about a second axis that is parallel to the first axis; a second swivel fitting connected to a propeller shaft; and a nozzle that rotates integrally with the second swivel shaft and that ejects a cleaning fluid in a direction different from the second axis toward the cleaning workpiece.

First claim

Opening claim text (preview).

What is claimed is: 1. A cleaning apparatus, comprising: a cleaning chamber; a table rotation shaft having a hollow shape, the table rotation shaft configured to rotate about a first axis; a first swivel fitting including a first swivel housing rotatably disposed inside the table rotation shaft, and a first swivel shaft disposed inside the first swivel housing, the first swivel shaft being restricted from rotating; a table disposed inside the cleaning chamber and fixed to the table rotation shaft, the table on which a cleaning workpiece is configured to be placed; a first motor configured to rotate the table rotation shaft; a propeller shaft configured to rotate about a second axis that is parallel to the first axis; a second swivel fitting including a second swivel housing disposed at an end of the propeller shaft inside the cleaning chamber, the second swivel housing being restricted from rotating, and a second swivel shaft disposed inside the second swivel housing, the second swivel shaft configured to rotate integrally with the propeller shaft; and a first nozzle configured to rotate integrally with the second swivel shaft inside the cleaning chamber, the first nozzle configured to eject a first, cleaning fluid in a direction different from the second axis toward the cleaning workpiece, a clamping device including a fluid cylinder, the clamping device disposed on the table; a first, cleaning-fluid source; a second, working-fluid source; and a valve connected to the second, working-fluid source; wherein the first swivel fitting includes a first annular flow path disposed between the first swivel housing and the first swivel shaft, a first flow path connecting the first annular flow path and the valve, the first flow path disposed in the first swivel shaft, and a second flow path connecting the first annular flow path and the fluid cylinder, the second flow path disposed in the first swivel housing, the second swivel fitting includes a second annular flow path disposed between the second swivel housing and the second swivel shaft, a third flow path connecting the second annular flow path and the first, cleaning-fluid source, the third flow path disposed in the second swivel housing, and a fourth flow path connecting the second annular flow path and the first nozzle, the fourth flow path disposed in the second swivel shaft. 2. The cleaning apparatus according to claim 1 , wherein the first axis extends vertically. 3. The cleaning apparatus according to claim 1 , wherein the table rotation shaft is disposed to pass through the cleaning chamber, the table rotation shaft includes a flange disposed inside the cleaning chamber, and the first swivel housing is fixed to the flange and capable of being pulled out inside the cleaning chamber. 4. The cleaning apparatus according to claim 1 , further comprising: a column fixed to the table rotation shaft, the column configured to support the table; a tilting device disposed to the column; wherein the table is pivotally disposed on the column, and the tilting device changes a posture of the table. 5. The cleaning apparatus according to claim 1 , further comprising: a first nozzle holder fastened to the second swivel shaft; wherein the first nozzle is disposed on the first nozzle holder so as to eject the first cleaning fluid along a first ejection plane passing through the second axis. 6. The cleaning apparatus according to claim 5 , wherein the first nozzle holder includes a main pipe extending along the second axis, and a branch pipe branching from the main pipe, the branch pipe extending along the ejection plane, and a plurality of the first nozzles are disposed on the main pipe and the branch pipe. 7. The cleaning apparatus according to claim 5 , further comprising: a third fluid source; a third swivel fitting disposed on the first nozzle holder at the opposite side to the second swivel fitting, the third swivel fitting including a third swivel housing, and a third swivel shaft rotatably supported by the third swivel housing about the second axis; and a second nozzle configured to rotate integrally with the third swivel shaft inside the cleaning chamber, the second nozzle configured to eject a third fluid in a direction different from the second axis toward the cleaning workpiece. 8. The cleaning apparatus according to claim 7 , further comprising: a second nozzle holder fastened to the third swivel shaft; wherein the second nozzle is disposed on the second nozzle holder so as to eject the third fluid along a second ejection plane passing through the second axis. 9. The cleaning apparatus according to claim 7 , further comprising: a slide guide disposed along the second axis; a slide shaft configured to slidably advance or retract along the second axis on the slide guide, the slide shaft configured to rotatably support the propeller shaft; and a linear motion mechanism configured to advance or retract the slide shaft. 10. The cleaning apparatus according to claim 9 , wherein the slide shaft is disposed to pass through the cleaning chamber, and the second swivel fitting is disposed inside the cleaning chamber. 11. The cleaning apparatus according to claim 9 , wherein the first axis extends vertically.

Assignees

Inventors

Classifications

  • B08B3/024Primary

    Cleaning by means of spray elements moving over the surface to be cleaned · CPC title

  • Accessories or details of general applicability for machines or apparatus for cleaning · CPC title

  • Cabinets or cupboards specially adapted for cleaning articles by hand · CPC title

  • Details, e.g. jaws, jaw attachments · CPC title

  • B08B3/022Primary

    Cleaning travelling work (B08B3/042 takes precedence) · CPC title

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What does patent US11839904B2 cover?
A cleaning apparatus capable of thoroughly cleaning all parts of a workpiece is provided. The cleaning apparatus includes: a cleaning chamber; a table rotation shaft that rotates about a first axis; a first swivel fitting disposed inside the table rotation shaft; a table on which the cleaning workpiece is placed; a first motor that rotates the table rotation shaft; a propeller shaft that rotate…
Who is the assignee on this patent?
Sugino Mach
What technology area does this patent fall under?
Primary CPC classification B08B3/024. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 12 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).