Gan stack acoustic reflector and method for producing the same
US-2019333965-A1 · Oct 31, 2019 · US
US11831295B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11831295-B2 |
| Application number | US-202017019611-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 14, 2020 |
| Priority date | Sep 20, 2019 |
| Publication date | Nov 28, 2023 |
| Grant date | Nov 28, 2023 |
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Acoustic wave devices based on epitaxially grown heterostructures comprising appropriate combinations of epitaxially grown metallic transition metal nitride (TMN) layers, epitaxially grown Group III-nitride (III-N) piezoelectric semiconductor thin film layers, and epitaxially grown perovskite oxide (PO) layers. The devices can include bulk acoustic wave (BAW) devices, surface acoustic wave (SAW) devices, high overtone bulk acoustic resonator (HBAR) devices, and composite devices comprising HBAR devices integrated with high-electron-mobility transistors (HEMTs).
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What is claimed is: 1. An acoustic wave device, comprising: a low-acoustic-loss substrate; a bottom electrode comprising a first epitaxial transition metal nitride (TMN) layer; a top electrode comprising a second epitaxial TMN layer; and at least one intermediate layer disposed between the first and second epitaxial TMN layers, the at least one intermediate layer comprising a SrCaTiO 3 perovskite oxide (PO) layer. 2. The acoustic wave device according to claim 1 , wherein the first and second TMN layers comprise NbN x or TaN x . 3. The acoustic wave device according to claim 1 , wherein the second TMN layer is patterned to form an interdigitated transducer (IDT) such that the acoustic wave device forms a surface acoustic wave (SAW) device. 4. A high overtone bulk acoustic resonator (HBAR) device, comprising: a low-acoustic-loss substrate; a bottom electrode comprising an epitaxial transition metal nitride (TMN) layer; a top metal electrode; an epitaxial III-Nitride (III-N) piezoelectric layer disposed between the top and bottom electrodes; and an AIN layer disposed between the bottom electrode and the III-N piezoelectric layer. 5. The HBAR device according to claim 4 , wherein the bottom electrode comprises NbN x . 6. The HBAR device according to claim 4 , wherein the top electrode comprises aluminum (Al). 7. The HBAR device according to claim 4 , wherein the III-N piezoelectric layer comprises GaN. 8. The HBAR device according to claim 4 , wherein the AIN layer disposed between the bottom electrode and the III-N piezoelectric layer comprises ScAlN. 9. An integrated HEMT+HBAR acoustic device comprising a high-electron-mobility transistor (HEMT) having a high overtone bulk acoustic resonator (HBAR) integrated therewith; wherein the HBAR comprises: a low-acoustic-loss substrate; a bottom metal electrode comprising an epitaxial transition metal nitride (TMN) layer; a top metal electrode; an epitaxial III-Nitride (III-N) piezoelectric layer between the top and bottom metal electrodes; and an AIN layer disposed between the bottom metal electrode and the III-N piezoelectric layer. 10. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the bottom electrode comprises NbNx. 11. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the top metal electrode comprises aluminum (Al). 12. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the III-N piezoelectric layer comprises GaN. 13. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the AIN layer disposed between the bottom electrode and the III-N piezoelectric layer comprises ScAlN.
of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate · CPC title
Characteristics of piezoelectric layers, e.g. cutting angles · CPC title
with semiconductor devices · CPC title
in combination with other electronic elements · CPC title
the vibration mode being overmoded · CPC title
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