Apparatus and system for filtrating liquid

Patent metadata

Field	Value
Publication number	US-11839839-B2
Application number	US-201916681463-A
Country	US
Kind code	B2
Filing date	Nov 12, 2019
Priority date	Dec 13, 2018
Publication date	Dec 12, 2023
Grant date	Dec 12, 2023

Abstract

A filtration apparatus is provided. The filtration apparatus includes a housing and a plurality of filtering sheets. The housing is enclosed by a first end cap and a second end cap. The first end cap includes a liquid inlet, and the second end cap includes a liquid outlet. The plurality of filtering sheets is disposed on an internal sidewall of the housing. A portion of the filtering sheets interlaces with another portion of the filtering sheets to form a winding flow path in the housing.

First claim

What is claimed is:

1. A filtration apparatus comprising:
a housing enclosed by a first end cap and a second end cap, the first end cap comprising a liquid inlet, and the second end cap comprising a liquid outlet; and
a plurality of filters disposed on an internal sidewall of the housing,
wherein a portion of the filters interlaces with another portion of the filters to form a winding flow path in the housing, each of the filters comprises a substrate extending from the internal sidewall and extending toward the other side of the internal sidewall, and at least one brush structure is disposed on a surface of the substrate, each of the at least one brush structure comprises a stem and branches protruding from the stem towards the internal sidewall.

2. The filtration apparatus of claim 1 , wherein the housing has a tubular structure.

3. The filtration apparatus of claim 1 , wherein each of the plurality of filters is perpendicular to the internal sidewall.

4. The filtration apparatus of claim 1 , wherein an angle formed between the internal sidewall and each of the plurality of filters falls within the range of 0 to 90 degrees.

5. The filtration apparatus of claim 1 , wherein the brush structure is used to capture silicon dioxide.

6. The filtration apparatus of claim 5 , wherein the brush structure is formed by an oxidebased material.

7. The filtration apparatus of claim 1 , wherein the first end cap further comprises a gas inlet, and the second end cap further comprises a gas outlet.

8. A filtration system comprising:
a wafer processing module, comprising:
an etching device;
a heater connected to the liquid input;
a concentration meter disposed between the heater and the etching device; and
a pump disposed between the etching device and the liquid output;

a first valve connected to a liquid output of the wafer processing module;
a second valve connected to a liquid input of the wafer processing module; and
at least one filtration apparatus connected to the wafer processing module, the at least one filtration apparatus comprising:
a housing enclosed by a first end cap and a second end cap, the first end cap comprising a liquid inlet, and the second end cap comprising a liquid outlet; and
a plurality of filters disposed on an internal sidewall of the housing,

wherein a portion of the filters interlaces with another portion of the filters to form a winding flow path in the housing, each of the filters comprises a substrate disposing on the internal sidewall and extending toward the other side of the internal sidewall, and at least one brush structure is disposed on a surface of the substrate, each of the at least one brush structure comprises a stem and branches protruding from the stem towards the internal sidewall.

9. The filtration system of claim 8 , wherein the liquid inlet is configured to receive a liquid from the first valve.

10. The filtration system of claim 9 , wherein the liquid is a phosphoric acid solution.

11. The filtration system of claim 8 , wherein the liquid outlet is configured to supply a filtrated liquid to the second valve.

12. The filtration system of claim 8 , wherein the first valve and the second valve are three-way valves.

13. The filtration system of claim 8 , further comprising:
a liquid supplier connected to the at least one filtration apparatus for supplying a cleaning agent; and
a drain for collecting the cleaning agent.

14. The filtration system of claim 13 , further comprising a third valve disposed between the liquid supplier and the liquid inlet, and a fourth valve disposed between the liquid outlet and the drain.

15. The filtration system of claim 8 , wherein each of the plurality of filters is perpendicular to the internal sidewall of the housing.

16. The filtration system of claim 8 , wherein the brush structure is used to capture silicon dioxide.

17. The filtration system of claim 8 , further comprising a control circuit for switching operation modes of the system.

Assignees

• Xia Tai Xin Semiconductor Qing Dao Ltd

Inventors

• Choi Sangyong
• Nam Chang-Hyeon
• Yeo Injoon

Classifications

• H10P72/0422

  for wet etching · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• B01D29/50 Primary

  with multiple filtering elements, characterised by their mutual disposition (B01D29/39 takes precedence) · CPC title

• B01D29/46

  of flat, stacked bodies · CPC title

• B01D29/60

  integrally combined with devices for controlling the filtration · CPC title