Multifunctional integrated acoustic devices and systems using epitaxial materials

US11831295B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11831295-B2
Application numberUS-202017019611-A
CountryUS
Kind codeB2
Filing dateSep 14, 2020
Priority dateSep 20, 2019
Publication dateNov 28, 2023
Grant dateNov 28, 2023

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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Acoustic wave devices based on epitaxially grown heterostructures comprising appropriate combinations of epitaxially grown metallic transition metal nitride (TMN) layers, epitaxially grown Group III-nitride (III-N) piezoelectric semiconductor thin film layers, and epitaxially grown perovskite oxide (PO) layers. The devices can include bulk acoustic wave (BAW) devices, surface acoustic wave (SAW) devices, high overtone bulk acoustic resonator (HBAR) devices, and composite devices comprising HBAR devices integrated with high-electron-mobility transistors (HEMTs).

First claim

Opening claim text (preview).

What is claimed is: 1. An acoustic wave device, comprising: a low-acoustic-loss substrate; a bottom electrode comprising a first epitaxial transition metal nitride (TMN) layer; a top electrode comprising a second epitaxial TMN layer; and at least one intermediate layer disposed between the first and second epitaxial TMN layers, the at least one intermediate layer comprising a SrCaTiO 3 perovskite oxide (PO) layer. 2. The acoustic wave device according to claim 1 , wherein the first and second TMN layers comprise NbN x or TaN x . 3. The acoustic wave device according to claim 1 , wherein the second TMN layer is patterned to form an interdigitated transducer (IDT) such that the acoustic wave device forms a surface acoustic wave (SAW) device. 4. A high overtone bulk acoustic resonator (HBAR) device, comprising: a low-acoustic-loss substrate; a bottom electrode comprising an epitaxial transition metal nitride (TMN) layer; a top metal electrode; an epitaxial III-Nitride (III-N) piezoelectric layer disposed between the top and bottom electrodes; and an AIN layer disposed between the bottom electrode and the III-N piezoelectric layer. 5. The HBAR device according to claim 4 , wherein the bottom electrode comprises NbN x . 6. The HBAR device according to claim 4 , wherein the top electrode comprises aluminum (Al). 7. The HBAR device according to claim 4 , wherein the III-N piezoelectric layer comprises GaN. 8. The HBAR device according to claim 4 , wherein the AIN layer disposed between the bottom electrode and the III-N piezoelectric layer comprises ScAlN. 9. An integrated HEMT+HBAR acoustic device comprising a high-electron-mobility transistor (HEMT) having a high overtone bulk acoustic resonator (HBAR) integrated therewith; wherein the HBAR comprises: a low-acoustic-loss substrate; a bottom metal electrode comprising an epitaxial transition metal nitride (TMN) layer; a top metal electrode; an epitaxial III-Nitride (III-N) piezoelectric layer between the top and bottom metal electrodes; and an AIN layer disposed between the bottom metal electrode and the III-N piezoelectric layer. 10. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the bottom electrode comprises NbNx. 11. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the top metal electrode comprises aluminum (Al). 12. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the III-N piezoelectric layer comprises GaN. 13. The integrated HEMT+HBAR acoustic device according to claim 9 , wherein the AIN layer disposed between the bottom electrode and the III-N piezoelectric layer comprises ScAlN.

Assignees

Inventors

Classifications

  • of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate · CPC title

  • Characteristics of piezoelectric layers, e.g. cutting angles · CPC title

  • with semiconductor devices · CPC title

  • in combination with other electronic elements · CPC title

  • the vibration mode being overmoded · CPC title

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What does patent US11831295B2 cover?
Acoustic wave devices based on epitaxially grown heterostructures comprising appropriate combinations of epitaxially grown metallic transition metal nitride (TMN) layers, epitaxially grown Group III-nitride (III-N) piezoelectric semiconductor thin film layers, and epitaxially grown perovskite oxide (PO) layers. The devices can include bulk acoustic wave (BAW) devices, surface acoustic wave (SAW…
Who is the assignee on this patent?
Us Gov Sec Navy
What technology area does this patent fall under?
Primary CPC classification H03H9/02574. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 28 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).